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Photocurable compositions 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-001/68
출원번호 US-0338818 (1982-01-11)
발명자 / 주소
  • Crivello James V. (Clifton Park NY) Lee Julia L. (Schenectady NY)
출원인 / 주소
  • General Electric Company (Schenectady NY 02)
인용정보 피인용 횟수 : 55  인용 특허 : 8

초록

Photocurable compositions are provided which can be cured with ultraviolet light at a wave length greater than 300 nm. The photocurable compositions are based on the use of cationically polymerizable organic materials, for example, an epoxy resin and a photoinitiator in the form of a dialkylphenacyl

대표청구항

Compositions which are photocurable at wave lengths greater than 300 nm comprising a cationically polymerizable organic material and an effective amount of a photoinitiator having the formula [Figure] sensitized with an effective amount of a sensitizer selected from perylene, anthracene, mixture the

이 특허에 인용된 특허 (8)

  1. Crivello James V. (Clifton Park NY), Heat curable compositions.
  2. Crivello James V. (Clifton Park NY), Heat curable compositions containing sulfonium salts.
  3. Berggren William R. (Woodbury MN) Brownley Shelby J. (St. Paul MN), Imageable, composite-dry transfer sheet and process of using same.
  4. Smith George H. (Maplewood MN), Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials.
  5. Crivello James V. (Elnora NY) Schroeter Siegfried H. (Schenectady NY), Photocurable compositions and methods.
  6. Crivello James V. (Elnora NY), Photocurable compositions containing group via aromatic onium salts.
  7. Barton ; Robert W., Photohardenable compositions.
  8. Smith ; George H., Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable mon.

이 특허를 인용한 특허 (55)

