초록 ▼

A multi-layer photosensitive film resist (is provided) in which the photosensitive layers consists of a plurality of layers having different properties, e.g., greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provi

A multi-layer photosensitive film resist (is provided) in which the photosensitive layers consists of a plurality of layers having different properties, e.g., greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provided by the other layer.

대표청구항 ▼

Dry photosensitive resist film consisting of a temporary support film, thermoplastic photosensitive layer, and cover film, characterized by the photosensitive layer consisting of at least two partial layers, said cover film being strippable from its respective partial layer without removal of said t

Dry photosensitive resist film consisting of a temporary support film, thermoplastic photosensitive layer, and cover film, characterized by the photosensitive layer consisting of at least two partial layers, said cover film being strippable from its respective partial layer without removal of said temporary support film from its respective partial layer and the resultant bared surface of said partial layer having greater adhesion to copper than the adhesion of said temporary support film to its respective partial layer, the above general adhesion relationships of the photosensitive compositions of the partial layers being unchanged by exposure to actinic radiation.