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NTIS 바로가기電子工學會論文誌. Journal of the Institute of Electronics Engineers of Korea. SD, 반도체, v.42 no.2 = no.332, 2005년, pp.9 - 14
박장우 (시립인천대학교 전자공학과) , 이병진 (시립인천대학교 전자공학과) , 유종근 (시립인천대학교 전자공학과) , 박종태 (시립인천대학교 전자공학과)
This paper reports the hot carrier induced RF performance degradation of bulk dynamic threshold voltage MOSFET (B-DTMOS) compared with bulk MOSFET (B-MOS). In the normal and moderate mode operations, the degradations of cut-off frequency
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