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Swirl mixing device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01F-005/00
  • B01F-015/02
출원번호 US-0332949 (1981-12-21)
발명자 / 주소
  • Dietrich David E. (8450-101 Via Sonoma La Jolla CA 92037)
인용정보 피인용 횟수 : 75  인용 특허 : 0

초록 ▼

A swirl mixing device adaptable as a spray nozzle or as a fluid mixing chamber for substantially complete mixing of two or more fluids is described. The device comprises a container having a closed end and an exhaust. At least two fluid injection chambers are defined within the container, the first

대표청구항 ▼

A device for mixing fluids comprising a container having a closed end and an exhaust; at least two fluid injection chambers within said container, a first one of said chambers being located between said closed end and the second one of said chambers; first passage means for fluid flow from said firs

이 특허를 인용한 특허 (75)

  1. Choi, Kenric T.; Narwankar, Pravin K.; Kher, Shreyas S.; Nguyen, Son T.; Deaton, Paul; Ngo, Khai; Chhabra, Paul; Ouye, Alan H.; Wu, Dien-Yeh (Daniel), Ampoule for liquid draw and vapor draw with a continuous level sensor.
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  2. Lee, Wei Ti; Chiao, Steve H., Ampoule splash guard apparatus.
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  3. Lee,Wei Ti; Chiao,Steve H., Ampoule splash guard apparatus.
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  4. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Apparatus and method for generating a chemical precursor.
    상세보기
  5. Chen,Ling; Ku,Vincent W.; Chang,Mei; Wu,Dien Yeh; Chung,Hua, Apparatus and method for hybrid chemical processing.
    상세보기
  6. Chen,Ling; Ku,Vincent W.; Chang,Mei; Wu,Dien Yeh; Chung,Hua, Apparatus and method for hybrid chemical processing.
    상세보기
  7. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.
    상세보기
  8. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.
    상세보기
  9. Ma, Paul; Shah, Kavita; Wu, Dien-Yeh; Ganguli, Seshadri; Marcadal, Christophe; Wu, Frederick C.; Chu, Schubert S., Apparatus and process for plasma-enhanced atomic layer deposition.
    상세보기
  10. Thakur, Randhir P. S.; Mak, Alfred W.; Xi, Ming; Glenn, Walter Benjamin; Khan, Ahmad A.; Al-Shaikh, Ayad A.; Gelatos, Avgerinos V.; Umotoy, Salvador P., Apparatus for cyclical depositing of thin films.
    상세보기
  11. Thakur,Randhir P. S.; Mak,Alfred W.; Xi,Ming; Glenn,Walter Benjamin; Khan,Ahmad A.; Al Shaikh,Ayad A.; Gelatos,Avgerinos V.; Umotoy,Salvador P., Apparatus for cyclical deposition of thin films.
    상세보기
  12. Chen, Ling; Ku, Vincent W.; Chang, Mei; Wu, Dien Yeh; Chung, Hua, Apparatus for hybrid chemical processing.
    상세보기
  13. Chung,Hua; Chen,Ling; Yu,Jick; Chang,Mei, Apparatus for integration of barrier layer and seed layer.
    상세보기
  14. Guenther,Rolf A., Apparatus for providing gas to a processing chamber.
    상세보기
  15. Myo, Nyi Oo; Choi, Kenric; Kher, Shreyas; Narwankar, Pravin; Poppe, Steve; Metzner, Craig R.; Deaten, Paul, Apparatuses for atomic layer deposition.
    상세보기
  16. Chin,Barry L.; Mak,Alfred W.; Lei,Lawrence Chung Lai; Xi,Ming; Chung,Hua; Lai,Ken Kaung; Byun,Jeong Soo, Atomic layer deposition apparatus.
    상세보기
  17. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Chemical precursor ampoule for vapor deposition processes.
    상세보기
  18. Cuvalci, Olkan; Wu, Dien-Yeh; Yuan, Xiaoxiong, Chemical precursor ampoule for vapor deposition processes.
    상세보기
  19. Lu, Jiang; Ha, Hyoung-Chan; Ma, Paul F.; Ganguli, Seshadri; Aubuchon, Joseph F.; Yu, Sang-ho; Narasimhan, Murali K., Cobalt deposition on barrier surfaces.
    상세보기
  20. Lu, Jiang; Ha, Hyoung-Chan; Ma, Paul; Ganguli, Seshadri; Aubuchon, Joseph F.; Yu, Sang Ho; Narasimhan, Murali K., Cobalt deposition on barrier surfaces.
