초록 ▼

Substrates on which vapor deposition is to take place are mounted on the outside of a generally bell-shaped susceptor which is itself mounted immediately outside a similarly shaped shield which is transparent to infra-red radiation. Infra-red lamps are mounted within the shield and the radiant heat

Substrates on which vapor deposition is to take place are mounted on the outside of a generally bell-shaped susceptor which is itself mounted immediately outside a similarly shaped shield which is transparent to infra-red radiation. Infra-red lamps are mounted within the shield and the radiant heat from them passes through the shield and heats the substrates through the susceptor. An outer, opaque, shield defines an annular gas passage through which reactant gases pass over the heated substrate to cause vapor deposition thereon. Purging gas may be passed between the transparent shield and the susceptor. The lamps and the susceptor may be relatively rotated. The arrangement substantially eliminates the possibility of the reactant gas causing deposition on the transparent shield which would interfere with the passage of radiant heat to the susceptor and the substrate.

대표청구항 ▼

Vapour deposition apparatus for the deposition of a film on a substrate, comprising a source of radiant heat, mounting means for mounting the substrate to be heated by the radiant heat source, means defining a passageway over the substrate, means for passing reactant gas through the passageway so as

Vapour deposition apparatus for the deposition of a film on a substrate, comprising a source of radiant heat, mounting means for mounting the substrate to be heated by the radiant heat source, means defining a passageway over the substrate, means for passing reactant gas through the passageway so as to cause vapour deposition on the heated substrate, and shielding means preventing the reactant gas coming between the source of radiant heat and the substrate.