$\require{mediawiki-texvc}$
  • 검색어에 아래의 연산자를 사용하시면 더 정확한 검색결과를 얻을 수 있습니다.
  • 검색연산자
검색도움말
검색연산자 기능 검색시 예
() 우선순위가 가장 높은 연산자 예1) (나노 (기계 | machine))
공백 두 개의 검색어(식)을 모두 포함하고 있는 문서 검색 예1) (나노 기계)
예2) 나노 장영실
| 두 개의 검색어(식) 중 하나 이상 포함하고 있는 문서 검색 예1) (줄기세포 | 면역)
예2) 줄기세포 | 장영실
! NOT 이후에 있는 검색어가 포함된 문서는 제외 예1) (황금 !백금)
예2) !image
* 검색어의 *란에 0개 이상의 임의의 문자가 포함된 문서 검색 예) semi*
"" 따옴표 내의 구문과 완전히 일치하는 문서만 검색 예) "Transform and Quantization"

통합검색

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

특허 상세정보

Apparatus for making foamed cleaning solutions and method of operation

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B08B-009/00    B01J-013/00   
미국특허분류(USC) 252/359E ; 134/22R
출원번호 US-0819748 (1977-07-28)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 40  인용 특허 : 0
초록

The apparatus of this invention is designed for making foamed liquid solutions. In a specific application the foamed liquid is used for removing scale deposits from the interior surfaces of vessels, such as heat exchangers. The apparatus includes a foam chamber with a gas disperser section positioned inside the chamber. Ahead of the foam chamber is a final mixing section with a static mixer installed therein. A liquid concentrate, such as an acid solution, and a diluent liquid, such as water, are passed into the foam chamber. The liquids are mixed in the...

대표
청구항

An apparatus for making a foamed fluid useful for cleaning the interior surfaces of a vessel, which comprises: a first conduit which defines a foam chamber; a second conduit which communicates with the foam chamber, and which defines an inlet adapted for carrying a liquid concentrate into the foam chamber; a third conduit which communicates with the foam chamber, and which defines an inlet adapted for carrying a diluent liquid into the foam chamber, the diluent liquid thereby mixing with the liquid concentrate to form a liquid solution in the foam chambe...