  1. Mahoney, Wayne S.; Palazzotto, Michael C., Accelerators for cationic polymerization catalyzed by iron-based catalyst.
  2. Mahoney, Wayne S.; Palazzotto, Michael C., Accelerators for cationic polymerization catalyzed by iron-based catalysts.
  3. Kramer, John W., Acid-labile hyperbranched copolymer and associated photoresist composition and method of forming an electronic device.
  4. Chihara Machio (Osaka JPX) Funahashi Mitsukazu (Osaka JPX), Alkaline developable liquid photoimageable solder resist ink composition.
  5. Baldwin, Teresa; Kennedy, Joseph; Iwamoto, Nancy; Nakano, Tadashi; Bedwell, William; Stuck, Jason; Suedemeyer, Arlene; Hebert, Mello, Anti-reflective coating for photolithography and methods of preparation thereof.
  6. Mukhopadhyay, Sudip; Pandey, Yamini; Dankers, Lea, Anti-reflective coatings for optically transparent substrates.
  7. Mukhopadhyay, Sudip; Pandey, Yamini; Dankers, Lea, Anti-reflective coatings for optically transparent substrates.
  8. Li, Bo; Kennedy, Joseph; Iwamoto, Nancy; Fradkin, Mark A.; Hussein, Makarem A.; Goodner, Michael D.; Lu, Victor; Leung, Roger, Antireflective coatings for via fill and photolithography applications and methods of preparation thereof.
  9. Ober, Matthias S.; Romer, Duane R.; Etienne, John B.; Thomas, Pulikkottil J., Aromatic polyacetals and articles comprising them.
  10. Klemarczyk Philip T. (Collinsville CT) Okamoto Yoshihisa (Avon CT), Aromatic vinyl ether compounds and compositions, and method of making the same.
  11. Ober, Matthias S.; Romer, Duane R.; Etienne, John B.; Thomas, Pulikkottil J., Bis(aryl)acetal compounds.
  12. Thackeray, James W.; Du, Ke; Trefonas, III, Peter; Blakey, Idriss; Whittaker, Andrew Keith, Block copolymer and associated photoresist composition and method of forming an electronic device.
  13. Beecher Jody E. ; Goldberg Martin J. ; McGall Glenn H., Chemical amplification for the synthesis of patterned arrays.
  14. Watanabe Satoshi,JPX ; Ishihara Toshinobu,JPX ; Nagura Shigehiro,JPX ; Yamaoka Tsuguo,JPX, Chemically amplified positive resist composition.
  15. Varaprasad, Desaraju; Korolev, Boris; Mukhopadhyay, Sudip, Coating formulations for optical elements.
  16. Day Richard A. (Whitney Point NY) Gelorme Jeffrey D. (Plainville CT) Russell David J. (Apalachin NY) Wih Steven J. (Endwell NY), Composition for photo imaging.
  17. Allen Robert D. ; Day Richard Allen ; Glatzel Donald Herman ; Hinsberg William Dinan ; Mertz John Richard ; Russell David John ; Wallraff Gregory Michael, Composition for photoimaging.
  18. Allen Robert David ; Day Richard Allen ; Glatzel Donald Herman ; Hinsberg William Dinan ; Mertz John Richard ; Russell David John ; Wallraff Gregory Michael, Composition for photoimaging.
  19. Day Richard Allen ; Russell David John ; Glatzel Donald Herman, Composition for photoimaging.
  20. Rao, Yuanqiao; Auger, Robert L.; Weaver, John D.; Popa, Paul J.; Jenkins, Roxanne M.; Sullivan, Christopher P.; Evans, Jessica P.; Kiarie, Cecilia W.; Srivastava, Yasmin N.; Fenton, Jr., Jeffrey L., Compositions and antireflective coatings for photolithography.
  21. Thackeray, James W.; Du, Ke; Trefonas, III, Peter; Blakey, Idriss; Whittaker, Andrew Keith, Copolymer and associated layered article, and device-forming method.
  22. Ongayi, Owendi; Jain, Vipul; Cameron, James F.; Thackeray, James W.; Coley, Suzanne, Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device.
  23. Kaisaki David A. ; Mitra Sumita B. ; Schultz William J. ; DeVoe Robert J., Dental visible light curable epoxy system with enhanced depth of cure.
  24. Mori,James Michael; Thackeray,James W.; Sinta,Roger F.; Bell,Rosemary; Miller Fahey,Robin L.; Adams,Timothy G.; Zydowsky,Thomas M.; Pavelchek,Edward K.; doCanto,Manuel, Dyed photoresists and methods and articles of manufacture comprising same.
  25. Lauffer John M. ; Markovich Voya R. ; Palomaki Cheryl L. ; Wilson William E., Filling open through holes in a multilayer board.
  26. Sooriyakumaran, Ratnam; Allen, Robert David; Fenzel Alexander, Debra, Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions.
  27. Sooriyakumaran,Ratnam; Allen,Robert David; Fenzel Alexander,Debra, Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions.
  28. Crivello James V., Initiator compositions and methods for their synthesis and use.
  29. Zhang, Ruzhi; Kim, Jihoon; Patel, Bharatkumar K.; Wolfer, Elizabeth, Low dielectric photoimageable compositions and electronic devices made therefrom.
  30. Brown Lawrence M. (Endwell NY) Gelorme Jeffrey D. (Plainville CT) Kuczynski Joseph P. (Apalachin NY) Lawrence William H. (Greene NY), Method for patterning cationic curable photoresist.
  31. Ober, Matthias S., Method of forming polyaryl polymers.
  32. Gerald Walter Jones ; Heike Marcello ; Kostas Papathomas, Methods for selectively filling apertures.
  33. Jones Gerald Walter ; Marcello Heike ; Papathomas Kostas, Methods of selectively filling apertures.
  34. Baikerikar, Kiran K.; Feng, Shaoguang; Hetzner, Jack E.; Maher, John M.; Mills, Michael E.; Popa, Paul J.; Strittmatter, Richard J.; Wilson, Larry R., Organosilicate resin formulation for use in microelectronic devices.
  35. Jain, Vipul; Ongayi, Owendi; Thackeray, James W.; Cameron, James F., Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device.
  36. Jain, Vipul; Ongayi, Owendi; Thackeray, James W.; Cameron, James F., Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device.
  37. McNay Stephanie D. ; Martin Dustin B. ; Marino Thomas L. ; Neckers Douglas C., Photocurable low observable aircraft materials.
  38. Lawton,John A.; Nebe,William J.; Thommes,Glen A.; Caspar,Jonathan V., Photohardenable epoxy composition.
  39. Ober, Matthias S.; Jain, Vipul; Etienne, John B., Photoresist composition, coated substrate, and method of forming electronic device.
  40. Buiguez Francois (S\Egreve FRX) Giral Louis (Montpellier FRX) Rosilio Charles (Lesulis FRX) Schue Francois (Strasbourg FRX), Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process.
  41. Kuczynski Joseph Paul ; Mulholland Laura Marie, Photosensitive reworkable encapsulant.
  42. Kuczynski Joseph P. (Rochester MN), Polymeric sulfonium salt photoinitiators.
  43. Yin, Zhiping; Bai, Jingyi, Prevention of photoresist scumming.
  44. Yin, Zhiping; Bai, Jingyi, Prevention of photoresist scumming.
  45. Yin,Zhiping; Bai,Jingyi, Prevention of photoresist scumming.
  46. Yin,Zhiping; Bai,Jingyi, Prevention of photoresist scumming.
  47. Watanabe Hisashi (Kyoto JPX), Process for forming a pattern using a resist composition having a siloxane-bond structure.
  48. Funhoff Dirk,DEX ; Schwalm Reinhold,DEX ; Binder Horst,DEX, Radiation-sensitive mixture and the production of relief structures having improved contrast.
  49. Schon Lothar,DEX ; Rogler Wolfgang,DEX ; Muhrer Volker,DEX ; Fedtke Manfred,DEX ; Palinsky Andreas,DEX, Reaction resin mixtures and use thereof.
  50. Kaule Wittich,DEX ; Grauvogl Gregor,DEX, Security document and method of producing it.
  51. Kennedy, Joseph T.; Baldwin-Hendricks, Teresa, Spin-on anti-reflective coatings for photolithography.
  52. Kennedy, Joseph; Baldwin, Teresa; Hacker, Nigel P.; Spear, Richard, Spin-on-glass anti-reflective coatings for photolithography.
  53. Kennedy,Joseph; Baldwin,Teresa; Hacker,Nigel P.; Spear,Richard, Spin-on-glass anti-reflective coatings for photolithography.
  54. McDermott, Wayne Thomas; Ockovic, Richard Carl; Roth, Dean Van-John, System and method comprising same for measurement and/or analysis of particles in gas stream.
  55. Natarajan, Arunkumar; Kim, Evgenia Mikhailovna; Watkins, Vicki Herzl; Lee, Julia Lam; McCloskey, Patrick Joseph; Chan, Kwok Pong; Misner, Matthew Jeremiah; Ostroverkhov, Victor Petrovich, Use of appended dyes in optical data storage media.
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