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Optical focusing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/42
  • G01J-001/20
출원번호 US-0183402 (1980-09-02)
발명자 / 주소
  • Phillips, Edward H.
출원인 / 주소
  • Optimetrix Corporation
대리인 / 주소
    Griffin, Roland I.
인용정보 피인용 횟수 : 40  인용 특허 : 2

초록

An optical focusing system is provided for accurately focusing a wafer surface, thereby enabling the production of sharp microcircuit images. Accurate focusing is achieved despite non-parallel and non-flat wafer surfaces, despite differences in reflectivity of different portions of the wafer surface

대표청구항

1. A kinematic system for positioning a utilization device parallel to a selected plane, said system comprising: a base structure; a plurality of spaced drive means for supporting the utilization device for translational movement along a first axis normal to a plane of the base structure and for

이 특허에 인용된 특허 (2)

  1. Frosch ; Albert ; Mannsdorfer ; Walter ; Scheuing ; Claus, Gap measuring device for defining the distance between two or more surfaces.
  2. Roullet ; Gerald ; Bortuzzo ; Jean-Pierre, Optical reading device comprising a focussing detection device.

이 특허를 인용한 특허 (40)

  1. Ohno Koichi (Inagi JPX), Apparatus for regulating the optical characteristics of a projection optical system.
  2. Ito Tokuhisa (Tokyo JPX) Ohno Hideaki (Sakadoshi JPX) Kurata Izumi (Tokyo JPX) Okuyama Takashi (Urawashi JPX), Automatic focusing apparatus in optical drawing machine.
  3. Kitamura Goro (Tokyo JPX) Horiuchi Hidenori (Tokyo JPX) Aoyama Masaaki (Tokyo JPX) Ito Tokuhisa (Tokyo JPX), Automatic focusing device in microscope system.
  4. Bouwer Adrianus G. (Eindhoven NLX), Device for photolithographically treating a thin substrate.
  5. Ebihara, Akimitsu, Electromagnetic alignment and scanning apparatus.
  6. Lee Martin E., Exposure apparatus and method utilizing isolated reaction frame.
  7. Lee, Martin E., Exposure apparatus and method utilizing isolated reaction frame.
  8. Kenji Nishi JP; Yasuaki Tanaka JP; Seiro Murakami JP, Exposure method and apparatus.
  9. Tanaka, Yasuaki; Murakami, Seiro; Nishi, Kenji, Exposure method and apparatus.
  10. Lee, Martin E., Guideless stage with isolated reaction stage.
  11. Richards, William L.; Ashby, Austin; Ketterer, Matthew; Marshall, Kevin; Harrison, Josh; Mette, Matthew; Richards, Paul; Showalter, Wayne; Cote, Jasmin; Halbert, Phillip C.; Bourgeois, Solene; Metzger, Steven W.; Hance, Ken; Mensack, Meghan; Michel, Carlos; Allers, Elke; Gamage, Dulini; Prisbrey, Landon; Gusyatin, Oleg; Shamsheyeva, Alena; Turng, Ben; Ghusson, Andrew; Reinhardt, Kurt, Instrument and system for rapid microogranism identification and antimicrobial agent susceptibility testing.
  12. Richards, William L.; Ashby, Austin; Ketterer, Matthew; Marshall, Kevin; Harrison, Josh; Mette, Matthew; Richards, Paul; Showalter, Wayne; Cote, Jasmin; Halbert, Phillip C.; Bourgeois, Solene; Metzger, Steven W.; Hance, Ken; Mensack, Meghan; Michel, Carlos; Allers, Elke; Gamage, Dulini; Prisbrey, Landon; Gusyatin, Oleg; Shamsheyeva, Alena; Turng, Ben; Ghusson, Andrew; Reinhardt, Kurt, Instrument and system for rapid microorganism identification and antimicrobial agent susceptibility testing.
  13. Groeneveld, Rogier Herman Mathijs; Van Dijsseldonk, Antonius Johannes Josephus; Franken, Dominicus Jacobus Petrus Adrianus; Jansen, Bastiaan Stephanus Hendricus; De Jongh, Robertus Johannes Marinus; Van Der Wijst, Marc Wilhelmus Maria; Wijckmans, Maurice Willem Jozef Etiënne, Lithographic apparatus and device manufacturing method.
  14. Prisbrey, Landon; Blackmore, Elise; Hance, Kenneth R.; Metzger, Steven W.; Marshall, Kevin, Membrane-assisted purification.
  15. Hinsberg ; III William Dinan ; Houle Frances Anne, Method for stochastic and deterministic timebase control in stochastic simulations.
  16. Chiang Yung-Shu,TWX, Method of inspection to determine reticle pitch.
  17. Lee Martin E., Method of making exposure apparatus with dynamically isolated reaction frame.
  18. Lee, Martin E., Method of making exposure apparatus with dynamically isolated reaction frame.
  19. Michelin, Jean Luc, Optical measuring device using optical triangulation.
  20. Shimazaki Kuniya (Kawasaki JPX), Pattern transfer device and method.
  21. Lee, Martin E., Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device.
  22. Yabu Shuichi (Kawasaki JPX), Projection exposure apparatus.
  23. Yamasaki Shigeru,JPX ; Okumura Masahiko,JPX, Projection exposure apparatus and method.
  24. Imai Yuji,JPX, Projection exposure apparatus for transferring mask pattern onto photosensitive substrate.
  25. Imai Yuji,JPX, Projection exposure apparatus for transferring mask pattern onto photosensitive substrate.
  26. Metzger, Steven W.; Hance, Kenneth Robert, Rapid cell purification systems.
  27. Metzger, Steven W.; Hance, Kenneth Robert, Rapid cell purification systems.
  28. Metzger, Steven W.; Hance, Kenneth Robert, Rapid cell purification systems.
  29. Shamsheyeva, Alena; Howson, David C.; Metzger, Steven W., Rapid determination of microbial growth and antimicrobial susceptibility.
  30. Metzger, Steven W.; Howson, David C.; Goldberg, David A.; Buttry, Daniel A., Rapid microbial detection and antimicrobial susceptibility testing.
  31. Chiang Yung-Shu,TWX, Reticle for alignment and pitch determination.
  32. Suzuki, Kazuaki, Reticle-focus detector, and charged-particle-beam microlithography apparatus and methods comprising same.
  33. Goldberg, David A.; Howson, David C.; Metzger, Steven W.; Buttry, Daniel A.; Saavedra, Steven Scott, Sensitive and rapid determination of antimicrobial susceptibility.
  34. Trost David (Fairfield CT), Simple electromechanical tilt and focus device.
  35. Hinsberg ; III William Dinan ; Houle Frances Anne, Software architecture for stochastic simulation of non-homogeneous systems.
  36. Hara Hideaki,JPX ; Imai Yuji,JPX ; Murayama Masayuki,JPX, Stage apparatus with improved positioning capability.
  37. Phillips Edward H. (P.O. Box 1042 Middletown CA 95461), Step-and-repeat alignment and exposure system.
  38. Hinsberg ; III William D. (Fremont CA) Houle Frances A. (Fremont CA), Stochastic simulation method for processes containing equilibrium steps.
  39. Sato Hiroshi (Tokyo JPX) Yabu Shuichi (Kawasaki JPX) Kosugi Masao (Yokohama JPX), Transfer apparatus provided with an auto-focusing mechanism.
  40. Kim, Jeong Yeal, Wafer edge exposure apparatus, and wafer edge exposure method.
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