초록

An improved arrangement of electrode plates, semiconductor materials, electrode supports, and electrical power supplying circuitry is useful for plasma treatment of semiconductor materials in a reaction tube in the presence of a reaction gas.

대표청구항 ▼

An apparatus for plasma treatment of a plurality of pieces of material, said treatment comprising at least one treatment selected from coating and etching, said apparatus comprising: a reaction tube; means for introducing a gas comprising a reaction gas into said reaction tube, a plurality of conduc

An apparatus for plasma treatment of a plurality of pieces of material, said treatment comprising at least one treatment selected from coating and etching, said apparatus comprising: a reaction tube; means for introducing a gas comprising a reaction gas into said reaction tube, a plurality of conducting electrode plates located in said reaction tube, the number of each said electrode plates corresponding to the number of said pieces, each of said plates comprising means for supporting the corresponding one(s) of said pieces, said plates being oriented parallel to each other and transversely to said reaction tube, means for applying voltage across adjacent ones of said plates to create a plasma with said reaction gas for effecting said treatment.