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Surface processing apparatus utilizing microwave plasma 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-015/00
  • C23F-001/00
출원번호 US-0208404 (1980-11-19)
우선권정보 JP-0150638 (1979-11-22)
발명자 / 주소
  • Hirose Masahiko (Yokohama JPX) Yasui Tsuyoshi (Yokohama JPX) Yotuyanagi Masahiko (Yokohama JPX)
출원인 / 주소
  • Tokyo Shibaura Denki Kabushiki Kaisha (Kawasaki JPX 03)
인용정보 피인용 횟수 : 42  인용 특허 : 1

초록

There is provided an apparatus for processing a surface of an object to be processed by utilizing microwave plasma within a plasma-producing chamber, which comprises a microwave power-generating means; a wave guide for transmitting microwaves generated from said microwave power-generating means; a c

대표청구항

An apparatus for processing a surface of an object to be processed by utilizing microwave plasma within a plasma producing chamber, which comprises; a microwave power-generating means; a wave guide for transmitting microwaves generated by said microwave power-generating means; a closed vessel consti

이 특허에 인용된 특허 (1)

  1. Hirose Masahiko (Yokohama JPX) Akai Yoshimi (Yokohama JPX), Surface treating apparatus utilizing plasma generated by microwave discharge.

이 특허를 인용한 특허 (42)

  1. Carr,Jeffrey W., Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces.
  2. Efthimion Philip C. (Bedminister NJ) Helfritch Dennis J. (Flemington NJ), Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequenc.
  3. Kanai Masahiro,JPX ; Matsuda Koichi,JPX, Apparatus for continuously forming a large area deposited film by means of microwave plasma CVD process.
  4. Hirose Masahiko (Yokohama JPX) Nishida Katsutoshi (Yokohama JPX), Apparatus for treating powdery materials utilizing microwave plasma.
  5. Popeil, Ronald M.; Backus, Alan Lester; Popeil, Kathryn; Popeil, Lauren; Popeil-Stairs, Shannon, Cooking device to deep fat fry foods.
  6. Kumihashi Takao,JPX ; Tsujimoto Kazunori,JPX ; Tachi Shinichi,JPX, Method and apparatus for dry etching.
  7. Kumihashi Takao,JPX ; Tsujimoto Kazunori,JPX ; Tachi Shinichi,JPX, Method and apparatus for dry etching.
  8. Kumihashi Takao,JPX ; Tsujimoto Kazunori,JPX ; Tachi Shinichi,JPX, Method and apparatus for dry etching.
  9. Kumihashi Takao,JPX ; Tsujimoto Kazunori,JPX ; Tachi Shinichi,JPX, Method and apparatus for dry etching.
  10. Kumihashi,Takao; Tsujimoto,Kazunori; Tachi,Shinichi, Method and apparatus for dry etching.
  11. Saito Hiroshi (Yokohama JPX) Tateishi Hideki (Yokohama JPX) Kobayashi Shigeru (Tokyo JPX) Aiuchi Susumu (Yokohama JPX) Suzuki Yasumichi (Yokohama JPX) Sakata Masao (Yokohama JPX) Shimamura Hideaki (Y, Method and apparatus for sputtering.
  12. Tsu David V. (Rochester Hills MI) Young Rosa (Troy MI) Ovshinsky Stanford R. (Bloomfield Hills MI), Method and apparatus for the improved microwave deposition of thin films.
  13. Carr, Jeffrey W., Method for atmospheric pressure reactive atom plasma processing for surface modification.
  14. Kumihashi Takao (Musashino JPX) Tsujimoto Kazunori (Higashi JPX) Tachi Shinichi (Sayama JPX), Method for dry etching.
  15. Carr,Jeffrey W., Method for non-contact cleaning of a surface.
  16. Shinohara Kibatsu,JPX ; Ishida Satoru,JPX ; Ueyama Hiroyuki,JPX, Micro-wave plasma device with a metal cooling wire wrapped around the insulating tube.
  17. Ninomiya, Ken; Nishimatsu, Shigeru; Suzuki, Keizo; Okudaira, Sadayuki; Ogawa, Yoshifumi, Microwave plasma etching apparatus.
  18. Ribner Aaron (1327 Aaron Rd. North Brunswick NJ 08902), Microwave plasma etching machine and method of etching.
  19. Fujimura Shuzo,JPX ; Kisa Toshimasa,JPX ; Motoki Yasunari,JPX, Microwave plasma processing process and apparatus.
  20. Okamoto Yukio (Sagamihara JPX) Murayama Seiichi (Kokubunji JPX), Microwave plasma production apparatus.
  21. Nishimatsu Shigeru (Kokubunji JPX) Suzuki Keizo (Hachioji JPX) Sakudo Noriyuki (Ome JPX) Ninomiya Ken (Tokyo JPX) Koike Hidemi (Tokorozawa JPX) Okada Osami (Chofu JPX) Katagiri Shinjiro (Katsuta JPX), Microwave plasma source.
  22. Smith Donald K. (Arlington MA), Microwave reactive gas generator.
  23. Kumar, Satyendra; Kumar, Devendra, Plasma catalyst.
  24. Kumar,Satyendra; Kumar,Devendra, Plasma catalyst.
  25. Kumar, Satyendra; Kumar, Devendra, Plasma generation and processing with multiple radiation sources.
  26. Kumar,Satyendra; Kumar,Devendra, Plasma generation and processing with multiple radiation sources.
  27. Aklufi Monti E. (San Diego CA) Brock David W. (San Diego CA), Plasma generator utilizing dielectric member for carrying microwave energy.
  28. Kobashi Koji (Nishinomiya JPX) Nishimura Kozo (Kobe JPX) Miyata Koichi (Akashi JPX) Kawate Yoshio (Kobe JPX) Kumagai Kazuo (Kobe JPX) Suzuki Norio (Kobe JPX) Kawata Yutaka (Kobe JPX) Ishibashi Kiyota, Plasma reactor for diamond synthesis.
  29. Kumar,Devendra; Kumar,Satyendra, Plasma-assisted decrystallization.
  30. Kumar,Satyendra; Kumar,Devendra, Plasma-assisted doping.
  31. Kumar,Devendra; Kumar,Satyendra, Plasma-assisted enhanced coating.
  32. Kumar,Satyendra; Kumar,Devendra, Plasma-assisted formation of carbon structures.
  33. Kumar,Satyendra; Kumar,Devendra, Plasma-assisted gas production.
  34. Kumar, Satyendra; Kumar, Devendra; Dougherty, Michael L., Plasma-assisted heat treatment.
  35. Kumar, Devendra; Kumar, Satyendra, Plasma-assisted joining.
  36. Kumar,Devendra; Kumar,Satyendra, Plasma-assisted joining.
  37. Kumar,Satyendra; Kumar,Devendra, Plasma-assisted melting.
  38. Kumar,Devendra; Kumar,Satyendra, Plasma-assisted nitrogen surface-treatment.
  39. Dougherty, Sr., Michael L.; Kumar, Devendra; Kumar, Satyendra, Plasma-assisted processing in a manufacturing line.
  40. Tsutsui Koichi (Kyoto JPX) Ikeda Shoji (Osaka JPX) Nishizawa Koji (Osaka JPX) Yagi Makoto (Osaka JPX) Kubo Nobuaki (Osaka JPX), Powder treating method and apparatus used therefor.
  41. Liu, Yu-Cheng, Sputtering apparatus and manufacturing method of metal layer/metal compound layer by using thereof.
  42. Kumar,Satyendra; Kumar,Devendra; Tasch,Dominique; Stroebel,Raimund, Surface cleaning and sterilization.
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