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Electrostatic chuck 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01F-013/00
출원번호 US-0416723 (1982-09-10)
우선권정보 GB-0027638 (1981-09-14)
발명자 / 주소
  • Lewin Ian H. (Forest Row GB2) Plummer Michael J. (Redhill GB2) Ward Rodney (Crawley GB2)
출원인 / 주소
  • U.S. Philips Corporation (New York NY 02)
인용정보 피인용 횟수 : 86  인용 특허 : 1

초록

An electrostatic chuck for holding a simiconductor wafer flat in a charged particle beam machine has thermally conductive portions for supporting the wafer. An electrically conductive member, for example a grid, has parts which extend between the thermally-conductive portions and is separated from t

대표청구항

An electrostatic chuck for holding a semiconductor wafer in a fixed plane relative to said chuck, which chuck comprises an electrically conductive member separated from said fixed plane by a layer of dielectric material, means for electrically contacting the wafer, and means for supporting the wafer

이 특허에 인용된 특허 (1)

  1. Abe, Naomichi, Method and apparatus for dry etching and electrostatic chucking device used therein.

이 특허를 인용한 특허 (86)

  1. Hoi Cheong Sun ; Dominic Stephen Rosati ; Eugene Samuel Puliniak ; Bawa Singh ; Nitin Vithalbhai Desai, AC waveforms biasing for bead manipulating chucks.
  2. Sun Hoi Cheong Steve ; Poliniak Eugene Samuel ; Rosati Dominic Stephen ; Singh Bawa ; Desai Nitin Vithalbhai, AC waveforms biasing for bead manipulating chucks.
  3. Oohashi,Kaoru; Mizukami,Shunsuke; Ueda,Takehiro, Absorption board for an electric chuck used in semiconductor manufacture.
  4. Larsen, Grant Kenji, Active electrostatic seal and electrostatic vacuum pump.
  5. Clemens James T. (Watchung NJ) Hong Shane Y. (Berkeley Heights NJ), Apparatus comprising an electrostatic wafer cassette.
  6. Hayden John R. (Denver CO) Huetson Curtis L. (Denver CO), Apparatus for preheating printed circuit boards.
  7. Sung, Jae-Hyun; Kim, Jong-Min, Apparatus for supporting a wafer, apparatus for exposing a wafer and method of supporting a wafer.
  8. Hayashi,Daisuke, Attracting disc for an electrostatic chuck for semiconductor production.
  9. Hayashi,Daisuke, Attracting disc for an electrostatic chuck for semiconductor production.
  10. Hayashi,Daisuke, Attracting disc for an electrostatic chuck for semiconductor production.
  11. Sasaki,Yasuharu; Kosakai,Mamoru, Attracting plate of an electrostatic chuck for semiconductor manufacturing.
  12. Hoeks,Martinus Hendricus Hendricus; Ottens,Joost Jeroen, Chuck, lithographic apparatus and device manufacturing method.
  13. Baldus, Oliver, Clamp with burls-electrode.
  14. Baldus, Oliver, Clamp with ceramic electrode.
  15. Baldus, Oliver, Clamp with electrode carrier disk.
  16. Reynolds, Glyn J., Conductive seal ring electrostatic chuck.
  17. Poliniak Eugene Samuel ; Sun Hoi Cheong Steve ; Desai Nitin Vithalbhai ; Kumar Nalin ; Roach William Ronald ; Hammer Lawrence Harrison ; Southgate Peter David ; Singh Bawa ; Rivenburg Howard Christop, Dry powder deposition apparatus.
  18. Jones Phillip Lawrence ; Jafarian-Tehrani Seyed Jafar ; Atlas Boris V. ; Liu David R-Chen ; Tokunaga Ken Edward ; Chen Ching-Hwa, Dynamic feedback electrostatic wafer chuck.
  19. Ooshio Hirosuke (Zama JPX) Watanabe Osamu (Zama JPX), Electrostatic chuck.
  20. Smith Peter C. (Burlingame CA), Electrostatic chuck.
  21. Ward Rodney (Crawley GBX) Lewin Ian H. (Forest Row GBX), Electrostatic chuck.
  22. Kumar Ananda H. ; Shamouilian Shamouil, Electrostatic chuck capable of rapidly dechucking a substrate.
  23. Logan Joseph ; Tompkins Robert, Electrostatic chuck employing thermoelectric cooling.
  24. Hausmann Gilbert, Electrostatic chuck having a combination electrode structure for substrate chucking, heating and biasing.
  25. Wadensweiler Ralph M. ; Kumar Ajay ; Deshmukh Shashank C. ; Jiang Weinan ; Guenther Rolf A., Electrostatic chuck having a thermal transfer regulator pad.
