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Electrode type glow discharge apparatus

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-001/02
  • H01J-001/44
  • H01J-001/52
  • H01J-021/22
출원번호 US-0554485 (1975-03-03)
발명자 / 주소
  • Penfold Alan S. (Playa del Rey CA) Thornton John A. (Los Angeles CA)
출원인 / 주소
  • Telic Corporation (Santa Monica CA 02)
인용정보 피인용 횟수 : 38  인용 특허 : 0

초록

There is disclosed herein an electrode type glow discharge apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural

대표청구항

Electrode-type glow discharge apparatus comprising: a low pressure gaseous environment; anode means and cathode means within said low pressure gaseous environment and adapted to be coupled to a power supply; said cathode means including a central cathode and a pair of electrically conductive end fla

이 특허를 인용한 특허 (38)

  1. Welty,Richard P., Bi-directional filtered arc plasma source.
  2. Zega Bogdan (Geneva CHX), Cathodic sputtering target including means for detecting target piercing.
  3. Fiala Robert ; Zeigler Dary ; Welson Darren ; Del Real Jose ; Rudolph James W., Combination CVI/CVD and heat treat susceptor lid.
  4. David A. Glocker, Conical sputtering target.
  5. Glocker David A., Conical sputtering target.
  6. Glocker David A., Conical sputtering target.
  7. Zega Bogdan (Geneva CHX), Cylindrical cathode for magnetically-enhanced sputtering.
  8. Zega Bogdan (Geneva CHX), Cylindrical magnetron sputtering cathode and apparatus.
  9. Hoffman David W. (Ann Arbor MI), Cylindrical post magnetron sputtering system.
  10. Audino,Michael J.; Cipollo,Michael; Glocker,David; Miner,Kevin; Vottis,Patrick, In-situ plasma cleaning device for cylindrical surfaces.
  11. Glocker, David A.; Romach, Mark, Interlocking cylindrical magnetron cathodes and targets.
  12. Byron Stanley R. (Seattle WA) Burkes Thomas (Lubbock TX) Petr Rodney A. (Bellevue WA) Smilanski Israel (Beer Shiva ILX), Linear geometry thyratron.
  13. Richard P. Welty, Linear magnetron arc evaporation or sputtering source.
  14. Marshall, Michael L., Low temperature cathodic magnetron sputtering.
  15. Collins George J. (807 W. Oak St. Fort Collins CO 80521) McNeil John R. (13423 Desert Hills NE. Albuquerque NM 87111) Yu Zeng-gi (North Aggie Village Apt. 7C ; C.S.U. Fort Collins CO 80523), Magnetron deposition of ceramic oxide-superconductor thin films.
  16. Yumshtyk Gennady,CAX ; Ioumchtyk Michael,CAX, Magnetron sputtering method and apparatus.
  17. Dennis T. Garn ; Jerry S. Lee ; James W. Rudolph, Method and apparatus for cooling a CVI/CVD furnace.
  18. Fiala, Robert; Rudolph, James W.; Garn, Dennis T.; Lee, Jerry S., Method and apparatus for cooling a CVI/CVD furnace.
  19. Garn, Dennis T.; Lee, Jerry S.; Rudolph, James W., Method and apparatus for cooling a CVI/CVD furnace.
  20. Collins George J. (807 W. Oak St. Fort Collins CO 80521) McNeil John R. (13423 Desert Hills NE. Albuquerque NM 87111), Method and apparatus for hermetic coating of optical fibers.
  21. James Warren Rudolph, Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation.
  22. Martin Kevin P. ; Gillis Harry P. ; Choutov Dmitri A., Method and apparatus for low energy electron enhanced etching and cleaning of substrates in the positive column of a plasma.
  23. Martin, Kevin P.; Gillis, Harry P.; Choutov, Dmitri A., Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment.
  24. Martin,Kevin P.; Gillis,Harry P.; Choutov,Dmitri A., Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment.
  25. Konstantin K. Tzatzov CA; Alexander S. Gorodetsky CA, Method and apparatus for magnetron sputtering.
  26. Roger A. Ross ; Patrick C. Trujillo ; Robert Fiala, Method and apparatus for pressure measurement in a CVI/CVD furnace.
  27. Bezel, Ilya; Shchemelinin, Anatoly; Derstine, Matthew, Method and system for generating a light-sustained plasma in a flanged transmission element.
  28. Wåhlin, Erik Karl Kristian, Multi-grid ion beam source for generating a highly collimated ion beam.
  29. W책hlin,Erik Karl Kristian, Multi-grid ion beam source for generating a highly collimated ion beam.
  30. Glocker, David A.; Romach, Mark M., Porous coatings for biomedical implants.
  31. Welty Richard P., Rectangular filtered arc plasma source.
  32. Kim, Jin Il, Scrubber.
  33. Rudolph James Warren, Sealed reactant gas inlet for a CVI/CVD furnace.
  34. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  35. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  36. Yumshtyk, Gennady, Sputtering targets and methods.
  37. Yoshikawa Masato (Kodaira JPX) Kusano Yukihiro (Tokorozawa JPX) Naito Kazuo (Kawasaki JPX) Honda Toshio (Akigawa JPX) Hata Tomonobu (Kanazawa JPX), Surface treatment method.
  38. David A. Glocker ; Mark M. Romach, Unbalanced plasma generating apparatus having cylindrical symmetry.
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