초록 ▼

A gas separating member of the present invention comprises a porous substrate in the form of a film, wall or hollow fiber and a polymer film formed on a surface of the substrate by plasma polymerization. The gas separation factor (O2/N2) ranges from 2.3 to 3.9 with the corresponding gas permeability

A gas separating member of the present invention comprises a porous substrate in the form of a film, wall or hollow fiber and a polymer film formed on a surface of the substrate by plasma polymerization. The gas separation factor (O2/N2) ranges from 2.3 to 3.9 with the corresponding gas permeability ranging from 12 to 0.16 liter/min. m2 atm. pres.-air. A modified gas separating member of the present invention, which comprises a porous substrate in the aforementioned form and two polymer films formed on a surface of the substrate by plasma polymerization, has the gas separation factor (He/H2) ranging from 14 to 45.

대표청구항 ▼

A method of making a gas separating member which comprises the steps of setting a porous substrate in the form of a film, wall or hollow fiber in a plasma generator, activating an organosilane monomer by plasma to form a plasma polymerized film of said organosilane as a first layer having high gas p

A method of making a gas separating member which comprises the steps of setting a porous substrate in the form of a film, wall or hollow fiber in a plasma generator, activating an organosilane monomer by plasma to form a plasma polymerized film of said organosilane as a first layer having high gas permeability on a surface of the substrate, and activating a second monomer other than the organosilane by plasma to form a plasma polymerized layer as the second layer having high gas separation factor on the organosilane first layer. A gas separating member comprising a porous substrate in the form of a film, wall or hollow fiber and a plasma polymerizate polymer film on a surface of the substrate, the polymer film including two layers formed by plasma polymerization, the two layers being a first layer having high gas permeability formed from an organosilane formed on a surface of the substrate by plasma polymerization and the second layer having high gas separation factor formed of a monomer other than an organosilane formed on the first layer by plasma polymerization.