[특허]Circuit for the recovery of solvent vapor evolved in the course of a cleaning cycle in dry-cleaning machines or plants,

Circuit for the recovery of solvent vapor evolved in the course of a cleaning cycle in dry-cleaning machines or plants, 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	D06F-043/08
출원번호	US-0769849 (1977-02-17)
우선권정보	IT-0003429 (1976-05-14); IT-0003575 (1976-11-02)
발명자 / 주소	Zucchini Guido
출원인 / 주소	AMA Universal S.p.A.
대리인 / 주소	Browdy and Neimark
인용정보	피인용 횟수 : 40 인용 특허 : 1

초록 ▼

Recovery of solvent vapor in the course of the cleaning cycle in dry-cleaning machines and/or plants, which include a cleaning circuit, a drying circuit and a distillation circuit, in which low boiling-point solvents are utilized in particular, and simultaneous de-pressurization of such machines, inside of which, in the course of said dry-cleaning operation, a partial evaporation of the solvent occurs which results in the building-up of a given pressure, are accomplished by means of a filter, which whose inlet is directly connected with any point of the drying circuit, while its outlet is directly connected with the outside.

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이 특허에 인용된 특허 (1)

Hughes John D. (Murrysville PA) Klingensmith Al W. (Mansfred OH), Vapor saving ambient air intake system for a dry cleaner.
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이 특허를 인용한 특허 (40)

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Suissa Moshe (5561 Alpine Cte St Luc ; Quebec CAX H4V 2X4), Dry cleaning machine.
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Naber, Christopher Nils; Vitan, Craig; Rachakonda, Venkataraman; Hallman, Darren, Dry cleaning solvent filter.
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Jones, William D., High pressure fourier transform infrared cell.
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Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
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Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
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Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
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Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
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Coindreau-Palau Damaso (Bosques de Chapultepec 104 Col. Bosques Del Valle Monterrey ; Nuevo Leon MXX), Method and system for the recovering of solvents in dry cleaning machines.
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Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
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Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
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Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
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Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
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Wuester,Christopher D., Process flow thermocouple.
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Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
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Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
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Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
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William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
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Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
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Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
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Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
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Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

연합인증

Circuit for the recovery of solvent vapor evolved in the course of a cleaning cycle in dry-cleaning machines or plants, 원문보기