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Semiconductor photoelectric conversion device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-031/06
출원번호 US-0058077 (1979-07-16)
우선권정보 JP-0086867 (1978-07-17); JP-0086868 (1978-07-17)
발명자 / 주소
  • Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku
  • Tokyo JPX)
인용정보 피인용 횟수 : 49  인용 특허 : 1

초록

A semiconductor photoelectric conversion device employing a semiconductor layer which has at least one inter-semiconductor heterojunction. The semiconductor layer is composed of at least a first non-single-crystal semiconductor region having a first energy gap, a second non-single-crystal semiconduc

대표청구항

A semiconductor photoelectric conversion device employing a semiconductor layer having at least one inter-semiconductor heterojunction, which comprises at least a first non-single-crystal semiconductor region having a first energy gap, a second non-single-crystal semiconductor region having a second

이 특허에 인용된 특허 (1)

  1. Pankove ; Jacques Isaac, Amorphous silicon-amorphous silicon carbide photovoltaic device.

이 특허를 인용한 특허 (49)

  1. Gau Shek-Chung (Hamilton Township ; Mercer County NJ) Dalal Vikram L. (Lawrenceville NJ), Amorphous silicon carbide method.
  2. Lee, Sang Gi, CMOS image sensor.
  3. Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Tokyo JPX), Electrostatic photocopying machine.
  4. Yamazaki Shunpei (Tokyo JPX), Electrostatic photocopying machine.
  5. Dalal, Vikram L., High efficiency thin-film multiple-gap photovoltaic device.
  6. Ross ; deceased Bernd (late of San Diego CA) Bickler Donald B. (Temple City CA) Gallagher Brian D. (Costa Mesa CA), Increased voltage photovoltaic cell.
  7. Yamazaki Shunpei (Tokyo JPX), Insulated gate field effect transistor and its manufacturing method.
  8. Yamazaki Shunpei,JPX, Insulated gate field effect transistor and its manufacturing method.
  9. Yamazaki, Shunpei, Insulated gate field effect transistor and its manufacturing method.
  10. Lee, Sang Gi, Method for fabricating vertical CMOS image sensor.
  11. Yamazaki Shunpei,JPX, Method for manufacturing semiconductor sensitive devices.
  12. Ovshinsky Stanford R. (Bloomfield Hills MI) Izu Masatsugu (Birmingham MI), Method for optimizing photoresponsive amorphous alloys and devices.
  13. Yamazaki, Shunpei, Method of forming a semiconductor device including recombination center neutralizer.
  14. Katayama Yoshifumi (Tokorozawa JPX) Shimada Toshikazu (Tokyo JPX) Maruyama Eiichi (Kodaira JPX), Method of forming passivated polycrystalline semiconductors.
  15. John Puthenveetil K. (214 Wychwood Park London ; Ontario CAX N6G 1S3) Tong Bok Y. (2 Milford Crescent London ; Ontario CAX N5X 1A8) Wong Sau K. (673 Cranbrook Rd. London ; Ontario CAX N6K 1W8) Chik K, Method of making highly stable modified amorphous silicon and germanium films.
  16. Shotaro Okabe JP; Yasushi Fujioka JP; Masahiro Kanai JP; Akira Sakai JP; Tadashi Sawayama JP; Yuzo Kohda JP; Tadashi Hori JP; Takahiro Yajima JP, Method of manufacturing photovoltaic element and apparatus therefor.
  17. Yamazaki, Shunpei, Operation method of semiconductor devices.
  18. Yamazaki, Shunpei, Operation method of semiconductor devices.
  19. Ogawa Kyosuke (Tokyo JPX) Shirai Shigeru (Yamato JPX) Kanbe Junichiro (Yokohama JPX) Saitoh Keishi (Tokyo JPX) Osato Yoichi (Yokohama JPX), Photoconductive member with a 상세보기
  • Ogawa Kyosuke (Tokyo JPX) Shirai Shigeru (Yamato JPX) Kanbe Junichiro (Yokohama JPX) Saitoh Keishi (Tokyo JPX) Osato Yoichi (Yokohama JPX), Photoconductive member with a 상세보기
  • Ogawa Kyosuke (Sakurashinmachi JPX) Shirai Shigeru (Yamato JPX) Kanbe Junichiro (Yokohama JPX) Saitoh Keishi (Tokyo JPX) Osato Yoichi (Kawasaki JPX), Photoconductive member with a -Si having two layer regions.
  • Yamazaki Shunpei,JPX, Photoelectric conversion device.
  • Yamazaki, Shunpei, Photoelectric conversion device and method of making the same.
  • Yamazaki, Shunpei, Photoelectric conversion device and method of making the same.
  • Yagi, Shigeru, Portable information device.
  • Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Printing member for electrostatic photocopying.
  • Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Printing member for electrostatic photocopying.
  • Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Printing member for electrostatic photocopying.
  • Yamazaki Shunpei (Tokyo JPX), Printing member for electrostatic photocopying.
  • Yamazaki Shunpei (Tokyo JPX), Printing member for electrostatic photocopying.
  • Yamazaki Shunpei (Tokyo JPX), Printing member for electrostatic photocopying.
  • Yoshino Masaaki (Kobe JPX) Nanao Tsutomu (Kobe JPX), Process for preparing amorphous silicon semiconductor.
  • Yamazaki Shunpei (Tokyo JPX) Nagata Yujiro (Ichikawa JPX), Semiconductor MIS field effect transistor with semi-amorphous semiconductor material.
  • Shunpei Yamazaki JP; Yujiro Nagata JP, Semiconductor device.
  • Yamazaki Shunpei,JPX ; Nagata Yujiro,JPX, Semiconductor device.
  • Yamazaki, Shunpei; Nagata, Yujiro, Semiconductor device.
  • Akiharu Miyanaga JP; Hisashi Ohtani JP; Satoshi Teramoto JP, Semiconductor device and method for manufacturing the same.
  • Yamazaki,Shunpei, Semiconductor device having a non-single crystalline semiconductor layer.
  • Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX) Nagata Yujiro (Ichikawa JPX), Semiconductor device of non-single crystal structure.
  • Lyding, Joseph W.; Hess, Karl, Semiconductor devices, and methods for same.
  • Yamazaki Shunpei,JPX, Semiconductor having low concentration of carbon.
  • Yamazaki Shunpei,JPX, Semiconductor having low concentration of phosphorous.
  • Shunpei Yamazaki JP, Semiconductor material having particular oxygen concentration and semiconductor device comprising the same.
  • Yamazaki Shumpei (Tokyo JPX), Semiconductor photoelectric conversion device.
  • Yamazaki Shunpei (Tokyo JPX), Semiconductor photoelectric conversion device.
  • Yamazaki, Shunpei, Semiconductor photoelectric conversion device.
  • Yamazaki, Shunpei, Semiconductor photoelectrically sensitive device.
  • Tabei Masatoshi (Asaka JPX) Ikeda Mitsuru (Asaka JPX) Nakajima Yosuke (Fujinomiya JPX), Solid state image device.
  • Nakagawa Katsumi (Tokyo JPX) Komatsu Toshiyuki (Yokohama JPX) Osada Yoshiyuki (Yokosuka JPX) Omata Satoshi (Tokyo JPX) Hirai Yutaka (Tokyo JPX) Nakagiri Takashi (Tokyo JPX), Thin film transistor having polycrystalline silicon layer with 0.01 to 5 atomic % chlorine.
  • 문의처: helpdesk@kisti.re.kr전화: 080-969-4114

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