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Measuring apparatus, method of manufacture thereof, and method of writing data into same 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-007/16
출원번호 US-0302824 (1981-06-16)
우선권정보 JP-0134103 (1980-09-26); JP-0002784 (1981-01-12)
발명자 / 주소
  • Muramoto Yutaka (Fujinomiya JPX) Kobayashi Susumu (Fujinomiya JPX) Ishizaka Hideo (Fujinomiya JPX)
출원인 / 주소
  • Terumo Corporation (Tokyo JPX 03)
인용정보 피인용 횟수 : 40  인용 특허 : 3

초록

A measuring apparatus is equipped with an input/output unit for delivering data to externally located equipment and for receiving data from the externally located equipment, or with an input unit for receiving data from the externally located unit, and is adapted to generate correlation data between

대표청구항

A measuring apparatus which comprises: data output means for delivering, to the outside of the apparatus, an output of a sensing system in order to generate correlation data between the output of the sensing system and a sensor output representative of a standard physical quantity; substantially non

이 특허에 인용된 특허 (3)

  1. Fowler John T. (Winthrop MA), Calibration apparatus for automatic magnetic compass correction.
  2. Schonberger Milton (195 Fern St. Westwood NJ 07675), Fever thermometer, or the like sensor.
  3. Varnum Tracy L. (P.O. Box 682 Fort Bragg CA 95437) Livezey ; Jr. Robert L. (P.O. Box 98 Caspar CA 95420), General purpose electronic thermometer having selective data recovery, data conversion, and data derivation capabilities.

이 특허를 인용한 특허 (40)

  1. Woodruff, Daniel J.; Hanson, Kyle M.; Eudy, Steve L.; Weber, Curtis A.; Harris, Randy, Adaptable electrochemical processing chamber.
  2. Moret, Eric J. M., Adaptive thermal actuator array for wafer-level applications.
  3. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.
  4. Chen,Linlin; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Apparatus and method for electrochemically depositing metal on a semiconductor workpiece.
  5. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  6. Hanson,Kyle M.; Ritzdorf,Thomas L.; Wilson,Gregory J.; McHugh,Paul R., Apparatus and methods for electrochemical processing of microelectronic workpieces.
  7. Hanson, Kyle M.; Klocke, John L., Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  8. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  9. Klocke,John; Hanson,Kyle M, Chambers, systems, and methods for electrochemically processing microfeature workpieces.
  10. Armstrong Keith H. ; Kemp Kevin G. ; Liang Faqiu (Frank) ; Ramanan Natarajan, Combination bake/chill apparatus incorporating low thermal mass, thermally conductive bakeplate.
  11. Kano, Shiro, Data acquisition device using radio frequency identification (RFID) system.
  12. Woodruff,Daniel J.; Hanson,Kyle M., Electroplating apparatus with segmented anode array.
  13. Woodruff,Daniel J.; Hanson,Kyle M., Electroplating apparatus with segmented anode array.
  14. Nishi Kenji,JPX, Exposure apparatus.
  15. Ramanan, Natarajan; Sims, James B., Heating member for combination heating and chilling apparatus, and methods.
  16. Ramanan, Natarajan; Sims, James B., Heating member for combination heating and chilling apparatus, and methods.
  17. Koizumi Ryoichi,JPX ; Saito Asao,JPX ; Takayanagi Yoshiaki,JPX, Ink jet recording head with adjustable temperature sensor and ink jet recording system having the same.
  18. Kobayashi Toshiyuki (Kyoto JPX) Ohta Takao (Nagaokakyo JPX) Miura Masatsugu (Kyoto JPX) Matsumoto Hidetoshi (Kyoto JPX), Measuring circuit device.
  19. Weaver, Robert A.; Wilson, Gregory J.; McHugh, Paul R., Method and apparatus for processing a microelectronic workpiece at an elevated temperature.
  20. Robert A. Weaver ; Paul R. McHugh ; Gregory J. Wilson, Method and apparatus for processing a microelectronic workpiece including an apparatus and method for executing a processing step at an elevated temperature.
  21. Kee David F. (Glenside PA), Method and arrangement for providing information to define the values of a set of parameters which characterize an eleme.
  22. Ritzdorf, Thomas L.; Graham, Lyndon W., Method for filling recessed micro-structures with metallization in the production of a microelectronic device.
  23. Ritzdorf,Thomas L.; Graham,Lyndon W., Method for filling recessed micro-structures with metallization in the production of a microelectronic device.
  24. Chen,LinLin; Graham,Lyndon W.; Ritzdorf,Thomas L.; Fulton,Dakin; Batz, Jr.,Robert W., Method of submicron metallization using electrochemical deposition of recesses including a first deposition at a first current density and a second deposition at an increased current density.
  25. Ritzdorf,Thomas L.; Eudy,Steve L.; Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Aegerter,Brian; Dundas,Curt; Peace,Steven L., Methods and apparatus for processing microelectronic workpieces using metrology.
  26. Howell John S. (Fort Worth TX) Hartung Robert L. (Fort Worth TX), Multifunction meter for use in an aircraft.
  27. Gauthier, Claude R.; Yee, Gin S., On-die thermal monitoring technique.
  28. Schuh William C., Smart temperature sensing device.
  29. Yoshimura Hiroshi (Oriono JPX), Soldering iron temperature regulator.
  30. Breinlinger, Richard H., Solid state temperature measuring device and method.
  31. Chen, Linlin; Graham, Lyndon W.; Ritzdorf, Thomas L.; Fulton, Dakin; Batz, Jr., Robert W., Submicron metallization using electrochemical deposition.
  32. Schuh, William C.; Culberston, David P., System and method of compensating for device mounting and thermal transfer errors.
  33. Schuh,William C.; Culbertson,David P., System and method of compensation for device mounting and thermal transfer error.
  34. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
  35. Hanson Jay L. (Bloomington MN), Temperature controller for a transport refrigeration system.
  36. Hanson Jay L. (Bloomington MN), Temperature controlling for a transport refrigeration system.
  37. Chu Yih Yu TW, Thermometer for body temperature detection.
  38. Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece.
  39. Wilson,Gregory J.; McHugh,Paul R.; Weaver,Robert A.; Ritzdorf,Thomas L., Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece.
  40. Wilson,Gregory J.; McHugh,Paul R.; Hanson,Kyle M., Workpiece processor having processing chamber with improved processing fluid flow.
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