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특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B23K-005/00   
미국특허분류(USC) 219/121P ; 427/34 ; 118/491
출원번호 US-0507845 (1974-09-20)
우선권정보 FR-0034821 (1973-09-28)
발명자 / 주소
  • Gorinas Guy (Annecy FR)
출원인 / 주소
  • Compagnie Industrielle des Telecommunications Cit-Alcatel (Paris FR 03)
인용정보 피인용 횟수 : 106  인용 특허 : 0
초록

An apparatus consisting in forming, with the oxide to be sprayed on, a plasma in an arc state within a source cavity. The state is stabilized by various known methods but which are well-adapted and the substrate to be covered is preferably kept at a predetermined distance, in order of 50 cm, from the source cavity. A positive pressure gas is supplied to the source cavity and vacuum pressure is maintained in the enclosure supporting the substrate facing the cavity opening to deposit oxide uniformly at high speed.

대표
청구항
▼

In a device for the rapid depositing of thin even and adhesive layers of oxides on plastic substrates, said device comprising: an enclosure, a pumping unit for providing a high vacuum to said enclosure, a source cavity cylinder internally lined with a layer of oxide to be deposited, a gas injection tube passing through the bottom of said cylinder, and means for subjecting said tube to gas under pressure, said cylinder having an axial circular opening therein facing the substrate, a hollow conductor tube in juxtaposition with said cylinder forming an exci...

이 특허를 인용한 특허 (106)

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