참고문헌 (12)

1. Phys. Stat. Sol., (a) S. Baunack 115 223 1989 10.1002/pssa.2211150124 Baunack, S. and Zehe, A.,“A Study on UV/Ozone Geaning Procedure for Silicon Surfaces”,Phys. Stat. Sol., (a)115, 223 (1989). 

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2. Materials Research Society Symposium Proceedings S. Bedge 259 207 1992 10.1557/PROC-259-207 Bedge, S., McFadyen, J. and Lamb, H. H.,“Kinetics of UV/O2 Cleaning and Surface Passivation: Experiments and Modeling,Materials Research Society Symposium Proceedings,259, 207 (1992). 

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3. Polymer Engineering and Science D. A. Bolon 12 109 1972 10.1002/pen.760120206 Bolon, D. A. and Kunz, C. O.,“Ultraviolet Depolymerization of Photoresist Polymers’,Polymer Engineering and Science,12, 109 (1972). 

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4. J. Electrochem. Soc G. Bomchil 130 1611 1983 10.1149/1.2120044 Bomchil, G., Herino, R., Barla, K. and Pfister, J. C.,“Pore Size Distribution in Porous Silicon Studied by Adsorption Isotherms”,J. Electrochem. Soc,130, 1611 (1983). 

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5. J. Vac. Sci. Technol. Y. J. Chabal A3 1448 1985 10.1116/1.572757 Chabal, Y. J.,“Infrared Study of the Chemisorption of Hydrogen and Water on Vicinal Si(l00) 2×1 Surfaces”,J. Vac. Sci. Technol.,A3, 1448 (1985). 

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6. Phys. Rev. Lett. Y. J. Chabal 53 282 1984 10.1103/PhysRevLett.53.282 Chabal, Y. J. and Raghavachari, K.,“Surface Infrared Study of Si(100)-(2× 1)H”,Phys. Rev. Lett.,53, 282 (1984). 

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7. Phys. Rev. Lett. Y. J. Chabal 54 1055 1985 10.1103/PhysRevLett.54.1055 Chabal, Y. J. and Raghavachari, K.,“New Ordered Structure for the H-Saturated Si(100) Surface: The (3×1) Phase”,Phys. Rev. Lett.,54, 1055 (1985). 

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8. RCA Rev. W. Kern 31 187 1970 Kern, W. and Poutein, D. A.,“Cleaning Solutions Based on Hydrogen Peroxide for Use in Silicon Semiconductor Technology”,RCA Rev.,31, 187 (1970). 

9. Jpn. J. Appl. Phys. C. Okada 32 8A L1031 1993 10.1143/JJAP.32.L1031 Okada, C., Kobayashi, H., Takahashi, I., Ryuta, J. and Shingyouji, T.,“Growth of Native Oxide and Accumulation of Organic Matter on Bare Si Wafer in Air”,Jpn. J. Appl. Phys.,32(8A), L1031 (1993). 

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10. J. Electrochem. Soc J. Ruzyllo 134 8 2052 1987 10.1149/1.2100818 Ruzyllo, J., Duranko, G. T. and Hoff, A. M.,“Preoxidation UV Treatments of Silicon Wafers”,J. Electrochem. Soc,134(8), 2052 (1987). 

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11. Materials Research Society Symposium Proceedings P. C. Wood 315 237 1993 10.1557/PROC-315-237 Wood, P. C., Wydeven, T. and Tsuji, O.,“Critical Process Variables for UV-Ozone Etching of Photoresist”,Materials Research Society Symposium Proceedings,315, 237 (1993). 

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12. 10.7567/SSDM.1994.A-2-2 Yonekawa, N., Yasui, S. and Ohmi, T., Cleaning Technology and Analysis Technology for Hydrocarbon Contamination on Si Wafer Surface”,Extend Abstracts of the 1994 International Conference on Solid State Device and Materials,428 (1994).