    상세보기
  21. Blouin Matthew R. ; Burnett Scott T. ; McArthur Terry A., Continuous jet printer mixing system.
    상세보기
  22. Nguyen, Son T.; Sangam, Kedarnath; Schwartz, Miriam; Choi, Kenric; Bhat, Sanjay; Narwankar, Pravin K.; Kher, Shreyas; Sharangapani, Rahul; Muthukrishnan, Shankar; Deaton, Paul, Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system.
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  23. Yearsley,Gyle D.; Nekl,Joshua J., Counting clock cycles over the duration of a first character and using a remainder value to determine when to sample a bit of a second character.
    상세보기
  24. Yoon, Ki Hwan; Cha, Yonghwa Chris; Yu, Sang Ho; Ahmad, Hafiz Farooq; Wee, Ho Sun, Deposition methods for barrier and tungsten materials.
    상세보기
  25. Yoon,Ki Hwan; Cha,Yonghwa Chris; Yu,Sang Ho; Ahmad,Hafiz Farooq; Wee,Ho Sun, Deposition methods for barrier and tungsten materials.
    상세보기
  26. Livshits, David; Teichner, Lester, Device for producing a gaseous fuel composite and system of production thereof.
    상세보기
  27. Ballu, Patrick Jean Marie, Direct-injection spraying device for a vehicle, in particular an agricultural vehicle, and vehicle provided with such a device.
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  28. Livshits, David; Teichner, Lester, Emulsion, apparatus, system and method for dynamic preparation.
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  29. Livshits, David; Teichner, Lester, Engine with integrated mixing technology.
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  30. Livshits, David; Teichner, Lester, Engine with integrated mixing technology.
    상세보기
  31. Livshits, David; Teichner, Lester, Fluid composite, device for producing thereof and system of use.
    상세보기
  32. Livshits, David; Teichner, Lester, Fluid composite, device for producing thereof and system of use.
    상세보기
  33. Short David R. M.,GBX, Fluid inductor apparatus having deformable member for controlling fluid flow.
    상세보기
  34. David M. R. Short GB, Fluid inductor system and apparatus having deformable member for controlling fluid flow.
    상세보기
  35. Livshits, David; Teichner, Lester, Fluid mixer with internal vortex.
    상세보기
  36. Jang, Ruei-Hung; Woo, Tien-Hsing; Ying, Chih-Lin; Hsieh, Tsung-Chi; Yu, Ming-Kuo, Fluid mixing apparatus.
    상세보기
  37. Livshits, David; Teichner, Lester, Foaming of liquids.
    상세보기
  38. Livshits, David; Teichner, Lester, Foaming of liquids.
    상세보기
  39. Narwankar, Pravin K.; Higashi, Gregg, Formation of a silicon oxynitride layer on a high-k dielectric material.
    상세보기
  40. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus and method for atomic layer deposition.
    상세보기
  41. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman, Gas delivery apparatus for atomic layer deposition.
    상세보기
  42. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman; Chang, Mei, Gas delivery apparatus for atomic layer deposition.
    상세보기
  43. Sperry, Robert G., Gaseous fuel mixer for internal combustion engine.
    상세보기
  44. Pinard, Adam I.; Enge, James M.; Winslow, Bradley S.; Masia, Andrew; Fargo, Jr., Foster M., Inkjet proofing with matched color and screen resolution.
    상세보기
  45. Pinard, Adam I.; Enge, James M.; Winslow, Bradley S.; Masia, Andrew; Fargo, Jr., Foster M., Inkjet proofing with matched color and screen resolution.
    상세보기
  46. Chung,Hua; Chen,Ling; Yu,Jick; Chang,Mei, Integration of barrier layer and seed layer.
    상세보기
  47. Tzu, Gwo-Chuan; Umotoy, Salvador P., Lid assembly for a processing system to facilitate sequential deposition techniques.
    상세보기
  48. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method and apparatus for providing precursor gas to a processing chamber.
