Methods and compositions for producing decorative frosting effects on glass
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B44C-001/22
C03C-015/00
C03C-025/06
출원번호
US-0524875
(1983-08-22)
발명자
/ 주소
Batchelor, Gary R.
Russo, Sr., Carmen A.
Bradley, Martin
출원인 / 주소
Wheaton Industries
대리인 / 주소
Ratner & Prestia
인용정보
피인용 횟수 :
16인용 특허 :
3
초록▼
This invention pertains to a method and a composition for selectively etching an image on a glass surface to produce decorative frosting effects. More particularly, the method pertains to: depositing on the surface the negative of the image to be etched, a pattern of a crosslinkable resin capable, u
This invention pertains to a method and a composition for selectively etching an image on a glass surface to produce decorative frosting effects. More particularly, the method pertains to: depositing on the surface the negative of the image to be etched, a pattern of a crosslinkable resin capable, upon crosslinking, of resisting a subsequently applied etchant and also capable, upon crosslinking, of being removed from said surface by stripping with hot water or steam treatment; crosslinking said resin; applying an etchant to said surface; and removing said crosslinked resin. More particularly, the composition pertains to the combination of an acrylate oligomer, an acrylate monomer capable of crosslinking with said acrylate oligomer, and a crosslinking agent.
대표청구항▼
1. Method of selectively etching an image on a glass surface for producing decorative frosting effects, comprising depositing on the surface in the negative of said image a pattern of a crosslinkable resin mask capable, upon crosslinking, of resisting a subsequently applied etchant and also capable,
1. Method of selectively etching an image on a glass surface for producing decorative frosting effects, comprising depositing on the surface in the negative of said image a pattern of a crosslinkable resin mask capable, upon crosslinking, of resisting a subsequently applied etchant and also capable, upon crosslinking, of being removed from said glass surface by stripping or hot water or steam treatment, crosslinking said resin, etching said surface with said etchant and removing said crosslinked resin. 2. Method, as recited in claim 1, wherein said resin mask comprises an acrylate oligomer, a co-monomer capable of crosslinking with said acrylate oligomer, and a crosslinking agent therefor. 3. Method, as recited in claim 1, wherein said etching step comprises the application of acid etchant to said glass surface. 4. Method, as recited in claim 1, wherein said etching step comprises impelling hard particles against said glass surface. 5. Method, as recited in claim 1, wherein said resin mask is deposited by pad transfer technique. 6. Method, as recited in claim 2, wherein said crosslinking agent is a photosensitizing agent and said resin mask is crosslinked by exposure to ultraviolet radiation. 7. Method, as recited in claim 3, wherein said resin mask includes epoxy acrylate oligomer. 8. Method, as recited in claim 4, wherein said resin mask includes urethane acrylate oligomer. 9. Method, as recited in claim 5, wherein said resin mask contains a solvent. 10. A polymer composition comprising an acrylate oligomer, a co-monomer capable of crosslinking with said acrylate oligomer, and a crosslinking agent for said oligomer and said co-monomer, said composition being capable of being applied to and adhering to a glass surface, in a pre-selected pattern, being crosslinked thereon, resisting of a glass etchant applied thereto and of being stripped from said glass surface. 11. A composition, as recited in claim 10, wherein said acrylate oligomer is selected from the group consisting of urethane acrylate, polyester acrylate, and acrylic acrylate oligomer. 12. A composition, as recited in claim 10, wherein said crosslinking agent is a photosensitizing agent capable of rendering an etchant-resistant mask curable by means of exposure to ultraviolet radiation. 13. A composition, as recited in claim 12 wherein said photosensitizing agent is benzophenone or chlorothiozanthone. 14. A composition as recited in claim 10 comprising the oligomer epoxy acrylate, the co-monomer diethylene glycol diacrylate and the crosslinking agents benzophenone and chlorothiozanthone. 15. A composition, as recited in claim 10, comprising the oligomer urethane acrylate, the comonomer diethylene glycol diacrylate and the crosslinking agents benzophenone and chlorothiozanthone. 16. A composition, as recited in claim 10, including surfactants. 17. A composition, as recited in claim 10, including solvents. 18. A composition, as recited in claim 16, wherein said surfactants are chosen from the group consisting of silicones and fluorocarbons. 19. A composition, as recited in claim 17, wherein said solvents are chosen from the group consisting of ketones, alcohols and Cellosolve solvents. 20. A composition, as recited in claim 19, wherein said ketone is methyl ethyl ketone. 21. A composition, as recited in claim 19, wherein said alcohol is chosen from the group consisting of butyl alcohol and methyl alcohol.
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이 특허에 인용된 특허 (3)
Schrunk Thomas R. (2306 NE. Garfield St. Minneapolis MN 55418), Decorative glass chipping method.
Bowden Murrae J. S. (Summit NJ) Feit Eugene D. (Berkeley Heights NJ) Thompson Larry F. (Gillette NJ) Wilkins ; Jr. Cletus W. (Plainfield NJ), Fabrication based on radiation sensitive resists and related products.
Pentak William F. (Houston TX) Burkes Dewey L. (Pasadena TX), Method for creating a design in relief in a hard smooth substrate and apparatus for use in the method.
Misciagno Frank V. (1086 Park Blvd. Massepequa Park NY 11762) Young Gregory C. (4 Homer Pl. Poughkeepsie NY 12603) Skoler George A. (6 Carriage Way White Plains NY 10605), Pad printing coating composition and pad printing process.
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