초록 ▼

A reaction bonded silicon oxynitride product having a density of 85 to 95% of theoretical density, a degree of density heretofore not attainable by sintering or reaction bonding. Such high densities are attained by nitriding, in an oxygen free atmosphere ultra fine silicon and ultra fine silica in t

A reaction bonded silicon oxynitride product having a density of 85 to 95% of theoretical density, a degree of density heretofore not attainable by sintering or reaction bonding. Such high densities are attained by nitriding, in an oxygen free atmosphere ultra fine silicon and ultra fine silica in the presence of certain reaction aids. The particle size of the silicon powder must be at least as fine as about 3 microns and the silica as fine as about 0.3 microns.

대표청구항 ▼

A silicon oxynitride product consisting essentially of from 90 to 98% by weight of silicon oxynitride and 2 to 10% by weight of a minor glassy phase, said glassy phase being composed of silica and a minor quantity of a second metal oxide; said product being from about 85 to about 95% of theoretical

A silicon oxynitride product consisting essentially of from 90 to 98% by weight of silicon oxynitride and 2 to 10% by weight of a minor glassy phase, said glassy phase being composed of silica and a minor quantity of a second metal oxide; said product being from about 85 to about 95% of theoretical density and having a microstructure which is a network of oxynitride crystal clusters with said minor glassy phase being located primarily in the interstices formed by the silicon oxynitride network.