초록 ▼

An apparatus for cleaning a surface of an article such as a semiconductor wafer with cleaning fluid includes a nozzle extending from a chamber for developing a jet of cleaning fluid. The fluid is pressurized and megasonic energy is applied to the fluid by a megasonic transducer. The nozzle is shaped

An apparatus for cleaning a surface of an article such as a semiconductor wafer with cleaning fluid includes a nozzle extending from a chamber for developing a jet of cleaning fluid. The fluid is pressurized and megasonic energy is applied to the fluid by a megasonic transducer. The nozzle is shaped to provide a ribbon-like jet of cleaning fluid vibrating at megasonic frequencies for impingement on the surface of the article.

대표청구항 ▼

An apparatus for cleaning a surface of an article with cleaning fluid comprising: nozzle means incluing a nozzle and a chamber for developing a jet of cleaning fluid; said chamber formed of a generally hollow cylinder having two open ends; means for coupling pressurized fluid at a pressure of about

An apparatus for cleaning a surface of an article with cleaning fluid comprising: nozzle means incluing a nozzle and a chamber for developing a jet of cleaning fluid; said chamber formed of a generally hollow cylinder having two open ends; means for coupling pressurized fluid at a pressure of about 20 psi to the chamber; and an electrically energized megasonic transducer coupled to one end of the chamber to impart megasonic energy to the fluid, said nozzle coupled to the other end of said chamber and formed of a tapered section to an opening to develop a ribbon-like jet of cleaning fluid vibrating at ultrasonic frequencies the taper of said nozzle being at an angle of about 30°to reduce out-of-phase and back reflections of energy waves in the nozzle.