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Method of treating object by laser beam and apparatus therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23K-027/00
출원번호 US-0016167 (1979-02-28)
우선권정보 JP-0023525 (1978-03-03)
발명자 / 주소
  • Inagaki Masahisa (Hitachi JPX) Jinbou Ryutarou (Hitachiota JPX) Unino Tomio (Hitachi JPX) Shida Tomohiko (Hitachi JPX)
출원인 / 주소
  • Hitachi, Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 45  인용 특허 : 6

초록

There are disclosed a laser treatment method and an apparatus therefor in which a laser beam is irradiated on an object to be treated. The laser beam emitted from a laser apparatus is divided into a plurality of fractional beams, and the fractional laser beams are reflected toward and irradiated on

대표청구항

A method of treating an object by a laser beam in which the object to be treated is irradiated by the laser beam, comprising the steps of: emitting a laser beam having a non-uniform symmetrical pattern of energy distribution from a laser apparatus; dividing said laser beam along at least one line of

이 특허에 인용된 특허 (6)

  1. Kocher ; Robert C. ; Piorkow ; Alfred, Beam splitting system for a welding laser.
  2. Peters ; George T. ; Melikian ; Gorken ; Biancardi ; Frank R., Laser beam welding apparatus.
  3. Luck ; Jr. Clarence F. (Waltham MA) Bowness Colin (Weston MA), Laser material removal apparatus.
  4. Ehlscheid Gunter (Neuwied DT) Langenbeck Peter (Frickingen DT) Stemmler Kurt (Neuwied DT), Method of cutting material to shape from a moving web by burning.
  5. Steen William M. (Teddington GB2), Methods and apparatus for cutting and welding.
  6. Whittle ; Harry Reed ; Ward ; Brooke Armitage, Optical systems including polygonal mirrors rotatable about two axes.

이 특허를 인용한 특허 (45)

