$\require{mediawiki-texvc}$
  • 검색어에 아래의 연산자를 사용하시면 더 정확한 검색결과를 얻을 수 있습니다.
  • 검색연산자
검색연산자 기능 검색시 예
() 우선순위가 가장 높은 연산자 예1) (나노 (기계 | machine))
공백 두 개의 검색어(식)을 모두 포함하고 있는 문서 검색 예1) (나노 기계)
예2) 나노 장영실
| 두 개의 검색어(식) 중 하나 이상 포함하고 있는 문서 검색 예1) (줄기세포 | 면역)
예2) 줄기세포 | 장영실
! NOT 이후에 있는 검색어가 포함된 문서는 제외 예1) (황금 !백금)
예2) !image
* 검색어의 *란에 0개 이상의 임의의 문자가 포함된 문서 검색 예) semi*
"" 따옴표 내의 구문과 완전히 일치하는 문서만 검색 예) "Transform and Quantization"
쳇봇 이모티콘
안녕하세요!
ScienceON 챗봇입니다.
궁금한 것은 저에게 물어봐주세요.

논문 상세정보

Abstract

Chemical vapor deposition using titanium tetra isopropoxide(TTIP) was employed to investigate effects of process parameters on the uniformity of $TiO_{2}$this films deposited on Indium Tin Oxide (ITO)coated glass. Deposition experiments were carried out at temperatures ranging from $300^{\circ}C$ to $400^{\circ}C$ under the pressure of 0.5~2 torrin a cold wall reactor which can handle 200mm substrate. It was found that the growth rate of $TiO_{2}$was closely related to the reaction temperature and the ractant gas compositions. Apparent activation energy for the deposition rate was 62.7lkJ/mol in the absence of $O_{2}$ and 100.4kj/mol in the presence of $O_{2}$, respectively. Homogeneous reactions in the gas phase were promoted when the total pressure of the reactor was increased. Variance in the film thickness was less than a few percent, but at high deposition rates film thickness was less uniform. Effects of reaction temperature on $TiO_{2}$ thin film characteristic was investigated with SEM, XRD and AES.

참고문헌 (17)

  1. L. E. Tannas, Jr. , Flat panel Displays and CRTs / v.,pp., 1985
  2. TiO₂/SiO₂Multilayer Insulating Films for ELDs , T. Nakayama;K. Onisawa;M. Fuyama;M. Hanazono , J. Electrochem. Soc. / v.139,pp., 1992
  3. Characterization of Optical Thin Films , H.K. Pulker , Appl. Opt. / v.18,pp., 1979
  4. Growth Characteristics of Rutile Film by CVD , R.N. Ghoshtagore;A.J. Noreika , J. Electrochem. Soc. / v.117,pp., 1970
  5. Chemical Vapour Deposition of TiO₂Film using an Organometalic Process and its Photoelectrochemical Behaviors , Y. Takahashi;K. Tsuda;K. Sugiyama;H. Minoura;D. Makino;M. Tsuiki , J. Chem. Soc. Faraday Trans. Inst. / v.77,pp., 1981
  6. TiO₂Antireflection coatings by a low temperature spray process , H.J. Hovel , J. Electrochem. Soc. / v.125,pp., 1978
  7. Preparation of C-Axis-Oriented PLT Thin Films by the Metalorganic Chemical Vapor Deposition , K. Tominaga;M. Miyajima;Y. Sakashita;H. Segawa;M. Okada , Japan. J. Appl. Phys. / v.29,pp.L1874, 1990
  8. Rutile Growth and TiO₂Films deposited by vapour-phase decomposition of Isopropyl Titanate , Y. Takahashi;H. Suzuki;M. Nasu , J. Chem. Soc. Faraday Trans. Inst. / v.81,pp., 1985
  9. Electronic Properties of the Interface between Si and TiO₂Deposited at very low Temperatures , T. Fuyuki;H. Matsunami , Japan. J. Appl. Phys. / v.25,pp., 1986
  10. Metalorganic Chemical Vapor Deposition of c-Axis-Oriented PZT Thin Films , M. Okada;K. Tominaga;T. Araki;S.Katayama;Y. Sakashita , Japan. J. Appl. Phys. / v.29,pp., 1990
  11. Kinetics of Low Pressure Chemical Vapor Deposition of TiO₂from Titanium Tetraisopropoxide , K.L. Siegering;G.L. Griffin , J. Electrochem. Soc. / v.137,pp.814, 1990
  12. Compositional Analysis and Capacitance-Voltage Properties of TiO₂Films by Low Pressure Metal-Organic Chemical Vapor Deposition , T.K. Won;S.G. Yoon;H.G. Kim , J. Electrochem. Soc. / v.139,pp., 1993
  13. Thin TiO₂Films Prepared by Low Pressure Chemical Vapor Deposition , N. Rausch;E.P. Burte , J. Electrochem. Soc. / v.140,pp., 1993
  14. The Role of Homogeneous Reaction in Chemical Vapor Deposition , K.J. Sladek , J. Electrochem. Soc. / v.118,pp., 1971
  15. Chemical Vapor Deposition of Al₂O₃Thin Films under Reduced Pressure , J. Saraie;J. Kwon;Y. Yodogawa , J. Electrochem. Soc. / v.132,pp., 1985
  16. Preparation and Deposition mechanism of Ferroelectric PbTiO₃Thin Films by Chemical Vapor Deposition , Soon-Gil Yoon;Ho-Gi Kim , J. Electrochem. Soc. / v.135,pp., 1988
  17. MOCVD in Inversed Stagnation Point Flow , P. Lee;D. Mckenna;D. Kapur;K.F. Jensen , J. Cryst. Growth / v.77,pp., 1986

이 논문을 인용한 문헌 (0)

  1. 이 논문을 인용한 문헌 없음

원문보기

원문 PDF 다운로드

  • ScienceON :

원문 URL 링크

원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다. (원문복사서비스 안내 바로 가기)

상세조회 0건 원문조회 0건

DOI 인용 스타일