초록 ▼

In apparatus having a work chamber in which workpieces are treated under high vacuum, that improvement comprising an inner chamber having a capacity for a plurality of workpieces, an outer chamber, vacuum means for evacuating the inner and outer chambers, a first valve for sealing between the work c

In apparatus having a work chamber in which workpieces are treated under high vacuum, that improvement comprising an inner chamber having a capacity for a plurality of workpieces, an outer chamber, vacuum means for evacuating the inner and outer chambers, a first valve for sealing between the work chamber and the inner chamber, a second valve for sealing between the inner and outer chambers, a third valve for sealing between the outer chamber and the atmosphere, loading means for loading workpieces through the third valve into the outer chamber from the atmosphere, and transfer means for transferring individual workpieces through the second valve between the inner and outer chambers, and for transferring individual workpieces through the first valve between the inner chamber and the work chamber.

대표청구항 ▼

A lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system in which the workpieces are to be treated by an electron beam in a high vacuum, a combination comprising: an inner chamber positioned adjacent said work chamber and having a capacity f

A lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system in which the workpieces are to be treated by an electron beam in a high vacuum, a combination comprising: an inner chamber positioned adjacent said work chamber and having a capacity for storing a plurality of either treated or untreated workpieces; an outer chamber positioned adjacent said inner chamber; vacuum means for evacuating and maintaining a high vacuum in said inner and outer chambers; a first valve for effecting a vacuum seal between said work chamber and said inner chamber; a second valve for effecting a vacuum seal between said inner and said outer chamber; a third valve for effecting a vacuum seal between said outer chamber and the atmosphere, to thereby form an entrance lock; loading means positioned adjacent said outer chamber for loading workpieces through said entrance lock into said outer chamber from the atmosphere, said loading means including elevator means for holding multiple workpieces and a pinion and rack means for precision movement of an individual workpiece through said entrance lock; transfer means for transferring individual workpieces through said second valve means between said inner and outer chambers, and for transferring individual workpieces through said first valve between said inner chamber and said work chamber, said transfer means including rack and pinion means; and a fourth valve for effecting a vacuum seal between said outer chamber and the atmosphere, said fourth valve being positioned on said outer chamber on the opposite side of said outer chamber from said third valve, said fourth valve forming an exit lock.