  26. Kholodenko Arnold ; Veytser Alexander M. ; Shamouilian Shamouil, Electrostatic chuck having a unidirectionally conducting coupler layer.
  27. Lewin, Ian H., Electrostatic chuck loading.
  28. Shamouilian Shamouil ; Somekh Sasson ; Levinstein Hyman J. ; Birang Manoocher ; Sherstinsky Semyon ; Cameron John F., Electrostatic chuck with conformal insulator film.
  29. Burkhart Vincent E. ; Flanigan Allen ; Sansoni Steven, Electrostatic chuck with improved spacing and charge migration reduction mask.
  30. Shamouilian Shamouil ; Kholodenko Arnold ; Kats Semyon ; Sherstinsky Semyon ; Clinton Jon ; Bedi Surinder, Electrostatic chuck with improved temperature control and puncture resistance.
  31. Sun Hoi Cheong Steve ; Pletcher Timothy Allen, Electrostatic chucks and a particle deposition apparatus therefor.
  32. Sun Hoi Cheong Steve ; Pletcher Timothy Allen, Electrostatic chucks and a particle deposition apparatus therefor.
  33. Ottens,Joost Jeroen; Neerhof,Hendrik Antony Johannes; Zaal,Koen Jacobus Johannes Maria; Le Kluse,Marco, Electrostatic clamp assembly for a lithographic apparatus.
  34. Stephen Edward Savas TW; John Zajac, Electrostatic clamp for holding workpieces with irregular surfaces.
  35. Helmus, Peter Richard; Lipson, Matthew; Wilklow, Ronald A.; Kennon, James; White, Kennard; Reichmann, II, Wilbur Jordan, Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp.
  36. Sijben, Anko Jozef Cornelus, Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp.
  37. Brinkhof, Eugene Maria; Bex, Jan; Sijben, Anko Jozef Cornelus; Damen, Johannes Wilhelmus, Electrostatic clamp, lithographic apparatus, and device manufacturing method.
  38. Bobbio Stephen M. (Wake Forest NC), Electrostatic handling device.
  39. William A. Frutiger, Electrostatic wafer clamp.
  40. Grant Kenji Larsen, Electrostatic wafer clamp having electrostatic seal for retaining gas.
  41. Larsen Grant Kenji, Electrostatic wafer clamp having low particulate contamination of wafers.
  42. Burkhart Vincent E., Insulated wafer spacing mask for a substrate support chuck and method of fabricating same.
  43. Collins Kenneth S. (San Jose CA), Isolated electrostatic wafer blade clamp.
  44. Ottens,Joost Jeroen; Moors,Johannes Hubertus Josephina; Giesen,Peter Theodorus Maria, Lithographic apparatus and device manufacturing method.
  45. Gilissen, Noud Jan; Donders, Sjoerd Nicolaas Lambertus; Leenders, Martinus Hendrikus Antonius, Lithographic apparatus and method of manufacturing a device.
  46. Van Mierlo, Hubert Adriaan; Ham, Erik Leonardus; Meijer, Hendricus Johannes Maria; Neerhof, Hendrik Antony Johannes; Ottens, Joost Jeroen; Leijtens, Johannes Adrianus Petrus; Le Kluse, Marco; Hopman, Jan; Moors, Johannes Hubertus Josephina, Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus.
  47. Shufflebotham Paul Kevin ; Barnes Michael Scott, Low voltage electrostatic clamp for substrates such as dielectric substrates.
  48. David A. Markle, Magnetically positioned X-Y stage having six degrees of freedom.
  49. Markle David A., Magnetically positioned X-Y stage having six degrees of freedom.
  50. Markle David A., Magnetically-positioned X-Y stage having six-degrees of freedom.
  51. Lee, Choong-Ho; Yun, Sung-Sik; Park, Tong-Jin; Lee, Doh-Hyoung, Metal sheet holding device for manufacturing pattern mask.
  52. Burkhart Vincent E., Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck.
  53. Burkhart Vincent E., Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck.
  54. Smith, John Stephen, Method and apparatus for fabricating self-assembling microstructures.
  55. Smith, John Stephen, Method and apparatus for fabricating self-assembling microstructures.
  56. Fotland, Richard; Bowers, John; Jameson, William, Method and apparatus for producing uniform small portions of fine powders and articles thereof.
