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Magnetron cathode sputtering apparatus

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-015/00
출원번호 US-0233974 (1981-02-12)
발명자 / 주소
  • McKelvey Harold E. (Plymouth MI)
출원인 / 주소
  • Shatterproof Glass Corporation (Detroit MI 02)
인용정보 피인용 횟수 : 92  인용 특허 : 2

초록

A rotatable magnetron cathode sputtering apparatus for operation within an evacuable chamber for coating substrates that are also contained within said chamber. The cathode comprises an elongated cylindrical tube having a layer of the coating material or materials to be sputtered applied to the oute

대표청구항

A method of sputtering thin films of a selected coating material upon substantially planar substrates, in which there is provided an evacuated coating chamber enclosing an elongated, cylindrical tubular member having a layer of the coating material to be sputtered applied to the outer surface thereo

이 특허에 인용된 특허 (2)

  1. Blickensderfer Robert (Albany OR), Sputtering apparatus for coating elongated tubes and strips.
  2. Kuriyama Noboru (Kawasaki JPX), Sputtering device.

이 특허를 인용한 특허 (92)

  1. German,John R.; Crowley,Daniel T.; Meinke,Brian P.; Peterson,Roger L., Alternating current rotatable sputter cathode.
  2. Sieck Peter A. (Santa Rosa CA) Hill Russell J. (El Cerrito CA) Vossen John L. (Bridgewater NJ) Schulz Stephen C. (Benicia CA), Anode structure for magnetron sputtering systems.
  3. Dannenberg, Rand David, Anti-reflection coatings and associated methods.
  4. Manley Barry W., Apparatus and method for a magnetron cathode with moving magnet assembly.
  5. Fai Lai Kwok, Apparatus and method for improving target erosion in hollow cathode magnetron sputter source.
  6. Morgan Steven V. ; Vanderstraeten Johan,BEX ; Vanderstraeten Erwin,BEX ; Gobin Guy,BEX, Apparatus and method for sputtering.
  7. Boys Donald R. (Cupertino CA) Smith Robert M. (San Jose CA), Apparatus for and method of controlling sputter coating.
  8. Bahr Martin (Hasselroth DEX) Brauer Gunter (Freigericht DEX) Winter Erwin (Hanau DEX), Apparatus for coating a substrate.
  9. Juliano, Daniel R.; Mathias, Deborah; Mackie, Neil M., Barrier for doped molybdenum targets.
  10. Juliano, Daniel R.; Mathias, Deborah; Mackie, Neil M., Barrier for doped molybdenum targets.
  11. Laird Ronald E. ; Carniglia Charles K., Broad-band antireflection coating having four sputtered layers.
  12. McKelvey Harold E. (Plymouth MI), Cathodic sputtering apparatus.
  13. Zega Bogdan (Geneva CHX), Cylindrical magnetron sputtering cathode and apparatus.
  14. Hoffman David W. (Ann Arbor MI), Cylindrical post magnetron sputtering system.
  15. Hartig, Klaus; Smith, Steve E.; Madocks, John E., Cylindrical target with oscillating magnet for magnetron sputtering.
  16. Noboru Toyama JP, Deposited film producing process, photovoltaic device producing process, and deposited film producing system.
  17. Kunz Anton (Triesenberg DEX), Device for transmission of electrical currents and rotating machine parts.
  18. Ghanbari Ebrahim (Huntington NY), Electron cyclotron resonance plasma source.
  19. Dellaert, Krist; De Bosscher, Wilmert; De Boever, Joannes; Porteman, Stijn, End-block for a rotatable target sputtering apparatus.
  20. Kobayashi Shigeru (Tokyo JPX) Nakagawa Nobuo (Yokohama JPX) Abe Katsuo (Yokosuka JPX) Kamei Tsuneaki (Kanagawa JPX) Fujimoto Kazuyuki (Tokyo JPX), Film forming method.
  21. Dellaert, Krist; De Bosscher, Wilmert; De Boever, Joannes; Lapeire, Gregory, Flat end-block for carrying a rotatable sputtering target.
  22. Morrison ; Jr. Charles F. (Boulder CO), High rate magnetron sputtering of high permeability materials.
  23. Crowley, Daniel T., High-power ion sputtering magnetron.
  24. Rust Ray D. (Berkeley Heights NJ), Hollow cathode type magnetron apparatus construction.
  25. Hartsough Larry D. ; Harra David J. ; Cochran Ronald R. ; Jiang Mingwei, Internally cooled target assembly for magnetron sputtering.
