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Illuminating device for providing an illumination beam with adjustable distribution of intensity and a pattern-transfer 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-027/10
  • G03B-027/72
출원번호 US-0184817 (1980-09-08)
우선권정보 FR-0022587 (1979-09-10)
발명자 / 주소
  • Dubroeucq Georges (Paris FRX) Lacombat Michel (Paris FRX) Brevignon Michele (Paris FRX)
출원인 / 주소
  • Thomson-CSF (Paris FRX 03)
인용정보 피인용 횟수 : 83  인용 특허 : 3

초록

Illuminating device comprising a laser source providing a coherent beam with gaussian distribution of intensity and means for separating the initial beam into four parts along two orthogonal directions, means for recombining the four parts resulting in their partial superimposition in a predetermine

대표청구항

An illuminating device intended to supply a coherent illumination beam having an adjustable spatial distribution of intensity, from a source providing an initial beam having a gaussian distribution of intensity comprising means for separating the initial beam into four parts each forming a beam, alo

이 특허에 인용된 특허 (3)

  1. Khvalovsky ; Vladimir Vasilievich ; Natarovsky ; Sergei Nikolaevich ; Nalivaiko ; Valentin Iosifovich ; Vorontsov ; Vladimir Lvovich, Device for coherent lighting of objects.
  2. Reid Douglas C. J. (St. James GB2), Optical system for the production of a beam of light having a uniform intensity distribution.
  3. Goffinet, Pierre C. E.; Leclercq, Jean-Pierre C. I. M., Textile treating composition.

이 특허를 인용한 특허 (83)

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  3. Toyoda, Mitsunori, Beam transforming optical system, illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction.
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  5. Pera Luciano (Vinovo ITX) Boggero Armando (Turin ITX) Manassero Giorgio (Turin ITX) Gay Paolo (Turin ITX), Device for modifying and uniforming the distribution of the intensity of a power laser beam.
  6. Shiraishi, Naomasa, Exposure method and apparatus having a decreased light intensity distribution.
  7. Kudo, Takehito; Hirukawa, Shigeru, Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas.
  8. Kudo, Takehito; Hirukawa, Shigeru, Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas.
  9. Kudo, Takehito; Hirukawa, Shigeru, Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas.
  10. Tanaka Minoru (Yokohama JPX) Oshida Yoshitada (Fujisawa JPX) Yoshitake Yasuhiro (Yokohama JPX) Tanimoto Tetsuzo (Yokohama JPX), Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection.
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  22. Toyoda, Mitsunori, Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light.
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  25. Toyoda, Mitsunori, Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light.
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  33. Goldenberg Jill F. (Pelham Manor NY), Light valve projection system with non imaging optics for illumination.
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  38. Liu Kuo-Ching (Setauket NY), Method and apparatus for laser beam homogenization.
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