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Photopolymerizable copying composition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-001/68
  • G03C-001/70
출원번호 US-0533833 (1974-12-18)
우선권정보 DT-2363806 (1973-12-21)
발명자 / 주소
  • Faust Raimund Josef (Wiesbaden-Biebrich DT) Klupfel Kurt Walter (Wiesbaden-Sonnenberg DT)
출원인 / 주소
  • Hoechst Aktiengesellschaft (DT 03)
인용정보 피인용 횟수 : 31  인용 특허 : 0

초록

The invention relates to a photopolymerizable copying composition comprising at least one polymerizable compound, at least one photo-initiator, and at least one copolymer of (A) an unsaturated carboxylic acid, (B) an alkyl methacrylate with at least 4 carbon atoms in the alkyl group, and (C) at leas

대표청구항

A photopolymerizable copying composition comprising at least one polymerizable compound, at least one photo-initiator, and at least one copolymer of A. an unsaturated carboxylic acid, B. an alkyl methacrylate with at least 4 carbon atoms in the alkyl group, and C. at least one additional monomer whi

이 특허를 인용한 특허 (31)

  1. Dueber, Thomas E.; Nebe, William J., Alkali developable photopolymer crystalline composition.
  2. Maubru Mireille,FRX, Direct capillary dyeing composition comprising a cross-linked polymer with acrylic and alkyl C.sub.10 -C.sub.30 acrylate units.
  3. Maubru,Mireille, Direct dye composition for the hair, comprising a crosslinked polymer containing acrylic units and C10-C30 alkyl acrylate units.
  4. Lipson, Melvin A.; Derrico, Gene A.; Tark, Sung Y.; Yamazaki, Toshio, Flexible, fast processing, photopolymerizable composition.
  5. Goto, Takahiro, Image forming method.
  6. Lehmann Peter (Kelkheim DEX) Michel Manfred (Suzano BRX), Light-sensitive recording material for the production of a printing form or printed circuit with photoconductive layer a.
  7. Nishimi, Taisei; Ezoe, Toshihide; Kuruma, Koji; Kawakami, Masayuki, Method for producing a biosensor.
  8. Chiu, Chih-Cheng; Pan, Sheng-Liang; Lu, Kuo-Liang, Method of making a bump on a substrate using multiple photoresist layers.
  9. Oshima, Yasuhito, Negative working photosensitive lithographic printing plate.
  10. Nagasawa Kohtaro (Tokyo JPX) Morikubo Kunio (Soka JPX) Satoh Tsutomu (Higashi Kurume JPX), Photocurable light-sensitive composition.
  11. Ogino, Masahiko; Kaji, Makoto; Yori, Hanako, Photocurable resin composition and a method for forming a pattern.
  12. Flint William L. (Somerset NJ) Pilette Yvan P. (Lawrenceville NJ), Photopolymerizable composition with polymeric binder.
  13. Iwasaki Masayuki (Shizuoka JPX) Maeda Minoru (Shizuoka JPX) Shinozaki Fumiaki (Shizuoka JPX) Maemoto Kazuo (Kanagawa JPX), Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution.
  14. Hilger Manfred (Konz DEX) Klein Norbert (Wiesbaden DEX), Photopolymerizable recording roll material with end caps.
  15. Goto,Takahiro, Photosensitive composition.
  16. Goto,Takahiro, Photosensitive composition and planographic printing plate precursor.
  17. Ishimaru, Toshiaki; Tsukada, Katsushige; Hayashi, Nobuyuki, Photosensitive resin composition and photosensitive element.
  18. Goto,Takahiro, Planographic printing plate precursor.
  19. Sugasaki,Atsushi; Kunita,Kazuto, Planographic printing plate precursor.
  20. Shimada,Kazuto, Polymerizable composition and image-recording material using the same.
  21. Shimada, Kazuto, Polymerizable composition and lithographic printing plate precursor.
  22. Sugasaki, Atsushi; Kunita, Kazuto; Fujimaki, Kazuhiro, Polymerizable composition and planographic printing plate precursor.
  23. Sugasaki,Atsushi; Kunita,Kazuto; Fujimaki,Kazuhiro, Polymerizable composition and planographic printing plate precursor.
  24. Herwig, Walter; Klupfel, Kurt; Sikora, Helga; Sprengel, Heide, Process for cleaning copper-containing metal surfaces.
  25. Namiki Tomizo (Shizuoka JPX) Tago Tomohisa (Shizuoka JPX) Totsuka Mikio (Shizuoka JPX) Shinozaki Fumiaki (Shizuoka JPX), Process for preparing a color proofing sheet.
  26. Hilger Manfred (Konz DEX), Process for production of a photopolymerizable recording material.
  27. Lipson Melvin A. (Fullerton CA) Derrico Gene A. (Garden Grove CA) Tark Sung Y. (Irvine CA) Yamazaki Toshio (Mission Viejo CA), Process of using a flexible, fast processing photopolymerizable composition.
  28. Geissler Ulrich (Frankfurt am Main DEX) Herwig Walter (Bad Soden DEX) Fetsch Elisabeth (Wiesbaden DEX), Radiation polymerizable mixture and copying material produced therefrom.
  29. Geissler Ulrich (Hochheim/Main DEX) Steppan Hartmut (Wiesbaden DEX) Herwig Walter (Bad Soden Am Iaunus DEX), Radiation-polymerizable mixture.
  30. Herwig Walter (Bad Soden DEX) Decker Rudolf (Bodenheim DEX) Sikora Helga (Wiesbaden DEX) Erbes Kurt (Floersheim DEX), Radiation-polymerizable mixture and photopolymerizable copying material prepared therefrom.
  31. Ishimaru Toshiaki (Hitachi JPX) Tsukada Katsushige (Hitachi JPX) Hayashi Nobuyuki (Hitachi JPX) Koibuchi Shigeru (Hitachi JPX) Isobe Asao (Hitachi JPX), Soldering mask formed from a photosensitive resin composition and a photosensitive element.
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