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특허 상세정보

Vapor mass flow control system

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01F-003/04   
미국특허분류(USC) 261/64B ; 73/86104 ; 137/10125 ; 261/64D
출원번호 US-0484198 (1983-04-12)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 201  인용 특허 : 6
초록

In a system for delivering vapor from a container partially filled with liquid to be vaporized by bubbling a carrier gas therethrough, the flow of the vapor is precisely regulated by a controller so as to provide a uniform mass flow rate of vapor. The controller is programmed to receive signals representing the sensing of the total gaseous pressure, temperature and liquid level in the container and to use the signals in a computation according to the following formula: m*=AFc (1+BDDc+ED) wherein m*=Approximate vapor mass flow Fc=Carrier gas mass flow Do)...

대표
청구항

In a chemical vapor delivery system including a container partially filled with material to be vaporized and applied to a system which uses the vapor, means for ducting a carrier gas through said material to transport said vaporized material, a valve for controlling the flow of said carrier gas to said container, and means for controlling the temperature of the material in said container, an improved method comprising: providing a continuous, uniform mass flow of said vaporized material to said using system by: sensing the total gaseous pressure (P) in s...

이 특허를 인용한 특허 피인용횟수: 201

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