이 특허를 인용한 특허 피인용횟수: 40

  1. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John. Apparatus and system for cleaning a substrate. USP2013098522799.
  2. de Larios,John M.; Owczarz,Aleksander; Schoepp,Alan; Redeker,Fritz. Apparatuses and methods for cleaning a substrate. USP2008107441299.
  3. Field, Bruce F.; Krueger, Joseph K.; Joynt, Daniel L.; Pouliot, Joseph L.; McHugh, Daniel J.. Chemical dispenser for a hard floor surface cleaner. USP2004016671925.
  4. Nitta,Takahisa; Miki,Nobuhiro; Yamaguchi,Yoshiaki. Chemical supply system. USP2007037195024.
  5. Field, Bruce F.; Joynt, Daniel L.; Krueger, Joseph K.; Krueger, Earl; Christensen, Bryan L.. Cleaner cartridge. USP200401D485175.
  6. Field,Bruce F.; Joynt,Daniel L.; Johnson,Jeffrey A.; Krueger,Joseph K.; Christensen,Bryan L.. Cleaner cartridge. USP2006057051399.
  7. Basham, Michael T.; Larson, Warren L.; Peterson, Terence A.; Peterson, legal representative, Barbara J.; Wellens, Richard W.; Fleigle, Mark J.. Cleaning head for use in a floor cleaning machine. USP2010027665174.
  8. Field,Bruce F.; Krueger,Joseph K.; Pouliot,Joseph L.. Cleaning liquid dispensing in a mobile hard surface cleaner. USP2007027172658.
  9. Field, Bruce F.; Krueger, Joseph K.; Christensen, Bryan; Pierce, Richard M.; Seifert, James J.. Cleaning liquid dispensing system for a hard floor surface cleaner. USP2004056735811.
  10. Field, Bruce F.; Killingstad, Hans C.. Cleaning system utilizing purified water. USP2011118051861.
  11. Brown Lamar W. (1185 Clearview Dr. Ringgold GA 30736) Bartenfield James E. (1104 W. Pine Dr. Dalton GA 30720). Continuous foam generating system. USP1983074394289.
  12. Loring, Peter Alexander. Floor cleaner scrub head having a movable disc scrub member. USP2013118584294.
  13. Basham,Michael T.; Larson,Warren L.; Peterson, legal representative,Barbara J.; Wellens,Richard W.; Fleigle,Mark J.; Durenberger,Don; Hayden,Brent; Lehman,Ron; Peterson,Terence A.. Floor sweeping and scrubbing machine. USP2008117448114.
  14. Field, Bruce F.; Krueger, Joseph K.; Christensen, Bryan L.. Foamed cleaning liquid dispensing system. USP2003126662600.
  15. Field, Bruce F.. Hard and soft floor cleaning tool and machine. USP2011108028365.
  16. Field, Bruce F.; Christensen, Bryan L.; Blehert, Michael L.. Hard floor surface cleaner utilizing an aerated cleaning liquid. USP2004036705332.
  17. Cochran, Donald; Larson, Greg. In situ foam generation apparatus for on-site, on-demand, economical production of foaming solvents. USP20180810052666.
  18. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.. Method and apparatus for cleaning a semiconductor substrate. USP2012118316866.
  19. Freer, Erik M.; deLarios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.. Method and apparatus for cleaning a semiconductor substrate. USP2013098522801.
  20. de Larios, John M.; Ravkin, Mike; Farber, Jeffrey; Korolik, Mikhail; Redeker, Fred C.. Method and apparatus for cleaning a substrate using non-Newtonian fluids. USP2011108043441.
  21. Zhu, Ji; Mendiratta, Arjun; Mui, David. Method and apparatus for removing contaminants from substrate. USP2014068758522.
  22. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.; Thomas, Clint; Parks, John. Method and apparatus for removing contamination from substrate. USP2010017648584.
  23. de Larios,John M.; Ravkin,Mike; Parks,John; Korolik,Mikhail; Redeker,Fred C.. Method and apparatus for transporting a substrate using non-Newtonian fluid. USP2008087416370.
  24. Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Michael; Korolik, Mikhail; Redeker, Fred C.. Method and material for cleaning a substrate. USP2011017862662.
  25. Korolik, Mikhail; Freer, Erik M.; de Larios, John M.; Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz. Method and system for using a two-phases substrate cleaning compound. USP2010097799141.
  26. Fournel, Bruno; Faury, Maria; Le Samedy, Jean-Marie. Method for generating and circulating a foam in an installation and system for application of this method. USP2003056561200.
  27. Fournel, Bruno; Faury, Maria; Le Samedy, Jean-Marie. Method for generating and circulating a foam in an installation and system for application of this method. USP2005086932330.
  28. Simmons Bobby G. (7524 S. Evanston Tulsa OK 74136). Method for recycling foamed solvents. USP1989074849027.
  29. Korolik, Mikhail; Ravkin, Michael; deLarios, John; Redeker, Fritz C.; Boyd, John M.. Method for removing material from semiconductor wafer and apparatus for performing the same. USP2012128323420.
  30. Kholodenko, Arnold; Husain, Anwar; Tomasch, Gregory A.; Lin, Cheng-Yu (Sean). Method for using generator for foam to clean substrate. USP2013108557051.
  31. Mikhaylichenko, Katrina; Ravkin, Mike; Redeker, Fritz; de Larios, John M.; Freer, Erik M.; Korolik, Mikhail. Methods for contained chemical surface treatment. USP2011037897213.
  32. Hull Donald A. (6660 Woodman Ave. ; #105 Van Nuys CA 91405). Mixing apparatus for foam generation. USP1982124366081.
  33. Field,Bruce F.. Mobile floor cleaner data communication. USP2007047199711.
  34. Freer, Erik M.; de Larios, John M.; Ravkin, Michael; Korolik, Mikhail; Mikhaylichenko, Katrina; Redeker, Fritz C.. Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions. USP2013078475599.
  35. Kittle Paul A.. Surface treatment of semiconductor substrates. USP2000076090217.
  36. Kittle Paul A.. Surface treatment of semiconductor substrates. USP2001106296715.
  37. Kittle, Paul A.. Surface treatment of semiconductor substrates. USP2004096797071.
  38. Paul A. Kittle. Surface treatment of semiconductor substrates. USP2002086439247.
  39. Selle, Olav Martin; Mebratu, Amare; Montgomerie, Harry; Chen, Ping; Hagen, Thomas. Well treatment. USP2014028653008.
  40. Montgomerie, Harry; Chen, Ping; Hagen, Thomas; Wat, Rex; Selle, Olav Martin. Well treatment comprising a polymer formed from a diallyl ammonium salt and a scale inhibitor. USP2012018101554.