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논문 상세정보

열필라멘트 CVD에서 전압 인가에 의한 다이아몬드의 핵생성 촉진

Bias-enhanced Nucleation of Diamond in Hot Filament CVD

Abstract

The effect of various processing parameters, in particular the substrate and filament temperature, on the nucleation of diamond has been studied for the hot filament CVD process with a negative bias on the substrate. As far as the substrate temperature was maintained around the critical temperature of 73$0^{\circ}C$, the nucleation of diamond increased with increasing filament temperature. The maximum nucleation density of ~ 2$\times$109/$\textrm{cm}^2$ was obtained under the condition of filament temperature of 230$0^{\circ}C$, substrate temperature of 75$0^{\circ}C$, bias voltage of 300V, methane concentration of 20%, and deposition time of 2 hours. This nucleation density is about the same as those obtained in previous investigations. For fixed substrate temperatures, the nucleation density varies up to about 103 times depending on experimental conditions. This result is different from that of Reinke, et al. When the substrate temperature was above 80$0^{\circ}C$, a silkworm~shaped carbon phase was co-deposited with hemispherical microcrystalline diamond, and its amount increased with increasing substrate temperature. The Raman spectrum of the silkworm-shaped carbon was the same as that of graphitic soot. The silkworm-shaped carbon was etched and disappeared under the same as that of graphitic soot. The silkworm-shaped carbon was etched and disappeared under the deposition condition of diamond, implying that it did not affect the nucleation of diamond.

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참고문헌 (24)

  1. Studies on Nucleation Process in Diamond CVD : an Overview of Recent Developments , H. Liu;D.S. Dandy , Diamond Relat Mater / v.4,pp.173-1188, 1995
  2. Electron Field Emission From a Cesiated NEA Diamond(100) Surface: an Activation Concept , O.M. Kuttel;O. Groning;E. Schaller;L. Diederich;P. Groning;L. Schlapbach , Diamond Relat. Mater / v.5,pp.807-811, 1996
  3. Experimental Characterization of Biasenhanced Nucleation of Diamond on Si , J. Gerber;S. Sattel;K. Jung;H. Ehrhardt;J. Robertson , Diamond Relat. Mater / v.4,pp.559-562, 1995
  4. Surface-enhanced Raman Spectroscopy of Chemical Vapor Deposited Diamond Films , D.S. Knight;R. Weimer;L. Pilione;W.B. White , Appl. Phys. Lett / v.56,pp.1320-1322, 1990
  5. The Effect of Substrate Bias Voltage on the Nucleation of Diamond Crystals in a Microwave Plasma Assited Chemical Vapor Deposition Process , X. Jiang;R. Six;C.-P. Klages;R. Zachai;M. Hartweg;H.-J. Fubei , Diamond Relat Mater / v.2,pp.407-412, 1992
  6. Nucleation and Selcted Area Deposition of Diamond by Biased Hot Filament Chemical Vapor Deposition , W. Zhu;F.R. Sivazhan;B.R. Stoner;J.T. Glass , J. Mater. Res. / v.10,pp.425-430, 1995
  7. Electron-emission-enhanced Diamond Nucleation on Si by Hot Filament Chemical Vapor Deposition , Q. Chen;Z. Lin , Appl. Phys. Lett / v.68,pp.2050-2052, 1996
  8. B. Chapman , Glow Discharge Processes / v.,pp., 1980
  9. Investigation of the Nucleation Mechanism in Biasenhanced Diamond Deposition , P. Rcinke;P. Kania;P. Oelhafen;R. Guggenheim , Appl. Phys. Lett / v.68,pp.22-24, 1996
  10. Diamond Nucleated by Hydrogenation of the Edges of Graphitic Precursors , W.R.L. Lambrecht;C.H. Lee;B. Segall;J.C. Angus;Z. Li;M. Sunkara , Nature / v.364,pp.607-610, 1993
  11. Azimuthal Rotation of Diamond Crystals Epitaxially Nucleated on Silicon {001} , T. Tachibana;K. Hayashi;K. Kobashi , Appl. Phys. Lett. / v.68,pp.1491-1492, 1996
  12. Epitaxy of Diamond on Silicon , D.K. Milne;P.G. Roberts;P. John;M.G. Jubber;M. Liehr;J.J.B. Wilson , Diamond Relat Mater. / v.4,pp.394-400, 1995
  13. Epitaxial Nucleation of Diamond on β-SiC via Bias-enhanced Microwave Plasma Chemical Vapor Deposition , B.R. Stoner;G.H. Ma;S.D. Wolter;W. Zhu;Y.-C. Wang;R.F. Davis;J.T. Glass , Diamond Relat. Mater. / v.2,pp.142-146, 1993
  14. Effect of Bias Enhanced Nucleation on the Nucleation Density of Diamond in Microwave Plasma CVD , Y. Ma;T. Tsurumi;N. Shinoda;O. Fukunaga , Diamond Relat Mater / v.4,pp.1325-1330, 1995
  15. Evaluation of a Substrate Pretreatment for Hot Filament CVD of Diamond , K.L. Menningen;M.A. Childs;H. Toyoda.L.W. Anderson;J.E. Lawler , J. Mater. Res. / v.9,pp.915-920, 1994
  16. Growth of Diamond Thin Films by Electron Assisted Chemical Vapor Deposition , A. Sawabe;T. Inuzuka , Appl. Phys. Lett. / v.46,pp.146-147, 1985
  17. Generation of Diamond Nuclei by Electric Field in Plasma Chemical Vapor Deposition , S. Yugo;T. Kanai;T. Kimura;T. Muto , Appl. Phys. Lett. / v.58,pp.1036-1038, 1991
  18. Epitaxial Diamond Thin Films on (001) Silicon Substrates , X. Jiang;C.-P. Klages;R. Zachai;M. Hartweg;H.-J. Fusser , Appl. Phys. Lett / v.62,pp.3438-3440, 1993
  19. Textured Diamond Growth on(100)-Sic Via Microwave Plasma Chemical Vapor Deposition , B.R. Stoner;J.T. Glass , Appl. Phys. Lett / v.60,pp.698-700, 1992
  20. Oriented CVD Diamond Films: Twin Formation, Structure and Morphology , C. Wild;R. Kohl;N. Herres;W. Muller-Sebert;P. Koidl , Diamond Relat Mater / v.3,pp.373-381, 1994
  21. Bias-enhanced Nucleation of Diamond during Microwave-assisted Chemical Vapor Deposition , B.W. Scheldon;R. Csencsits;J. Rankin;R.E. Boekenhauer;Y. Shigesato , J. Appl. Phys. / v.75,pp.5001-5008, 1994
  22. Nucleation mechanisms of diamond in plasma chemical vapor deposition , S. Yugo;T. Kimura;T. Kanai , Diamond Relat. Mater. / v.2,pp.328-332, 1992
  23. Theoretical Study of Field Emission From Diamond , Z.-H. Huang;P.H. Cutler;N.M. Miskovsky;T.E. Sullivan , Appl. Phys. Lett. / v.65,pp.2562-2564, 1994
  24. Epitaxially Oriented Growth of Diamond on Silicon by Hot Filament Chemical Vapor Deposition , Q Chen;L.-X. Wang;Z. Zhang;J. Yang;Z. Lin , Appl. Phys. Lett. / v.68,pp.176-178, 1996

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