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특허 상세정보

Light exposure device and method

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) G03B-027/52   
미국특허분류(USC) 355/40 ; 269/21 ; 279/3
출원번호 US-0245193 (1981-03-18)
우선권정보 JP-0033882 (1980-03-19); JP-0109275 (1980-08-11); JP-0132914 (1980-09-26); JP-0147539 (1980-10-23)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 69  인용 특허 : 0
초록

A light exposure device and method for exposing and printing a predetermined pattern on an exposure surface of a substrate comprises measuring means for measuring curvature of the exposure surface of the substrate, a chuck including suck and hold means for sucking and holding a back surface of the substrate opposite to the exposure surface and deforming means for imparting a force to the back surface of the substrate to deform the substrate, and control means for controlling the deforming means of the chuck in accordance with the curvature of the exposur...

대표
청구항

A device for exposing and printing a predetermined pattern on an exposure surface of a substrate, the device comprising: measuring means for measuring a curvature of the exposed surface of said substrate, a chuck including a suction and holding means having a deformable member for drawing and holding a back surface of said substrate opposite to said exposure surface of said substrate, and deforming means for imparting a force to said deformable member and said back surface of said substrate to deform said substrate, control means for controlling said def...

이 특허를 인용한 특허 피인용횟수: 69

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