초록 ▼

A liquid reactant injector assembly especially suited for the injection of liquid reactant into a high temperature metal reductant vapor and carrier gas stream for the production of metal is disclosed. The assembly is especially adapted for the continuous production of high purity silicon by the red

A liquid reactant injector assembly especially suited for the injection of liquid reactant into a high temperature metal reductant vapor and carrier gas stream for the production of metal is disclosed. The assembly is especially adapted for the continuous production of high purity silicon by the reduction of SiCl4 with sodium. The assembly includes a refractory-lined, hollow, metal shell having a plurality, suitably ten, equally-spaced, concentric, radially directed ports provided in the shell and wall. A hydraulic, atomizing type, spray nozzle is sealingly mounted in each of the ports recessed from the inner wall surface.

대표청구항 ▼

A method of producing silicon comprising the steps of: establishing an axially flowing stream of a heated carrier gas containing a dispersion of partially or completely vaporized reductant for SiCl4 selected from sodium, magnesium or zinc upstream of the point of injection of SiCl4, said carrier gas

A method of producing silicon comprising the steps of: establishing an axially flowing stream of a heated carrier gas containing a dispersion of partially or completely vaporized reductant for SiCl4 selected from sodium, magnesium or zinc upstream of the point of injection of SiCl4, said carrier gas dispersion being at a temperature above the melting point of silicon; injecting SiCl4 as liquid spray transversely into the axially flowing dispersion stream from a plurality of radially directed nozzles, equally spaced around the periphery of the stream and each nozzle being sealingly mounted in a port in a wall portion surrounding said stream with the outlet tip of each nozzle being recessed at least 1 cm from the inner wall surface whereby said SiCl4 liquid vaporizes within the stream; reducing the vaporized SiCl4 with the reductant within the axial stream to form liquid silicon; depositing the liquid silicon downstream of the point of injection on a surface of a wall surrounding the axial stream and extending downstream of said point of injection; flowing the liquid silicon down the surface of said wall; and collecting and recovering the liquid silicon.