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Photopolymerizable compositions, methods for their preparation, and methods for their use in coating substrates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0080545 (1979-10-01)
우선권정보 GB-0039149 (1978-10-03)
발명자 / 주소
  • Davies William D. (Littleborough GB2) Skelhorne Graham G. (Prestwich GB2) Warren John B. (Malpas GB2)
출원인 / 주소
  • Diamond Shamrock Industrial Chemicals Limited (GB3 03)
인용정보 피인용 횟수 : 23  인용 특허 : 8

초록

A photopolymerisable composition particularly useful as a solder resist composition able to withstand molten solder without loss of adhesion, pitmarks or shrinkage and for forming durable coatings on substrates generally is obtained by a combination of a photoinitiator, a polythiol acting as a chain

대표청구항

A process for soldering electrical components on a circuit board which comprises protecting areas of the board by applying thereto a photopolymerisable liquid composition which on curing forms a solder resist and which comprises a polymerisable component which is a polymer having an average of at le

이 특허에 인용된 특허 (8)

  1. Ohmura Kaoru (Fuji JPX) Shibasaki Ichiro (Fuji JPX) Kimura Takeo (Fuji JPX) Kimura Muneaki (Fuji JPX), Heat resistant photoresist composition and process for preparing the same.
  2. Selley Jeffrey E. (East Amherst NY), High impact corrosion resistant polymers.
  3. Chang ; Wen-Hsuan, Method of curing B-stage polyurethanes.
  4. Williams ; Ralph P., Photocurable diisocyanate compositions.
  5. Lipson Melvin A. (Fullerton CA) Knoth Dale W. (Norwalk CA) Custer Walter D. (Garden Grove CA) Gilano Michael N. (Fullerton CA), Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions.
  6. Tsukada Katsushige (Hitachi JA) Isobe Asao (Hitachi JA) Hayashi Nobuyuki (Hitachi JA) Abo Masahiro (Hitachi JA) Ogawa Ken (Hitachi JA), Photosensitive epoxy-acrylate resin compositions.
  7. Lipson Melvin A. (Fullerton CA) Knoth Dale W. (Norwalk CA) Custer Walter D. (Garden Grove CA) Gilano Michael N. (Fullerton CA), Process for treating selected areas of a surface with solder.
  8. Ketley ; Arthur Donald ; Hein ; Paul Richard ; Yang ; Michael Wen-Chie n, Radiation curable compositions for coating and imaging processes and method of use.

이 특허를 인용한 특허 (23)

  1. Van Dijk, Joseph Theodorus Maria, Composition comprising mercapto-functional compounds.
  2. Goforth Melvin L. (7619 Hermosa Amarillo TX 79108) Russell Richard G. (6607 Roxton Amarillo TX 79109), Electronic assembly process and apparatus.
  3. Ohotoshi Sachio (Yokohama JPX) Hase Fumio (Yokohama JPX), Method for soldering an electrical product.
  4. Hladovcak Raymond C. (Seneca IL) Keating Walter W. (Oswego IL), Method of manufacturing printed circuit boards.
  5. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing EPOXY three-dimensional objects from materials having multiple mechanisms of hardening.
  6. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Methods of producing polyurea three-dimensional objects from materials having multiple mechanisms of hardening.
  7. Morikawa Takao (Tougane JPX) Kobayasi Tosio (Ichihara JPX) Kataoka Masayuki (Ichihara JPX) Mori Atsushi (Chiba JPX), Photo-curable urethane-acrylate resin composition for permanent resist.
  8. Patel, Ranjana; Rhodes, Michael; Zhao, Yong, Photocurable compositions.
  9. Hein Paul R. (Marietta GA) Miller Henry C. (Douglasville GA) Brewster W. Darlene (Marietta GA), Photopolymer for use as a solder mask.
  10. Ishimaru, Toshiaki; Tsukada, Katsushige; Hayashi, Nobuyuki, Photosensitive resin composition and photosensitive element.
  11. Lin Wei Y. (Marietta GA), Polymer composition for photoresist application.
  12. Tsao Jung-Hsien (Marietta GA) Hein Paul R. (Atlanta GA), Polymer composition having terminal alkene and terminal carboxyl groups.
  13. Tsao Jung-Hsien (Marietta GA) Hein Paul R. (Atlanta GA), Polymer composition having terminal alkene and terminal carboxyl groups.
  14. Tsao, Jung-Hsien; Hein, Paul R., Polymer composition having terminal alkene and terminal carboxyl groups.
  15. Rolland, Jason P.; Chen, Kai; Poelma, Justin; Goodrich, James; Pinschmidt, Robert; DeSimone, Joseph M.; Robeson, Lloyd M., Polyurea resins having multiple mechanisms of hardening for use in producing three-dimensional objects.
  16. Wang, Chia L.; Davis, John M.; Lienke, Bryan, Polyurethane systems having non-sag and paintability.
  17. Kondo,Koji; Kataoka,Ryohei; Yokochi,Tomohiro; Nakagoshi,Makoto; Murai,Tadashi; Hayashi,Akimori; Suzuki,Katsunobu, Printed circuit board having colored outer layer.
  18. Tomovic, Zeljko; Jacobmeier, Olaf; Kampf, Gunnar, Process for producing rigid polyurethane foams.
  19. Ohta Tomohisa (Shimodate JPX) Dobashi Akihiko (Shimodate JPX) Seki Yasuyuki (Hitachi JPX), Radiation curable pressure-sensitive adhesive composition.
  20. Drain Kieran F. (Meridan CT) Summers Robert (Middletown CT) Nativi Larry A. (Rocky Hill CT), Radiation curable temporary solder mask.
  21. Leach Douglas R. (Wilmington DE), Soft relief photopolymer printing plates for flexographic printing.
  22. Banerjee Hari N. (Rexdale CAX), Solder resist paste and method of soldering.
  23. Hung Paul (Edison NJ) Tseng Kenneth (Piscatawy NJ), UV curable compositions for making improved solder mask coatings.
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