Kang, Seok Hun
(ICT Materials & Components Research Laboratory, ETRI)
,
Kim, In Gyoo
(ICT Materials & Components Research Laboratory, ETRI)
,
Kim, Bit-Na
(ICT Materials & Components Research Laboratory, ETRI)
,
Sul, Ji Hwan
(ICT Materials & Components Research Laboratory, ETRI)
,
Kim, Young Sun
(Korea Electronics Technology Institute)
,
You, In-Kyu
(ICT Materials & Components Research Laboratory, ETRI)
Flash reduction of graphene oxide is an efficient method for producing high quality reduced graphene oxide under room temperature ambient conditions without the use of hazardous reducing agents (such as hydrazine and hydrogen iodide). The entire process is fast, low-cost, and suitable for large-scal...
Flash reduction of graphene oxide is an efficient method for producing high quality reduced graphene oxide under room temperature ambient conditions without the use of hazardous reducing agents (such as hydrazine and hydrogen iodide). The entire process is fast, low-cost, and suitable for large-scale fabrication, which makes it an attractive process for industrial manufacturing. Herein, we present a simple fabrication method for a flexible in-plane graphene micro-supercapacitor using flash light irradiation. All carbon-based, monolithic supercapacitors with in-plane geometry can be fabricated with simple flash irradiation, which occurs in only a few milliseconds. The thinness of the fabricated device makes it highly flexible and thus useful for a variety of applications, including portable and wearable electronics. The rapid flash reduction process creates a porous graphene structure with high surface area and good electrical conductivity, which ultimately results in high specific capacitance ($36.90mF\;cm^{-2}$) and good cyclic stability up to 8,000 cycles.
Flash reduction of graphene oxide is an efficient method for producing high quality reduced graphene oxide under room temperature ambient conditions without the use of hazardous reducing agents (such as hydrazine and hydrogen iodide). The entire process is fast, low-cost, and suitable for large-scale fabrication, which makes it an attractive process for industrial manufacturing. Herein, we present a simple fabrication method for a flexible in-plane graphene micro-supercapacitor using flash light irradiation. All carbon-based, monolithic supercapacitors with in-plane geometry can be fabricated with simple flash irradiation, which occurs in only a few milliseconds. The thinness of the fabricated device makes it highly flexible and thus useful for a variety of applications, including portable and wearable electronics. The rapid flash reduction process creates a porous graphene structure with high surface area and good electrical conductivity, which ultimately results in high specific capacitance ($36.90mF\;cm^{-2}$) and good cyclic stability up to 8,000 cycles.
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제안 방법
In this study, we report a facile fabrication method for an interdigitated graphene MSC with a single flash irradiation, which occurs in only a few milliseconds. This process is even more scalable than laser scribing techniques because it can reduce a large area of GO film instantaneously.
Photograph of multiple FrGO electrodes, photograph and time-resolved power profile of xenon flash lamp equipment, optimization of photoreduction conditions, EDS mapping images of FrGO electrode, and CV curves at high scan rates.
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