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Vapor delivery system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-025/02
  • C03B-037/00
출원번호 US-0009565
발명자 / 주소
  • Partus Fred P. (Atlanta GA)
출원인 / 주소
  • Western Electric Company, Inc. (New York NY 02)
인용정보 피인용 횟수 : 44  인용 특허 : 3

초록

A system for generating and delivering vapors to a vapor deposition station is disclosed which comprises a bubbler 10 adapted to contain a supply of liquid, a bubbler heater 14 thermally coupled with the bubbler and electrically coupled with a heater controller, a temperature controlled chamber 23 l

대표청구항

A system for generating and delivering vapors to a vapor deposition station comprising, in combination, a vaporizer adapted to contain a supply of liquid; a vaporizer heater thermally coupled with said vaporizer and electrically coupled with a heater controller; a temperature controlled chamber loca

이 특허에 인용된 특허 (3)

  1. LeMay Dan B. (Palos Verdes Estates CA), Assembly and method of obtaining a controlled gas mixture.
  2. Hallberg ; John Emil ; Taylor ; Otis Max, Industrial fuel blender and fuel blending method.
  3. Blair Richard F. (Palos Verdes Peninsula CA), Mass flow meter with reduced attitude sensitivity.

이 특허를 인용한 특허 (44)

  1. Christenson Kurt K. ; Nelson Steven L., Apparatus and method for dispensing processing fluid toward a substrate surface.
  2. Fabian, Heinz; Roeper, Juergen, Atomizing method for producing synthetic quartz glass.
  3. Juen-Kuen Lin TW; Chien-Hsin Lai TW; Peng-Yih Peng TW; Fu-Yang Yu TW, Auxiliary gasline-heating unit in chemical vapor deposition.
  4. Lin Juen-Kuen,TWX ; Lai Chien-Hsin,TWX ; Peng Peng-Yih,TWX ; Yu Fu-Yang,TWX, Auxiliary gasline-heating unit in chemical vapor deposition.
  5. Sandhu, Gurtej S., Delivery of solid chemical precursors.
  6. Sandhu, Gurtej S., Delivery of solid chemical precursors.
  7. Sandhu,Gurtej S., Delivery of solid chemical precursors.
  8. Sandhu,Gurtej S., Delivery of solid chemical precursors.
  9. Mitter Helmut,ATX, Device for generating a defined relative humidity.
  10. Hansen Keith J., Gas control technique for limiting surging of gas into a CVD chamber.
  11. Takeshita, Kazuhiro; Nagashima, Shinji; Mizutani, Yoji; Katayama, Kyoshige, Gas treatment apparatus.
  12. Hunt, Peter John; Thudor, Mohammad; Wixey, David Fraser; McPhee, Stephen William, Humidity controller.
  13. Hunt, Peter John; Thudor, Mohammad; Wixey, David; McPhee, Stephen William, Humidity controller.
  14. Hansen Keith J., In-situ etch of CVD chamber.
  15. Morse, Theodore F., Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing.
  16. Lee,Jai Dong; Hwang,Ki Hyun; Ko,Chang Hyun, Method and apparatus for supplying a source gas.
  17. Christenson Kurt K., Method and system to control the concentration of dissolved gas in a liquid.
  18. Ishihara, Tomohiro; Furukawa, Masato, Method for manufacturing glass-fine-particle-deposited body and method for manufacturing glass base material.
  19. Fabian, Heinz, Method for producing synthetic quartz glass.
  20. Fabian, Heinz; Roeper, Juergen, Method for producing synthetic quartz glass.
  21. Fabian, Heinz; Roeper, Juergen, Method for producing synthetic quartz glass.
  22. Steven L. Nelson ; Kurt K. Christenson, Method for treating a substrate with heat sensitive agents.
  23. Nelson, Steven L.; Christenson, Kurt K., Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized.
  24. Steven L. Nelson ; Kurt K. Christenson, Method to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized.
  25. Partus Fred Paul, Methods of and systems for vapor delivery control in optical preform manufacture.
  26. O\Connor Paul B. (Plainfield NJ) Pearson Arthur D. (Bernardsville NJ), Optical fiber fabrication method and apparatus.
  27. Moriyama, Masashi; Yamahira, Yutaka; Matsuyama, Yuji, Processing liquid supply unit.
  28. Hansen Keith J., Purging gas control structure for CVD chamber.
  29. Blankenship Michael G. (Corning NY), Reactant delivery system method.
  30. George-Gradon, Lewis; McPhee, Stephen William; Seakins, Paul John; Leonard, Peter John, Respiratory humidification system.
  31. Gradon, Lewis George; McPhee, Stephen William; Seakins, Paul John; Leonard, Peter John, Respiratory humidification system.
  32. Gradon,Lewis George; McPhee,Stephen William; Seakins,Paul John; Leonard,Peter John, Respiratory humidification system.
  33. Gradon,Lewis George; McPhee,Stephen William; Seakins,Paul John; Leonard,Peter John, Respiratory humidification system.
  34. Gradon,Lewis George; McPhee,Stephen William; Seakins,Paul John; Leonard,Peter John, Respiratory humidification system.
  35. Lewis George Gradon NZ; Stephen William McPhee NZ; Paul John Seakins NZ; Peter John Leonard NZ, Respiratory humidification system.
  36. McPhee, Stephen William, Respiratory humidification system.
  37. McPhee, Stephen William, Respiratory humidification system.
  38. Fairbourn,David C., Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings.
  39. Fairbourn, David C., Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings.
  40. Hong, Jong-Won; Jeong, Min-Jae; Na, Heung-Yeol; Kang, Eu-Gene; Chang, Seok-Rak, Source gas supply unit, and deposition apparatus and method using the same.
  41. Nelson Steven L. ; Christenson Kurt K., System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in.
  42. LeMay Dan B. (1736 Addison Rd. Palos Verdes Estates CA 90724), Vapor feed regulator.
  43. McMenamin Joseph C. (Fresno CA), Vapor mass flow control system.
  44. McMenamin Joseph C. (Oceanside CA), Vapor mass flow control system.
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