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NTIS 바로가기멤브레인 = Membrane Journal, v.14 no.3, 2004년, pp.201 - 206
황갑진 (한국에너지기술연구원 수소에너지연구센터) , 박주식 (한국에너지기술연구원 수소에너지연구센터) , 이상호 (한국에너지기술연구원 수소에너지연구센터) , 최호상 (경일대학교 화학공학과)
The stability of the prepared silica membrane by chemical vapor deposition (CVD) method in the HI-
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