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Calibratable system for measuring fluid flow

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01F-001/74
  • G01F-025/00
출원번호 US-0196410 (1980-10-14)
발명자 / 주소
  • Blair Richard F. (Fountain Valley CA) Beazley Ralph (Rancho Palos Verdes CA)
출원인 / 주소
  • Tylan Corporation (Carson CA 02)
인용정보 피인용 횟수 : 37  인용 특허 : 5

초록

A pair of mass flow sensors are used to separately monitor the mass flow rates of a carrier gas and of a mixture of carrier gas and source vapor formed a mixing station. The rates are compared, for example by substracting the carrier gas flow rate from the mixture flow rate, to generate a signal rep

대표청구항

A calibratable control system for accurately metering the amount of a predetermined liquid vaporized by a carrier gas passing therethrough independent of temperature and pressure changes, comprising: a mixing station for forming a mixture of said carrier gas and vaporized liquid; a flow controller c

이 특허에 인용된 특허 (5)

  1. King William R. (Bartlesville OK), Method and apparatus for measuring particulate matter flow rate.
  2. Cochran ; Jr. ; Henry D., Method of measuring the mass flow rate of a substance entering a cocurrent fluid stream.
  3. Hamalainen ; Veikko ; Aarnio ; Jaakko, Method of vaporizing liquids.
  4. Cota Marlo E. (Scottsdale AZ) Taylor Jerry A. (Tempe AZ), Pressure sensing method and apparatus for gases.
  5. Hirano ; Toru, System for monitoring flow rate difference in water cooling conduit.

이 특허를 인용한 특허 (37)

  1. Packer Louis L. (Enfield CT) Bosshart George S. (Vernon CT) Jaworowski Mark R. (Enfield CT) Kuntz Urban E. (East Hartford CT), Apparatus for controlling powder flow rate in a carrier gas.
  2. Lewis Gary W. (Fountain Valley CA), Calibration method for exhaust mass flow measuring system.
  3. Yamaguchi Takayuki,JPX ; Sato Yukito,JPX ; Shoji Hiroyoshi,JPX ; Azumi Junichi,JPX ; Kaminishi Morimasa,JPX, Calibration method of a flow sensor output.
  4. Kurki Jouko (Alkutie FIX) Sandvik rjan (Hulluksentie FIX) Nyrki-Mklin Tiina (Gresantie FIX), Calibration system for the calibration of mass flow controllers.
  5. Miller Charles E. ; Yoshida Louis T. ; Steinbach Michael, Clad piezoelectric valve actuator and application of same in controlling highly reactive and corrosive gases.
  6. Hudalla, Vernon R.; Johnson, Erik W.; Thiel, Michael G., Conveying system for injecting material at a convey line pressure.
  7. Johnson, Erik W.; Thiel, Michael G, Dispensing assembly with continuous loss of weight feed control.
  8. Silvis, William Martin; Kreft, Norbert; Marek, Gerald; Schindler, Wolfgang, Engine exhaust emissions measurement correction.
  9. Silvis, William Martin, Exhaust volume measurement device.
  10. Silvis, William Martin; Williamson, James, Exhaust volume measurement device.
  11. Silvis,William Martin; Kreft,Norbert; Marek,Gerald; Williamson,James, Exhaust volume measurement device.
  12. Silvis,William Martin; Kreft,Norbert; Marek,Gerald; Williamson,James, Exhaust volume measurement device.
  13. Tanaka, Yuki; Kashima, Toshihiro, Flow rate control device.
  14. Dmytriw, Anthony M.; Ricks, Lamar F., Flow sensor with conditioning-coefficient memory.
  15. Ito, Hiroyuki, Mass flow meter with self-diagnostic function and mass flow controller using the same.
  16. Beeson ; III James S. (Shreveport LA), Method and apparatus for determining the accuracy of a gas flow meter.
  17. Miller Charles E. (150 Seminole Boulder CO 80303) Waers John F. (123 Snowmass Pl. Longmont CO 80503) Magin James A. (8983 Walker Rd. Longmont CO 80503) Custer Randal L. (566 Mt. Evans Longmont CO 805, Method and apparatus for dispensing natural gas with pressure sensor calibration.
  18. Dmytriw,Anthony M., Method and system for providing a linear signal from a mass airflow and/or liquid flow transducer.
  19. Dmytriw,Anthony M., Method and system for providing a linear signal from a mass flow transducer.
  20. Shinagawa Keisuke,JPX ; Fujimura Shuzo,JPX ; Matoba Yuuji,JPX ; Nakano Yoshimasa,JPX ; Takeuchi Tatsuya,JPX ; Miyanaga Takeshi,JPX, Method for controlling apparatus for supplying steam for ashing process.
  21. Burress, Edward F.; Edwards, Michael Joel; Gault, Joseph Benjamin; Gordon, Michael Cameron; Bailly, Devin Richard; Weissig, Frank Alexander; Reeves, Barry Daniel, Method for sensing remaining life in a drum maintenance unit.
  22. Barbee Steven G. (Dover Plains NY) Devine Gregory P. (Poughquag NY) Patrick William J. (Newburgh NY) Seeley Gerard (Wappingers Falls NY), Method for vacuum vapor deposition with improved mass flow control.
  23. Albertz Theodor (Kirchhellen DEX) Von Tolkacz Theo (Essen DEX) Baumann Hans R. (Essen DEX), Method of determination and monitoring of fuel mass stream.
  24. Miller Charles E. ; Wyss Jerry C. ; Balsley ; Jr. Richard B., Micro mass flow control apparatus and method.
  25. Bey, Paul Prehn; Hoover, William; Speldrich, Jamie; Jones, Ryan, Modular sensor assembly including removable sensing module.
  26. Bey, Jr., Paul P.; Becke, Craig S.; Speldrich, Jamie W.; Blumhoff, Christopher M., Packaging multiple measurands into a combinational sensor system using elastomeric seals.
  27. Johnson, Erik W; Thiel, Michael G.; Lund, Mitchell J., Pneumatic conveying system utilizing a pressured hopper with intermittent volumetric feed control.
  28. Hsieh, Chung-Ju; Liao, Hsi-Wen; Liu, Kai-Hsin; Hou, Tsu-Kuang, Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz chamber.
  29. Hsieh,Chung Ju; Liao,Hsi Wen; Liu,Kai Hsin; Hou,Tsu Kuang, Real-time detection mechanism with self-calibrated steps for the hardware baseline to detect the malfunction of liquid vaporization system in AMAT TEOS-based Dxz chamber.
  30. Ricks, Lamar F.; Bey, Paul P., Self diagnostic measurement method to detect microbridge null drift and performance.
  31. Hirose, Masayuki; Okura, Shigeyuki, Source gas supply unit, film forming apparatus and source gas supply method.
  32. Mark C. Easton, System for and method of monitoring the flow of semiconductor process gases from a gas delivery system.
  33. Singh, Jag J.; Sprinkle, Danny R., Technique for measuring gas conversion factors.
  34. Dybdahl Bj.o slashed.rn,NOX, Use of a sampling apparatus for calibrating electronic mass/flow fraction meters in a pipeline.
  35. Barbee Steven G. (Dover Plains NY) Devine Gregory P. (Poughguag NY) Patrick William J. (Newburgh NY) Seeley Gerard (Wappingers Falls NY), Vacuum deposition system with improved mass flow control.
  36. Miller Charles E. ; Yoshida Louis T. ; Steinbach Michael, Valve closure seating method and apparatus.
  37. Gammon, James H., Valve system.
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