    상세보기
  49. Ganguli,Seshadri; Chen,Ling; Ku,Vincent W., Method and apparatus for providing precursor gas to a processing chamber.
    상세보기
  50. Chen,Ling; Ku,Vincent W.; Chung,Hua; Marcadal,Christophe; Ganguli,Seshadri; Lin,Jenny; Wu,Dien Yeh; Ouye,Alan; Chang,Mei, Method and apparatus of generating PDMAT precursor.
    상세보기
  51. Chua, Thai Cheng; Muthukrisnan, Shankar; Swenberg, Johanes; Kher, Shreyas; Wang, Chikuang Charles; Conti, Giuseppina; Uritsky, Yuri, Method for fabricating an integrated gate dielectric layer for field effect transistors.
    상세보기
  52. Metzner, Craig; Kher, Shreyas; Kim, Yeong Kwan; Rocklein, M. Noel; George, Steven M., Method for hafnium nitride deposition.
    상세보기
  53. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method for providing gas to a processing chamber.
    상세보기
  54. Metzger, Harry, Method for spraying a medium and spraying nozzle.
    상세보기
  55. Metzger, Harry, Method for spraying a medium and spraying nozzle.
    상세보기
  56. Livshits, David; Teichner, Lester, Method of dynamic mixing of fluids.
    상세보기
  57. Myo, Nyi Oo; Cho, Kenric; Kher, Shreyas; Narwankar, Pravin; Poppe, Steve; Metzner, Craig R.; Deaten, Paul, Methods for atomic layer deposition of hafnium-containing high-K dielectric materials.
    상세보기
  58. Ingerttila Kauko Tapio,FIX ; Hintikka VainoViljo Heikki,FIX ; Tahvanainen Raimo Tapio,FIX ; Klemetti Veli Markku,FIX ; Morsky Pekka Parttyli,FIX ; Knuutinen Veli Tapio,FIX, Mixing.
    상세보기
  59. Lim Jong-Yun,KRX ; Moon Jong-Duck,KRX, Multiphase mixing apparatus using acoustic resonance.
    상세보기
  60. Mahajani, Maitreyee; Yudovsky, Joseph; McDougall, Brendan, Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool.
    상세보기
  61. Mahajani, Maitreyee, Pretreatment processes within a batch ALD reactor.
    상세보기
  62. Mahajani,Maitreyee, Pretreatment processes within a batch ALD reactor.
    상세보기
  63. Pinard,Adam I.; Enge,James M., Print proofing with color and screen matching.
    상세보기
  64. Ganguli, Seshadri; Yu, Sang-Ho; Phan, See-Eng; Chang, Mei; Khandelwal, Amit; Ha, Hyoung-Chan, Process for forming cobalt and cobalt silicide materials in tungsten contact applications.
    상세보기
  65. Ganguli, Seshadri; Yu, Sang-Ho; Phan, See-Eng; Chang, Mei; Khandelwal, Amit; Ha, Hyoung-Chan, Process for forming cobalt and cobalt silicide materials in tungsten contact applications.
    상세보기
  66. Ganguli, Seshadri; Chu, Schubert S.; Chang, Mei; Yu, Sang-Ho; Moraes, Kevin; Phan, See-Eng, Process for forming cobalt-containing materials.
    상세보기
  67. Ku,Vincent; Chen,Ling; Grunes,Howard; Chung,Hua, Processing chamber configured for uniform gas flow.
    상세보기
  68. Cao, Wei; Chung, Hua; Ku, Vincent W.; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.
    상세보기
  69. Cao, Wei; Chung, Hua; Ku, Vincent; Chen, Ling, Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor.
    상세보기
  70. Olsen, Christopher; Narwankar, Pravin K.; Kher, Shreyas S.; Thakur, Randhir; Muthukrishnan, Shankar; Kraus, Philip A., Stabilization of high-k dielectric materials.
    상세보기
  71. Schauerte, Manfred, Static mixing element and method of mixing a drilling liquid.
    상세보기
  72. Schieve, Eric W.; Koai, Keith K.; Or, David T.; Correa, Rene T., Substrate support lift mechanism.
    상세보기
  73. Feilner, Roland, Swirl element, inlet valve, device and method for evaporating or driving out highly volatile.
    상세보기
  74. Gelatos, Avgerinos V.; Lee, Sang-Hyeob; Yuan, Xiaoxiong; Umotoy, Salvador P.; Chang, Yu; Tzu, Gwo-Chuan; Renuart, Emily; Lin, Jing; Lai, Wing-Cheong; Le, Sang Q., Temperature controlled lid assembly for tungsten nitride deposition.
    상세보기
  75. Kanno Itaru,JPX, Wafer cleaning apparatus.
    상세보기

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