Recently, the technology for internal polishing is needed to ultra-clean machining method for the purpose of corrosion, pollution prevention of parts in the area of high technology industry such as semiconductor, electronics, telecommunication, optics, aerospace, and motors. The method for previous ...
Recently, the technology for internal polishing is needed to ultra-clean machining method for the purpose of corrosion, pollution prevention of parts in the area of high technology industry such as semiconductor, electronics, telecommunication, optics, aerospace, and motors. The method for previous ultra-clean internal polishing such as the Electro-Chemical Polishing (ECP) and the Magneto-Electrolytic-Abrasive Polishing (MEAP) exists, but there are two problems as follows. First, high cost was required for the production of ultra-clean surface. Second, environment pollution in relation to electrolytic treatment was followed. In this study, internal polishing system using the magnetic force was developed for the production of averaged surface roughness in the range of between 0.02 \mu m and 0.05 \mu m or less than this, and magnetic abrasive composed of WC/Co powder was developed. After finding the optimal polishing condition on each, machining properties for newly developed abrasives was analyzed. From the results obtained by experimental design method, the optimal polishing condition was analyzed, and thereafter internal polishing was done.
Recently, the technology for internal polishing is needed to ultra-clean machining method for the purpose of corrosion, pollution prevention of parts in the area of high technology industry such as semiconductor, electronics, telecommunication, optics, aerospace, and motors. The method for previous ultra-clean internal polishing such as the Electro-Chemical Polishing (ECP) and the Magneto-Electrolytic-Abrasive Polishing (MEAP) exists, but there are two problems as follows. First, high cost was required for the production of ultra-clean surface. Second, environment pollution in relation to electrolytic treatment was followed. In this study, internal polishing system using the magnetic force was developed for the production of averaged surface roughness in the range of between 0.02 \mu m and 0.05 \mu m or less than this, and magnetic abrasive composed of WC/Co powder was developed. After finding the optimal polishing condition on each, machining properties for newly developed abrasives was analyzed. From the results obtained by experimental design method, the optimal polishing condition was analyzed, and thereafter internal polishing was done.
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