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제안 방법
- A preliminary study on modelbased LPC was executed using a two-Gaussian kernel. Analytical skew formulas for I/S and I/C patterns were introduced and model parameters were extracted by fitting the skew formulas with experimental data. We have observed that the model-predicted bias values were consistent with those obtained by the nonlinear curve-fitting method, and model- predicted pattern shapes for I/C patterns were in good agreement with the real pattern images captured by a SEM.
- ) for rule-based LPC. Bias rules for space and contact type patterns were tabulated using Photolynx OPC Tek Editor, and modification of the design layout for the test patterns was executed on the platform of a software package for photomask manufacturing data preparation, CATS (Synopsys, Inc.), with a 5 nm design grid. CD linearity data measured after rule-based LPC are depicted in Fig.
- In this paper, we applied the PPC concept to the maskmaking process of a laser pattern generator. The main concern of this paper is improving patterning resolution by applying the PPC concept to the mask-making process.
- 5 pm feature sizes on a wafer. The design CDs of the test patterns were chosen to be 0.1 pm smaller than the target CDs to compensate for the known follow-up dry-etch bias.
- In this paper, we applied the PPC concept to the maskmaking process of a laser pattern generator. The main concern of this paper is improving patterning resolution by applying the PPC concept to the mask-making process. Therefore, we have concentrated on the CD linearity issue rather than on the CD uniformity issue.
대상 데이터
- We first describe the mask-making process to which rulebased LPC was applied. An ALTA3700 (Etec) equipped with a 364-nm laser source and a binay mask coated with photoresist IP3500 (TOK) were used as a mask pattern generator and mask blank, respectively. The Samsung standard wet process for the photoresist IP3500 was used for the development process, and a dry-etch process was performed using plasma etch system VLR-Gen1 (Unaxis).
이론/모형
- In order to extract bias rules for rule-based LPC, the curvefitting method with a nonlinear function was used. The form of the nonlinear function is
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