[특허]Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports

Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B23K-005/00
출원번호	US-0507845 (1974-09-20)
우선권정보	FR-0034821 (1973-09-28)
발명자 / 주소	Gorinas Guy (Annecy FR)
출원인 / 주소	Compagnie Industrielle des Telecommunications Cit-Alcatel (Paris FR 03)
인용정보	피인용 횟수 : 106 인용 특허 : 0

초록 ▼

An apparatus consisting in forming, with the oxide to be sprayed on, a plasma in an arc state within a source cavity. The state is stabilized by various known methods but which are well-adapted and the substrate to be covered is preferably kept at a predetermined distance, in order of 50 cm, from the source cavity. A positive pressure gas is supplied to the source cavity and vacuum pressure is maintained in the enclosure supporting the substrate facing the cavity opening to deposit oxide uniformly at high speed.

대표청구항 ▼

In a device for the rapid depositing of thin even and adhesive layers of oxides on plastic substrates, said device comprising: an enclosure, a pumping unit for providing a high vacuum to said enclosure, a source cavity cylinder internally lined with a layer of oxide to be deposited, a gas injection tube passing through the bottom of said cylinder, and means for subjecting said tube to gas under pressure, said cylinder having an axial circular opening therein facing the substrate, a hollow conductor tube in juxtaposition with said cylinder forming an excitation winding for said cylinder, means operably connected to said conductor tube for internally cooling said conductor tube; oscillating circuit means electrically connected to said conductor tube, and means to adjust said oscillating circuit means to thereby create a plasma arc; a plastic substrate; substrate support means disposed along the longitudinal axis of said axial circular opening in said cylinder, with said substrate support means supporting said substrate within said enclosure and facing said circular opening; the improvement wherein: said enclosure comprises a first cylindrical part closely surrounding the source cavity cylinder and being concentric thereto, a truncated cone shaped element having the same axis of symmetry as the circular opening of the source cavity cylinder with the axial cross section defining an opening of 60°fixed to said cylindrical part and extending axially from said first part at said opening towards said substrate, a large diameter cylindrical element connected to the truncated cone shaped element remote from said opening, the diameter of said large diameter cylindrical element being equal to that of said truncated cone shaped element at its base and being connected thereto, means for stabilizing said arc; and wherein the substrate support means fixes said substrate at a distance from the axial circular opening of the source cavity which is greater than four times the diameter of said source cavity and the diameter of the axial circular opening of the source cavity, the diameter of the cavity cylinder, said pumping unit applies vacuum pressure to the enclosure, and said means for subjecting said gas injection tube to gas under pressure applies positive gas pressure to the source cavity, such that the pressure differential between the source cavity and the enclosure under vacuum pressure is on the order of 10 to facilitate deposition of oxide on said substrate at a very high speed without compromising uniformity of oxide deposition.

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허를 인용한 특허 (106)

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연합인증

Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

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이 특허를 인용한 특허 (106)

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