  57. Fotland, Richard; Bowers, John; Jameson, William, Method for depositing particles onto a substrate using an alternating electric field.
  58. Hass Crystal J. ; Kelleher Patrick J., Method for forming an ion implanted electrostatic chuck.
  59. Stein, Alexander, Method for producing an electrostatic holding apparatus.
  60. Stone, Dale K.; Blake, Julian G.; Lischer, D. Jeffrey, Method of cooling textured workpieces with an electrostatic chuck.
  61. Hoi Cheong Steve Sun ; Timothy Allen Pletcher, Method of depositing particles with an electrostatic chuck.
  62. Sun, Hoi Cheong Steve; Pletcher, Timothy Allen, Method of depositing particles with an electrostatic chuck.
  63. Tamura Naoyuki,JPX ; Takahashi Kazue,JPX ; Ito Youichi,JPX ; Ogawa Yoshifumi,JPX ; Shichida Hiroyuki,JPX ; Tsubone Tsunehiko,JPX, Method of holding substrate and substrate holding system.
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  65. Poliniak, Eugene Samuel; Steve Sun, Hoi Cheong; Desai, Nitin Vithalbhai; Kumar, Nalin; Roach, William Ronald; Hammer, Lawrence Harrison; Southgate, Peter David; Singh, Bawa; Rivenburg, Howard Christo, Methods using dry powder deposition apparatuses.
  66. Poliniak, Eugene Samuel; Sun, Hoi Cheong Steve; Desai, Nitin Vithalbhai; Kumar, Nalin; Roach, William Ronald; Hammer, Lawrence Harrison; Southgate, Peter David; Singh, Bawa; Rivenburg, Howard Christo, Methods using dry powder deposition apparatuses.
  67. Herchen Harald, Monocrystalline ceramic coating having integral bonding interconnects for electrostatic chucks.
  68. Herchen, Harald, Monocrystalline ceramic electrostatic chuck.
  69. Burkhart Vincent E. ; Harvey Stefanie E., Monopolar electrostatic chuck having an electrode in contact with a workpiece.
  70. Burkhart Vincent E. ; Harvey Stefanie E., Monopolar electrostatic chuck having an electrode in contact with a workpiece.
  71. Clinton Jon ; Contreras Mark ; Kumar Anand H. ; Shamouilian Shamouil ; Wang You ; Bedi Surinder, Multi-electrode electrostatic chuck having fuses in hollow cavities.
  72. Husain Anwar, Multilayered electrostatic chuck and method of manufacture thereof.
  73. Castro Edward Ross ; Tokunaga Ken Edwin ; Atlas Boris V. ; Liu David Ru-Chen, Negative offset bipolar electrostatic chucks.
  74. Maxwell Martin M. ; Birk Thomas J., Pickup chuck for multichip modules.
  75. Dible Robert D. ; Lenz Eric H. ; Lambson Albert M., Power segmented electrode.
  76. Dible Robert D. ; Lenz Eric H. ; Lambson Albert M., Power segmented electrode.
  77. Donde Arik ; Levinstein Hyman J. ; Wu Robert W. ; Hegedus Andreas ; Weldon Edwin C. ; Shamouilian Shamouil ; Clinton Jon T. ; Bedi Surinder S., Puncture resistant electrostatic chuck.
  78. Donde Arik ; Levinstein Hyman J. ; Wu Robert W. ; Hegedus Andreas ; Weldon Edwin C. ; Shamouilian Shamouil ; Clinton Jon T. ; Bedi Surinder S., Puncture resistant electrostatic chuck.
  79. Huang, Jao Sheng; Chen, Ming-Fa, Semiconductor wafer carrier.
  80. Kumar Ananda H. ; Shamouilian Shamouil ; Levinstein Hyman J. ; Parkhe Vijay, Stand-off pad for supporting a wafer on a substrate support chuck.
  81. Bex, Jan; Ten Kate, Nicolaas; Lafarre, Raymond Wilhelmus Louis; Damen, Johannes Wilhelmus; Brinkhof, Eugene Maria; Karade, Yogesh Pramod, Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
  82. Lue Brian ; Ishikawa Tetsuya ; Redeker Fred C. ; Wong Manus ; Li Shijian, Substrate support with pressure zones having reduced contact area and temperature feedback.
  83. Kholodenko Arnold ; Veytser Alexander, Topographical structure of an electrostatic chuck and method of fabricating same.
  84. Wang, Yeh-Chieh; Pai, Jiun-Rong; Liu, Hsu-Shui; Lee, Cheng-Lung; Liou, Kuang-Chung, Wafer chuck.
  85. Walther, Steven R., Wafer clamping apparatus and method.
  86. Mountsier Thomas ; Wing James, Wafer cooling device.
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