  26. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  27. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  28. Myli, Kari B.; Krisko, Annette J.; Brownlee, James E.; Pfaff, Gary L., Low-maintenance coatings, and methods for producing low-maintenance coatings.
  29. Madocks, John, Magnetic mirror plasma source.
  30. Lamont ; Jr. Lawrence T. (Mountain View CA), Magnetic targets for use in sputter coating apparatus.
  31. McKelvey Harold E. (Farmington Hills MI), Magnetron cathode sputtering apparatus.
  32. McKelvey Harold E. (Plymouth MI), Magnetron cathode sputtering apparatus.
  33. McKelvey Harold E. (Plymouth MI), Magnetron cathode sputtering apparatus.
  34. Robinson Merrill G. (Ann Arbor MI), Magnetron cathode sputtering apparatus.
  35. Bardos, Ladislav; Barankova, Hana, Magnetron plasma apparatus.
  36. Welty Richard P. (Boulder CO), Magnetron sputtering cathode.
  37. Welty Richard P. (Boulder CO), Magnetron sputtering cathode.
  38. Innis David T. (Toledo OH), Method and apparatus for changing sputtering targets in a magnetron sputtering system.
  39. Mackie, Neil M.; Corson, John, Method and apparatus for controllable sodium delivery for thin film photovoltaic materials.
  40. Mackie, Neil M.; Corson, John, Method and apparatus for controllable sodium delivery for thin film photovoltaic materials.
  41. Konstantin K. Tzatzov CA; Alexander S. Gorodetsky CA, Method and apparatus for magnetron sputtering.
  42. Hollstein Frank,DEX, Method and device for coating substrate.
  43. Juliano, Daniel R., Method for alkali doping of thin film photovoltaic materials.
  44. Mackie, Neil M.; Juliano, Daniel R.; Zubeck, Robert B., Method for alkali doping of thin film photovoltaic materials.
  45. Hartig Klaus W. (Brighton MI) Lingle Philip J. (Temperance MI), Method of converting coated glass.
  46. Juliano, Daniel R.; Mathias, Deborah; Mackie, Neil M., Method of forming a sputtering target.
  47. Yamashita, Toshihiro; Takai, Yasuyoshi; Izawa, Hiroshi, Method of forming transparent, conductive film, method of compensating defective region of semiconductor layer, photovoltaic element, and method of producing photovoltaic element.
  48. Vlcek, Johannes; Juliano, Daniel R., Method of making a CIG target by cold spraying.
  49. Vlcek, Johannes; Juliano, Daniel R., Method of making a CIG target by cold spraying.
  50. Newbery, A. Piers; Kueper, Timothy; Juliano, Daniel R., Method of making a CIG target by spray forming.
  51. Krisko,Annette J.; Bond,Bob; Stanek,Roger; Pfaff,Gary; Hartig,Klaus, Methods and apparatuses for depositing film on both sides of a pane.
  52. Hartig, Klaus, Methods and equipment for depositing coatings having sequenced structures.
  53. Myli, Kari; Pfaff, Gary; Brownlee, James; German, John; Krisko, Annette; Hartig, Klaus, Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films.
  54. Hartig Klaus W. ; Lingle Philip J. ; Larson Steven L., Methods of making insulating glass units with neutral, high performance, durable low-E glass coating systems.
  55. Billieres, Dominique, Molybdenum-based target and process for producing a target by thermal spraying.
  56. Hartig Klaus W. ; Lingle Philip J. ; Larson Steven L., Neutral, high performance, durable low-E glass coating system and insulating glass units made therefrom.
  57. Hartig Klaus W. ; Larson Steve L. ; Lingle Philip J., Neutral, high visible, durable low-E glass coating system, insulating glass units made therefrom, and methods of making same.
  58. Hartig Klaus W. ; Larson Steve L. ; Lingle Philip J., Neutral, high visible, durable low-e glass coating system and insulating glass units made therefrom.
  59. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James, Opposed functional coatings having comparable single surface reflectances.
  60. Madocks,John, Penning discharge plasma source.
