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Complex salt photoinitiator 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C07F-009/90
출원번호 US-0051901 (1979-06-25)
발명자 / 주소
  • Smith George H. (Maplewood MN) Olofson Peter M. (North Saint Paul MN)
출원인 / 주소
  • Minnesota Mining and Manufacturing Company (Saint Paul MN 02)
인용정보 피인용 횟수 : 33  인용 특허 : 5

초록

A triarylsulfonium complex salt is described which has particular utility as a photoinitiator for the polymerization of epoxide monomers in thick films or coatings. Photopolymerizable compositions are also described.

대표청구항

The process for the preparation of a triarylsulfonium hexafluoroantimonate salt comprising the steps of (a) providing an aqueous solution of a watersoluble triarylsulfonium salt; (b) adding solid NaSbF6 or KSbF6 to said aqueous solution to form a mixture; and (c) recovering triarylsulfonium hexafluo

이 특허에 인용된 특허 (5)

  1. Crivello James V. (Elnora NY), Cationically polymerizable compositions containing group VIa onium salts.
  2. Crivello James V. (Elnora NY), Method for making certain halonium salt photoinitiators.
  3. Crivello ; James V., Photocurable epoxy compositions containing group Va onium salts.
  4. Crivello James V. (Clifton Park NY), Photoinitiators.
  5. Crivello James V. (Elnora NY), Photoinitiators.

이 특허를 인용한 특허 (33)

  1. Keite-Telgenbüscher, Klaus; Reichenbach, Anita; Schuh, Christian, Adhesive compound with reduced yellowness index.
  2. Ide, Masahito; Manabe, Takao; Seino, Makoto, Alkali-developable curable composition, insulating thin film using the same, and thin film transistor.
  3. Koleske Joseph V. (Charleston WV) McCarthy ; Jr. Neil J. (Brookfield CT), Blends of epoxides and monoepoxides.
  4. Koleske Joseph V. (Charleston WV), Conformal coatings cured with actinic radiation.
  5. Krawinkel, Thorsten; Keite-Telgenbüsher, Klaus; Grünauer, Judith; Ellinger, Jan, Cross-linkable adhesive compound with hard and soft blocks as a permeant barrier.
  6. Ichiryu, Yoshikatsu; Ouchi, Katsuya, Curable composition.
  7. Kaisaki David A. ; Mitra Sumita B. ; Schultz William J. ; DeVoe Robert J., Dental visible light curable epoxy system with enhanced depth of cure.
  8. Carter, James Wells; Marks, Maurice J.; Valette, Ludovic; Gulyas, Gyongyi, Divinylarene dioxide resin compositions.
  9. Tsuchiya Hiroshi (Tokyo JPX) Morio Kazuhiko (Tokyo JPX) Murase Hisashi (Tokyo JPX) Ohkawa Kazuo (Tokyo JPX), Energy beam curable composition.
  10. Ushiwata, Takami; Hirano, Koki; Tajiri, Kozo; Makino, Tomomi, Flexible optical waveguide and process for its production.
  11. Roman Robert ; Wittig James, Low friction coated substrate.
  12. Arao,Kei; Nomura,Makoto, Negative type photosensitive resin composition containing a phenol-biphenylene resin.
  13. Arao,Kei; Nomura,Makoto, Negative-type photosensitive resin composition containing epoxy compound.
  14. Ushiwata, Takami; Hirano, Koki; Tajiri, Kozo; Makino, Tomomi, Optical waveguide substrate with optical fiber fixation groove, process for its production, stamps for use in this production process, and opto-electronic hybrid integrated module including said optical waveguide substrate.
  15. Koleske Joseph V. (Charleston WV) Kwiatkowski George T. (Green Brook NJ), Photo curable blends of 2-methyoxytetrahydropyran and a cycloaliphatic diepoxide.
  16. Yamamoto, Katsumasa; Yamaguchi, Hirofumi; Suzuki, Michio, Photoacid generator and photoreactive composition.
  17. Koleske Joseph V. (Charleston WV), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials.
  18. Koleske Joseph V. (Charleston WV) Kwiatkowski George T. (Green Brook NJ), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphati.
  19. Koleske Joseph V. (Charleston WV), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl conte.
  20. Koleske Joseph V. (Charleston WV) Kwiatkowski George T. (Green Brook NJ), Photocopolymerizable compositions based on hydroxyl-containing organic materials and substituted cycloaliphatic monoepox.
  21. Koleske Joseph V. (Charleston WV), Photocopolymerizable compositons based on epoxy and polymer/hydroxyl-containing organic materials.
  22. Crivello James V. (Clifton Park NY), Photoinitiators.
  23. Gelorme Jeffrey D. (Binghamton NY) Cox Robert J. (Watsonville CA) Gutierrez Sergio A. R. (San Jose CA), Photoresist composition and printed circuit boards and packages made therewith.
  24. Ranjit Malik ; Julie Clonan, Pressure sensitive adhesive tape and silicone-free release coating used therein.
  25. Bennett Greggory S. ; George Clayton A. ; Hitschmann Guido,DEX ; Lamon Alain H.,FRX, Pressure-sensitive adhesive tape.
  26. Jonckers Kees (Roosteren NLX) Burks Henk C. (Oirsbeek NLX), Process for concentrating an urea solution by evaporation.
  27. David A. Smetana ; Joseph V. Koleske, Radiation-curable compositions and cured articles.
  28. Smetana, David A.; Koleske, Joseph V., Radiation-curable compositions and cured articles.
  29. Sakai,Nobuji; Tada,Kentaro, Radiation-sensitive negative-type resist composition for pattern formation method.
  30. Buchwalter Stephen Leslie ; Gelorme Jeffrey Donald ; LaBianca Nancy C. ; Shaw Jame M., Strippable photoimageable compositions.
  31. Liu,Yuxia; Herr,Donald E., Sulfonium salt photinitiators and use thereof.
  32. Liu, Yuxia; Herr, Donald E., Sulfonium salt photoinitiators and use thereof.
  33. Bany Stephen W. (St. Paul MN) Wood Leigh E. (St. Paul MN), Supported photoinitiator.
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