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Wafer loading apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-065/00
출원번호 US-0328408 (1981-12-07)
발명자 / 주소
  • Flint Alan G. (Los Gatos CA) Jacobs William G. (San Jose CA)
출원인 / 주소
  • Applied Materials, Inc. (Santa Clara CA 02)
인용정보 피인용 횟수 : 75  인용 특허 : 4

초록

Apparatus for transferring wafers between storage magazines and processing trays. The trays are mounted on a generally cylindrical carousel which is rotated about its axis to bring successive ones of the trays into position for loading wafers on to the trays and unloading wafers from the trays. An e

대표청구항

Apparatus for transferring wafers between a storage magazine and processing trays having a plurality of wafer holding positions spaced along the same, comprising a multifaceted generally cylindrical carousel on which the trays are removably mounted with the wafer holding positions aligned generally

이 특허에 인용된 특허 (4)

  1. Trayes Terence John (Phoenix AZ), Fixture and system for handling plate like objects.
  2. Salt ; Jr. Walter W. (Hightstown NJ), Retainer ring for securing substrates in a vacuum deposition system.
  3. Shaw R. Howard (Palo Alto CA), Wafer support assembly.
  4. Coad George L. (Lafayette CA) Shaw R. Howard (Palo Alto CA) Hutchinson Martin A. (Santa Clara CA), Wafer transfer system.

이 특허를 인용한 특허 (75)

  1. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
  2. Zuniga, Steven M.; Aqui, Derek G.; Nagengast, Andrew J.; Guerrero, Keenan Leon; Bolla, Harish K.; Agarwal, Aditya, Apparatus and method for simultaneous treatment of multiple workpieces.
  3. Zuniga, Steven M.; Aqui, Derek G.; Nagengast, Andrew J.; Guerrero, Keenan Leon; Bolla, Harish K.; Agarwal, Aditya, Apparatus and method for simultaneous treatment of multiple workpieces.
  4. Conboy Michael R. ; Shedd Danny C. ; Coss ; Jr. Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  5. Conboy,Michael R.; Shedd,Danny C.; Coss, Jr.,Elfido, Automated material handling system for a manufacturing facility divided into separate fabrication areas.
  6. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  7. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  8. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  9. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  10. Doherty,Brian J.; Mariano,Thomas R.; Sullivan,Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  11. Cay Norman S. (Los Gatos CA) Bowers Gerald M. (Boonville CA), Automatic wafer loading method and apparatus.
  12. Goff Gerald L. (Austin TX) Conboy Michael R. (Buda TX), Container-less transfer of semiconductor wafers through a barrier between fabrication areas.
  13. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Conveying system for a vacuum processing apparatus.
  14. Fosnight,William John; Bufano,Michael; Friedman,Gerald; Sullivan,Robert, Extractor/buffer.
  15. Dorumsgaard John A. (Arden Hills MN) Amerson Roger H. (Bloomington MN), Load/unload apparatus for disc-like workpieces.
  16. Pan, Jeng-Yang; Wu, Chia-Chun; Tang, Wen-Fang; Yeh, Su-Yu; Yang, Huai-Tei, Method and apparatus for eliminating wafer breakage during wafer transfer by a vacuum pad.
  17. Ben Jan I. (Lawrenceville NJ), Method and apparatus for transporting semiconductor wafers.
  18. Kang, Chien-Ting, Method for automatically checking sequence of loading boats and batches for semiconductor manufacturing process.
  19. Maydan Dan (Los Altos Hills CA) Somekh Sasson R. (Redwood City CA) Ryan-Harris Charles (La Honda CA) Seilheimer Richard A. (Pleasanton CA) Cheng David (San Jose CA) Abolnikov Edward M. (San Francisco, Semiconductor processing system with robotic autoloader and load lock.
  20. Thompson Raymon F. ; Berner Robert W. ; Curtis Gary L. ; Culliton Stephen P. ; Wright Blaine G. ; Byle Darryl S., Semiconductor processing system with wafer container docking and loading station.
  21. Marohl Dan A. ; Rosenstein Michael, Semiconductor wafer alignment member and clamp ring.
  22. Thompson Raymon F. ; Berner Robert W. ; Curtis Gary L. ; Culliton Stephen P. ; Wright Blaine G., Semiconductor wafer processing system.
  23. Lau John J. (13350 Floyd Cir. Dallas TX 75243), Semiconductor wafer transfer apparatus.
  24. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Substrate changing-over mechanism in a vaccum tank.
  25. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Substrate changing-over mechanism in vacuum tank.
  26. Masayuki Toda JP; Masaki Kusuhara JP; Masaru Umeda JP; Michio Yagai JP, Substrate transfer device and operating method thereof.
  27. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Transferring device for a vacuum processing apparatus and operating method therefor.
  28. Zuniga, Steven M.; Aqui, Derek G.; Nagengast, Andrew J.; Liebscher, Kirk G.; Alexander, John M.; Guerrero, Keenan Leon, Two-chamber system and method for serial bonding and exfoliation of multiple workpieces.
  29. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method.
  30. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method.
  31. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method using a vacuum chamber.
  32. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method with wafers, substrates and/or semiconductors.
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  39. Kato, Shigekazu; Nishihata, Kouji; Tsubone, Tsunehiko; Itou, Atsushi, Vacuum processing apparatus.
  40. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
  41. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
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  43. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
  44. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
  45. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
  46. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Vacuum processing apparatus.
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  48. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus and operating method therefor.
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