  61. Corson, John; Austin, Alex; Rulkens, Ron; Titus, Jochen; Tas, Robert; Shufflebotham, Paul; Juliano, Daniel R.; Mackie, Neil, Photovoltaic cell with copper poor CIGS absorber layer and method of making thereof.
  62. Corson, John; Austin, Alex; Tas, Robert; Mackie, Neil; Larsson, Mats; Demirkan, Korhan; Zhang, Weijie; Titus, Jochen; Sevanna, Swati; Zubeck, Robert; Dorn, Randy; Rairkar, Asit; Rulkens, Ron; Saproo, Ajay; Vitkavage, Dan, Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof.
  63. Corson, John; Austin, Alex; Tas, Robert; Mackie, Neil; Larsson, Mats; Demirkan, Korhan; Zhang, Weijie; Titus, Jochen; Sevanna, Swati; Zubeck, Robert; Dorn, Randy; Rairkar, Asit; Rulkens, Ron; Saproo, Ajay; Vitkavage, Dan, Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof.
  64. Matsuo Seitaro (Isehara JPX) Ono Toshiro (Isehara JPX), Plasma deposition method and apparatus.
  65. Schmidt, Chris; Corson, John, Protective layer for large-scale production of thin-film solar cells.
  66. Schmidt, Chris; Corson, John, Protective layer for large-scale production of thin-film solar cells.
  67. Schmidt, Chris; Corson, John, Protective layer for large-scale production of thin-film solar cells.
  68. Crowley, Daniel Theodore, Rotary cathode for magnetron sputtering apparatus.
  69. McKelvey Harold E. (Plymouth MI), Rotatable sputtering apparatus.
  70. Taylor Clifford L. (Nerstrand MN) Crowley Daniel T. (Owatonna MN), Rotating floating magnetron dark-space shield and cone end.
  71. Dickey Eric R. ; Bjornard Erik J., Shielding for arc suppression in rotating magnetron sputtering systems.
  72. Juliano, Daniel R.; Tas, Robert; Mackie, Neil; Ziani, Abdelouahab, Sodium salt containing CIG targets, methods of making and methods of use thereof.
  73. Caskey Gregory T., Spark eliminating sputtering target and method for using and making same.
  74. Taylor Clifford L. (Nerstrand MN), Spring-loaded mount for a rotatable sputtering cathode.
  75. Schneider, Stefan; Muller, Marcel; Vyskocil, Jiri; Wagner, Israel, Sputter target utilization.
  76. Dennis R. Hollars, Sputtering apparatus and process for high rate coatings.
  77. Dennis R. Hollars ; Martin P. Rosenblum ; Carl T. Petersen, Sputtering apparatus and process for high rate coatings.
  78. Brabender, Dennis M; Kokoschke, Jeffrey L, Sputtering apparatus including target mounting and control.
  79. Vranken Jean-Paul (Jemeppe-sur-Sambre BEX) Devigne Roland (Sambreville BEX), Sputtering cathode.
  80. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  81. Yumshtyk, Gennady; Ivanov, Dmitri, Sputtering devices and methods.
  82. Yamashita, Toshihiro; Echizen, Hiroshi; Takai, Yasuyoshi; Tsuzuki, Hidetoshi, Sputtering method and sputtering apparatus.
  83. Echizen, Hiroshi; Yamashita, Toshihiro, Sputtering method for forming film and apparatus therefor.
  84. Martinson, Robert; Bunau, Heinrich Von; Campello, Mark; Rulkens, Ron; Heckel, Tom; Vlcek, Johannes, Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube.
  85. Yumshtyk, Gennady, Sputtering targets and methods.
  86. Shufflebotham, Paul; Juliano, Daniel R.; Tas, Robert; Mackie, Neil, Sulfur salt containing CIG targets, methods of making and methods of use thereof.
  87. Stowell, Jr.,Michael W., System and apparatus for control of sputter deposition process.
  88. Stowell, Michael W., System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties.
  89. Hollars, Dennis R., Target utilization improvement for rotatable magnetrons.
  90. Abenthung, Peter; Huber, Karl; Lackner, Harald; Leichtfried, Gerhard; Polcik, Peter; Weratschnig, Christian, Tubular target and production method.
  91. Abenthung, Peter; Huber, Karl; Lackner, Harald; Leichtfried, Gerhard; Polcik, Peter; Weratschnig, Christian, Tubular target and production method.
  92. Sieck Peter A. (Santa Rosa CA) Newcomb Richard (Rio Vista CA) Trumbly Terry A. (Pleasant Hill CA) Schulz Stephen C. (Benicia CA), Use of multiple anodes in a magnetron for improving the uniformity of its plasma.
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