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NTIS 바로가기Scanning, v.36 no.3, 2014년, pp.347 - 355
Postek, Michael T. (Semiconductor and Dimensional Metrology Division, Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland) , Vladár, András E. (Semiconductor and Dimensional Metrology Division, Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland) , Purushotham, Kavuri P. (Semiconductor and Dimensional Metrology Division, Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland)
SummaryThe scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The improvements have significantly enriched and augmented the overall SEM performance and have made the instrument far easier to...
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