[논문]Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

Song, Sun-Sik; Kim, Eun-Uk; Jung, Hee-Soo; Kim, Ki-Seok; Jung, Gun-Young

doi:10.1088/0960-1317/19/10/105022

Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

Journal of micromechanics and microengineering.: structures, devices, and systems, v.19 no.10, 2009년, pp.105022 -

Song, Sun-Sik (Author to whom any correspondence should be addressed) , Kim, Eun-Uk , Jung, Hee-Soo , Kim, Ki-Seok , Jung, Gun-Young

Abstract ▼ AI-Helper

A two-step metal lift-off process using a selective etching recipe was demonstrated as a new technique for the reverse pattern fabrication of the features of a master stamp via a UV-based nanoimprint lithography technique. A transparent master stamp with repeated pillars (150 nm diameter at 300 nm pitch) was fabricated by using laser interference lithography and the subsequent dry-etching process. After nanoimprint lithography and the following gold (Au) lift-off process, the corresponding gold dots (20 nm height) were generated. A thin chromium layer (Cr, 5 nm) was then deposited and subjected to the aqua regia solution, which dissolved only Au dots. By using a selective wet etching recipe between gold (Au) and chromium (Cr) materials, a Cr layer with holes was reliably generated, which was used as an etching mask to transfer holes into the silicon substrate in the subsequent dry-etching process. Hole patterns with a diameter of 146 nm were inversely replicated faithfully from the master stamp with the corresponding pillars without a notable feature size distortion.

참고문헌 (13)

Kim, E. K., Stacey, N. A., Smith, B. J., Dickey, M. D., Johnson, S. C., Trinque, B. C., Willson, C. G.. Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography. Journal of vacuum science & technology. processing, measurement, and phenomena : an official journal of the American Vacuum Society. B, Microelectronics and nanometer structures, vol.22, no.1, 131-.

상세보기
Chou, Stephen Y., Krauss, Peter R., Renstrom, Preston J.. Imprint of sub-25 nm vias and trenches in polymers. Applied physics letters, vol.67, no.21, 3114-3116.

상세보기
Jung, G.-Y., Johnston-Halperin, E., Wu, W., Yu, Z., Wang, S.-Y., Tong, W. M., Li, Z., Green, J. E., Sheriff, B. A., Boukai, A., Bunimovich, Y., Heath, J. R., Williams, R. S.. Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography. Nano letters : a journal dedicated to nanoscience and nanotechnology, vol.6, no.3, 351-354.

상세보기
Ge, H., Wu, W., Li, Z., Jung, G.-Y., Olynick, D., Chen, Y., Liddle, J. A., Wang, S.-Y., Williams, R. S.. Cross-linked Polymer Replica of a Nanoimprint Mold at 30 nm Half-pitch. Nano letters : a journal dedicated to nanoscience and nanotechnology, vol.5, no.1, 179-182.

상세보기
Khang, D.-Y., Lee, H. H.. Sub-100 nm Patterning with an Amorphous Fluoropolymer Mold. Langmuir : the ACS journal of surfaces and colloids, vol.20, no.6, 2445-2448.

상세보기
2007 10.1088/0957-4484/18/5/055306 18 055306 0957-4484 Nanotechnology Kim S H

상세보기
De Leebeeck, A., Kumar, L. K. S., de Lange, V., Sinton, D., Gordon, R., Brolo, A. G.. On-Chip Surface-Based Detection with Nanohole Arrays. Analytical chemistry, vol.79, no.11, 4094-4100.

상세보기
2008 10.1088/0957-4484/19/36/365305 19 365305 0957-4484 Nanotechnology Kim Y S

상세보기
2004 10.1088/0957-4484/15/5/040 15 639 0957-4484 Nanotechnology Prodan L

상세보기
Jung, G.-Y., Li, Z., Wu, W., Chen, Y., Olynick, D. L., Wang, S.-Y., Tong, W. M., Williams, R. S.. Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography. Langmuir : the ACS journal of surfaces and colloids, vol.21, no.4, 1158-1161.

상세보기
Carlberg, P., Graczyk, M, Sarwe, E.-L., Maximov, I., Beck, M., Montelius, L.. Lift-off process for nanoimprint lithography. Microelectronic engineering, vol.67, 203-207.

상세보기
Song, Sun-Sik, Kim, Sang-Mook, Choi, Byung-Yeon, Jung, Gun-Young, Lee, Heon. Synthesis of silicon-containing materials for UV-curable imprint etch barrier solutions. Journal of vacuum science & technology. processing, measurement, and phenomena : an official journal of the American Vacuum Society. B, Microelectronics and nanometer structures, vol.27, no.4, 1984-.

상세보기
Russell, Philip. Photonic Crystal Fibers. Science, vol.299, no.5605, 358-362.

상세보기

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Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

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Reverse pattern duplication utilizing a two-step metal lift-off process via nanoimprint lithography

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