  1. Camm,David Malcolm; Bumbulovic,Mladen; Cibere,Joseph; Elliott,J. Kiefer; McCoy,Steve; Stuart,Greg, Apparatuses and methods for suppressing thermally-induced motion of a workpiece.
  2. Kondo, Kiyoyuki, Beam processor.
  3. Kuester, Matthias; Krieg, Christian; Kusnezow, Gennadij; Hueske, Marc, Device for machining a workpiece by means of parallel laser beams.
  4. Forrest, Mariana G.; Lu, Feng; Heinemann, Stefan; Schmidt, Torsten, Dual beam laser welding head.
  5. Wu Chung P. (Mercerville NJ), Electromagnetic radiation annealing of semiconductor material.
  6. Addleman, Robert L., Energy beam focusing apparatus and method.
  7. Camm, David Malcolm; Elliot, J. Kiefer, Heat-treating methods and systems.
  8. Camm, David Malcolm; Elliott, J. Kiefer, Heat-treating methods and systems.
  9. Camm, David Malcolm; Elliott, J. Kiefer, Heat-treating methods and systems.
  10. Yasumi Nagura JP; Michisuke Nayama JP; Takashi Ishide JP; Yoshio Hashimoto JP; Yukio Michishita JP; Koji Okimura JP, Laser beam machining head.
  11. Hashiura Masayoshi (Hitachi JPX) Okazaki Akiyasu (Hitachi JPX) Suzuki Sigeru (Hitachi JPX), Laser machining system.
  12. Neiheisel Gary L. (Cincinnati OH), Laser treatment of electrical steel and optical scanning assembly therefor.
  13. Schweizer Jurgen,DEX, Material irradiation apparatus with a beam source that produces a processing beam for a workpiece, and a process for operation thereof.
  14. L\Esperance ; Jr. Francis A. (Englewood NJ), Method and apparatus for enhanced vascular or other growth.
  15. Liu Kuo-Ching (Setauket NY), Method and apparatus for laser beam homogenization.
  16. Wada Kenya,JPX ; Ichikawa Hisayoshi,JPX ; Kinoshita Kazuto,JPX ; Sugizaki Shinji,JPX, Method and apparatus for laser-texturing disk surfaces.
  17. Hayashi, Kenichi, Method for making marks in a transparent material by using a laser.
  18. Kenichi Hayashi JP, Method for making marks in a transparent material by using a laser.
  19. Kenichi Hayashi JP, Method for making marks in a transparent material by using a laser.
  20. Kenichi Hayashi JP, Method for making marks in a transparent material by using a laser.
  21. Asscher, Micha; Kerner, Gabriel, Method for manufacturing a patterned structure.
  22. Kasten Alan J. (Palm Bay FL), Method for providing polysilicon thin films of improved uniformity.
  23. Kugimiya Koichi (Toyonaka JPX) Akiyama Shigenobu (Hirakata JPX) Fuse Genshu (Hirakata JPX), Method of fabricating a multi-layer type semiconductor device including crystal growth by spirally directing energy beam.
  24. Inoue Tomoyasu (Tokyo JPX) Tango Hiroyuki (Yokohama JPX) Suguro Kyoichi (Kawasaki JPX) Higashinakagawa Iwao (Kawasaki JPX) Hamasaki Toshihiko (Kawasaki JPX), Method of forming a single crystal semiconductor layer from a non-single crystalline material by a shaped energy beam.
  25. Sheets Ronald E. (Santa Ana CA), Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation la.
  26. Kuhn-Kuhnenfeld Franz (Emmerting DEX) Kramler Josef (Burgkirchen DEX) Gerber Hans-Adolf (Burghausen DEX), Method of making reference surface markings on semiconductor wafers by laser beam.
  27. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
  28. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
  29. Reynolds George O. (Waban MA), Optical lithographic system.
  30. Reynolds George O. (Waban MA), Optical lithographic system having a dynamic coherent optical system.
  31. Tatsuki Okamoto JP; Tetsuya Ogawa JP; Keisuke Furuta JP; Hidetada Tokioka JP; Tomohiro Sasagawa JP; Junichi Nishimae JP; Mitsuo Inoue JP; Yukio Sato JP, Optical system and apparatus for laser heat treatment and method for producing semiconductor devices by using the same.
  32. Kasten Alan J. (Palm Bay FL), Polysilicon thin films of improved electrical uniformity.
  33. Klopotek Peter J., Profiling the intensity distribution of optical beams.
  34. Eurlings, Markus Franciscus Antonius; Kleemans, Niek Antonius Jacobus Maria; Van Dijsseldonk, Antonius Johannes Josephus; Hofstra, Ramon Mark; Noordman, Oscar Franciscus Jozephus; Pham, Tien Nang; Van Schoot, Jan Bernard Plechelmus; Wang, Jiun-Cheng; Zhang, Kevin Weimin, Radiation source.
  35. Sasaki, Yoshiharu, Recording apparatus having a rectangular parallelepiped light intensity distribution.
  36. Kimura Seiichirou (Koganei JPX), Reflection type optical device.
  37. Telfair William B. (Newtown CT) Yoder ; Jr. Paul R. (Wilton CT) Martin Clifford A. (Bridgeport CT) L\Esperance ; Jr. Francis A. (Englewood NJ), Sculpture apparatus for correcting curvature of the cornea.
  38. Miyamoto Noriaki (Toyota JPX) Inoue Norio (Takahama JPX), Spinning rotor in an open-end spinning frame.
  39. Camm, David Malcolm; Cibere, Joseph; Bumbulovic, Mladen, Systems and methods for supporting a workpiece during heat-treating.
  40. Camm,David M.; Kervin,Shawna; Lefrancois,Marcel Edmond; Stuart,Greg, Temperature measurement and heat-treating methods and system.
  41. Camm, David M.; Kervin, Shawna; Lefrancois, Marcel Edmond; Stuart, Greg, Temperature measurement and heat-treating methods and systems.
  42. Rapoport, Alex, Thermal energy applicator.
  43. Banas Conrad M. (Bolton CT) Doyle Brian M. (East Hartford CT), Twin spot laser welding.
  44. Doyle Walter M. (Laguna Beach CA), Versatile and efficient radiation transmission apparatus and method for spectrometers.
  45. Camm, David Malcolm; Cibere, Joseph; Stuart, Greg; McCoy, Steve, Workpiece breakage prevention method and apparatus.
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