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Ion plasma electron gun 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-007/24
출원번호 US-0578551 (1975-05-19)
발명자 / 주소
  • Wakalopulos George (Los Angeles CA)
출원인 / 주소
  • Hughes Aircraft Company (Culver City CA 02)
인용정보 피인용 횟수 : 40  인용 특허 : 0

초록

In the disclosed electron gun positive ions generated by a hollow cathode plasma discharge in a first chamber are accelerated through control and shield grids into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emi

대표청구항

An electron gun comprising: a source of positive ions including a plasma region; a cathode spaced from said ion source and positioned to intercept positive ions extracted therefrom; means for applying to said cathode a large negative voltage sufficient to cause positive ions generated by said ion so

이 특허를 인용한 특허 (40)

  1. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  2. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  3. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  4. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  5. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  6. Forbes Jones, Robin M.; Kennedy, Richard L., Apparatus and method for clean, rapidly solidified alloys.
  7. Forbes Jones, Robin M.; Shaffer, Sterry A., Casting apparatus and method.
  8. Forbes Jones, Robin M.; Shaffer, Sterry A., Casting apparatus and method.
  9. Forbes Jones, Robin M.; Shaffer, Sterry A., Casting apparatus and method.
  10. Hanawa, Hiroji; Tanaka, Tsutomu; Collins, Kenneth S.; Al-Bayati, Amir; Ramaswamy, Kartik; Nguyen, Andrew, Chemical vapor deposition plasma reactor having plural ion shower grids.
  11. Makarov, Maxime, Device and method of supplying power to an electron source, and ion-bombardment-induced secondary-emission electron source.
  12. Pigache Daniel (Palaiseau FRX) Danel Francois (Grenoble FRX), Electron gun operating by secondary emission under ionic bombardment.
  13. Babko-Malyi Sergei, Extraction of contaminants from a gas.
  14. Abarra, Einstein Noel; Miura, Yasushi; Fujiyama, Eiji; Suzuki, Naoyuki; Taneda, Yasuyuki; Kamiya, Yasushi, Ion beam generator.
  15. Farley Marvin ; Dudnikov Vadim G. ; Nasser-Ghodsi Mehran, Ion implantation with charge neutralization.
  16. Wakalopulos, George, Ion plasma beam generating device.
  17. Forbes Jones, Robin M., Ion plasma electron emitters for a melting furnace.
  18. Wakalopulos George (Pacific Palisades CA), Ion plasma electron gun.
  19. Cline, Christopher W.; Yarmchuk, Edward J.; Arena, Vincent A.; Merte, Donald A.; Picunko, Thomas; Wojszynski, Brian J.; Hendricks, Charles J.; Scaman, Michael E.; Olyha, Jr., Robert S.; Halperin, Arnold, Ionization test for electrical verification.
  20. Livesay William R. (San Diego CA), Large-area uniform electron source.
  21. Forbes Jones, Robin M.; Kennedy, Richard L., Melting furnace including wire-discharge ion plasma electron emitter.
  22. Forbes Jones, Robin M.; Kennedy, Richard L., Melting furnace including wire-discharge ion plasma electron emitter.
  23. Forbes Jones, Robin M., Method and apparatus for producing large diameter superalloy ingots.
  24. Forbes Jones, Robin M., Method and apparatus for producing large diameter superalloy ingots.
  25. Ham Mooyoung (Glens Falls NY), Nonthermionic hollow anode gas discharge electron beam source.
  26. Orr ; Jr. ; F. D. ; Templeton ; L. F. ; Keutzer ; Larry L., Ozone generation apparatus and method.
  27. Friede Dirk (Herzogenaurach DEX) Cirkel Hans-Juergen (Uttenreuth DEX) Baumgartl Rudolf (Alzenau-Hrstein DEX) Schmutzler Matthias (Aschaffenburg DEX), Plasma X-ray tube, in particular for X-ray preionization of gas lasers and method for produicng X-radiation with such an.
  28. McGeoch Malcolm W. (Brookline MA), Plasma cathode.
  29. Hanawa, Hiroji; Tanaka, Tsutomu; Collins, Kenneth S.; Al-Bayati, Amir; Ramaswamy, Kartik; Nguyen, Andrew, Plasma immersion ion implantation reactor having an ion shower grid.
  30. Hanawa, Hiroji; Tanaka, Tsutomu; Collins, Kenneth S.; Al-Bayati, Amir; Ramaswamy, Kartik; Nguyen, Andrew, Plasma immersion ion implantation reactor having multiple ion shower grids.
  31. Harvey Robin J. (Thousand Oaks CA), Plasma-anode electron gun.
  32. Kennedy, Richard L.; Forbes Jones, Robin M., Processes, systems, and apparatus for forming products from atomized metals and alloys.
  33. Makarov, Maxime, Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source.
  34. Forbes Jones, Robin M.; Kennedy, Richard L.; Minisandram, Ramesh S., Refining and casting apparatus and method.
  35. Forbes Jones, Robin M.; Shaffer, Sterry A., Refining and casting apparatus and method.
  36. Forbes Jones, Robin M.; Shaffer, Sterry A., Refining and casting apparatus and method.
  37. Wakalopulos George (Danville CA), Remote ion source plasma electron gun.
  38. Allen, Curtis G.; Ferrari, Christopher P.; Mitchell, Adam J., Triode hollow cathode electron gun for linear particle accelerators.
  39. Farrell Sherman R. (Orinda CA) Smith Richard R. (Pleasant Hill CA), Wire ion plasma gun.
  40. Harvey Robin J. (Thousand Oaks CA) Gallagher Hayden E. (Malibu CA) Schumacher Robert W. (Canoga Park CA), Wire-ion-plasma electron gun employing auxiliary grid.
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