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논문 상세정보

Abstract

Microstereolithography(MSL) technology is derived from the conventional stereolithography process and can meet the demands for fabricating complex 3-D microstructures with high resolution. This technology can be divided into scanning and projection methods, which have different levels of precision and fabrication speeds. Scanning MSL fabricates very fine 3-D microstructures by controlling the position of the laser spot on the resin surface. Projection MSL quickly fabricates one layer with one exposure using a mask. In this paper, we propose a projection MSL system with uniform illumination and image formation based on optical design for fabricating microstructure arrays. This system can realize mass production of 3-D microstructures in the meso-range, which falls between micro- and macro-ranges, with a resolution of a few microns. Microstructure arrays were fabricated to verify the performance of the proposed system.

참고문헌 (15)

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이 논문을 인용한 문헌 (4)

  1. 2009. "" International journal of precision engineering and manufacturing, 10(1): 91~98 
  2. Park, In-Baek ; Ha, Young-Myung ; Kim, Min-Sub ; Lee, Seok-Hee 2009. "Development of Dithering Process for Accuracy of Microstructure by Projection Microstereolithgraphy based on UV-DMD" 한국정밀공학회지 = Journal of the Korean Society of Precision Engineering, 26(8): 7~13 
  3. 2010. "" International journal of precision engineering and manufacturing, 11(2): 335~340 
  4. 2010. "" International journal of precision engineering and manufacturing, 11(3): 483~490 

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