Polyimide, polyamide-imide or polyamide-acids with olefin end groups in combination with a reactive Schiff base compound
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08G-073/10
C08G-073/12
출원번호
US-0427975
(1973-12-26)
발명자
/ 주소
Darmory Franklin P. (Ardsley NY) DiBenedetto Marianne (Pleasantville NY)
출원인 / 주소
Ciba-Geigy Corporation (Ardsley NY 02)
인용정보
피인용 횟수 :
20인용 특허 :
0
초록▼
This invention provides compositions containing A. A POLYIMIDE AND POLYAMIDE-IMIDE TERMINATED WITH OLEFINIC UNSATURATED END GROUPS, OR THE CORRESPONDING POLYAMIDE-ACIDS IN COMBINATION WITH A REACTIVE Schiff base compound, and B. A POLYIMIDE AND POLYAMIDE-IMIDE TERMINATED WITH A Schiff base end group
This invention provides compositions containing A. A POLYIMIDE AND POLYAMIDE-IMIDE TERMINATED WITH OLEFINIC UNSATURATED END GROUPS, OR THE CORRESPONDING POLYAMIDE-ACIDS IN COMBINATION WITH A REACTIVE Schiff base compound, and B. A POLYIMIDE AND POLYAMIDE-IMIDE TERMINATED WITH A Schiff base end group or the corresponding polyamide acids in combination with a reactive N,N′-bis-imide. These Schiff bases and N,N′-bis-imide compounds facilitate processing of the prepolymer resins by lowering the softening temperature, under processing conditions, and chain-extend and cross-link the base resins.
대표청구항▼
A composition of matter consisting essentially of a. a polyimide resin having the formula OOOO ������9--N��8��9--N������n or a polyamide-imide resin having the formulas and wherein R8 is a tetravelent aliphatic, cycloaliphatic, aromatic or heterocyclic radical containing at least 2 carbon atoms; R9
A composition of matter consisting essentially of a. a polyimide resin having the formula OOOO ������9--N��8��9--N������n or a polyamide-imide resin having the formulas and wherein R8 is a tetravelent aliphatic, cycloaliphatic, aromatic or heterocyclic radical containing at least 2 carbon atoms; R9 and R10 are the same or different and each is an alkylene group containing from 2 to 12 carbon atoms; a cycloalkylene group containing from 4 to 6 carbon atoms; and arylene group selected from phenylene, xylylene, tolylene, biphenylene, naphthylene, substituted arylene groups of the formula wherein V is sulfur, carbonyl, -NH, -N-(lower)alkyl, -SS-, -o-, -N-phenyl, sulfonyl, an alkylene group of from 1 to 4 carbon atoms, a di (lower)alkyl silyl group containing from 1 to 5 carbon atoms, a diphenylsilyl group, -P(O) (lower)alkyl, said lower alkyl containing from 1 to 5 carbon atoms, -N=N-, -N=N-, │ O R11 and R12 are indepent and each is hydrogen, chloro, or bromo, a (lower)alkyl group containing from 1 to 5 carbon atoms, a (lower) alkoxy group containing from 1 to 5 carbon atoms or a group having the formula where Z is a covalent bond or -NH, and R13 is phenyl, piperidino, H, diphenylamino or di(lower)alkyl amino; n is an integer of at least 1; D is a divalent radical containing olefinic unsaturation selected from the group having the formula wherein R14 and R15 independently of each other is hydrogen, methyl, bromo or chloro; Y1 is hydrogen or methyl X is carbonyl, oxygen, methylene, or sulfur, and b. from about 0.5 to about 0.166 mole equivalents per mole equivalent of (a) of a Schiff base compound of the formula R1 R1R1 │ ││ R2-C=N-R3, R2-C=N-A-N=C-R2 or R1R1 ││ R3-N=C-R4-C=N-R3 wherein R1 and R2 independently is hydrogen, an alkyl group containing from 1 to 12 carbon atoms, an aryl group containing from 6 to 12 carbon atoms, an alkaryl group containing from 7 to 15 carbon atoms, ar aralkyl group containing from 7 to 15 carbon atoms, chlorophenyl, alkoxyphenyl, said alkoxy containing from 1 to 5 carbon atoms, or together with the carbon to which they are attached form a monocyclic ring containing 5 to 6 carbon atoms, with the proviso that only one of R1 or R2 may be hydrogen at the same time; R3 is an alkyl group containing from 1 to 12 carbon atoms, an aryl group containing from 6 to 12 carbon atoms, an alkaryl group containing from 7 to 15 carbon atoms, an aralkyl group containing from 7 to 15 carbon atoms, chlorophenyl, alkoxyphenyl, said alkoxy containing from 1 to 5 carbon atoms, cyclohexyl or cyclophentyl; R4 is an alkylene group containing from 2 to 12 carbon atoms, phenylene, tolylene, biphenylene, naphthylene, or a arylene group having the formula wherein X is -S-, -O-, NH, H-phenyl, sulfonyl, or an alkylene group containing from 1 to 4 carbon atoms; and A is an alkylene group containing from 2 to 12 carbon atoms; cycloalkylene group containing from 4 to 6 carbon atoms, a xylylene group, an arylene group selected from phenylene, tolylene, biphenylene, naphthylene, a substituted arylene group of the formula wherein W is sulfur, carbonyl, -NH, -N(lower)alkyl, -O-, -N-phenyl, sulfonyl, an alkylene group of from 1 to 4 carbon atoms, R5 and R6 are independent and each is hydrogen, chloro, or bromo, (lower)alkyl of from 1 to 5 carbon atoms, (lower)alkoxy containing from 1 to 5 carbon atoms, or a group having the formula wherein Y is a covalent bond or -NH, and R7 is phenyl, piperidino, hydrogen, diphenylamino or di (lower)alkyl amino.
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이 특허를 인용한 특허 (20)
Daniel J. Ireland ; Jan G. Nel ; Robert G. Keske, Aqueous-based polyamide-amic acid compositions.
Lubowitz Hyman R. (Rolling Hills Estates CA) Sheppard Clyde H. (Bellevue WA) Stephenson Ronald R. (Kirkland WA), Method of making multidimensional polyesters.
Sheppard Clyde H. (Boeing Aerospace Company ; P.O. Box 399 ; M/S 73-09 Seattle WA 98124-2499) Lubowitz Hyman R. (26 Coral Tree Ln. Rolling Hills Estates CA 90274), Methods for making liquid molding compounds using diamines and dicyanates.
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