$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Procedure for fabrication of microstructures over large areas using physical replication 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/306
  • B44C-001/22
  • C03C-015/00
  • C03C-025/06
출원번호 US-0577174 (1984-02-06)
발명자 / 주소
  • Deckman Harry W. (Clinton NJ) Dunsmuir John H. (Annandale NJ)
출원인 / 주소
  • Exxon Research and Engineering Co. (Florham Park NJ 02)
인용정보 피인용 횟수 : 135  인용 특허 : 0

초록 ▼

The present invention is an improved replication process which copies a master pattern onto an intermediate transfer mask which is then used to form a lithographic mask on the surface of a substrate. A pattern derived from the original master pattern is then produced in the substrate by an etching p

대표청구항 ▼

A process for the negative or positive replication of microstructures from a master comprising: (a) coating said master with a layer of film forming polymer material so as to form a negative replica of said microstructures of said master onto one surface of said polymer material, such that said poly

이 특허를 인용한 특허 (135)

  1. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
    상세보기
  2. Sreenivasan,Sidlgata V; Watts,Michael P. C.; Choi,Byung Jin; Voisin,Ronald D.; Schumaker,Norman E., Alignment systems for imprint lithography.
    상세보기
  3. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Apparatus to control displacement of a body spaced-apart from a surface.
    상세보기
  4. Cherala,Anshuman; Sreenivasan,Sidlgata V.; Schumaker,Norman E., Applying imprinting material to substrates employing electromagnetic fields.
    상세보기
  5. Meissl, Mario J.; Choi, Byung J., Assembly and method for transferring imprint lithography templates.
    상세보기
  6. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Capillary imprinting technique.
    상세보기
  7. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
    상세보기
  8. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
    상세보기
  9. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
    상세보기
  10. Xu, Frank Y., Composition for adhering materials together.
    상세보기
  11. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
    상세보기
  12. Xu,Frank Y.; Stacey,Nicholas A., Composition to provide a layer with uniform etch characteristics.
    상세보기
  13. Xu,Frank Y.; Miller,Michael N., Composition to reduce adhesion between a conformable region and a mold.
    상세보기
  14. Willson,C. Grant; Stacey,Nicholas A., Compositions for dark-field polymerization and method of using the same for imprint lithography processes.
    상세보기
  15. Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Voisin, Ronald D., Conforming template for patterning liquids disposed on substrates.
    상세보기
  16. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
    상세보기
  17. Singhvi, Rahul; Kumar, Amit; Whitesides, George M.; Ingber, Donald E.; Lopez, Gabriel P.; Wang, Daniel I. C.; Stephanopoulos, Gregory, Device containing cytophilic islands that adhere cells separated by cytophobic regions.
    상세보기
  18. Singhvi,Rahul; Kumar,Amit; Whitesides,George M.; Ingber,Donald E.; Lopez,Gabriel P.; Wang,Daniel I. C.; Stephanopoulos,Gregory N., Device containing cytophilic islands that adhere cells separated by cytophobic regions.
    상세보기
  19. Bailey, Todd C.; Choi, Byung-Jin; Colburn, Matthew E.; Sreenivasan, Sidlgata V.; Willson, Carlton G.; Ekerdt, John G., Device for holding a template for use in imprint lithography.
    상세보기
  20. Iwamatsu,Seiichi, Electron beam duplication lithography method.
    상세보기
  21. Iwamatsu, Seiichi, Electron beam duplication lithography method and apparatus.
    상세보기
  22. Iwamatsu,Seiichi, Electron beam duplication lithography method and apparatus.
    상세보기
  23. Sreenivasan,Sidlgata V., Eliminating printability of sub-resolution defects in imprint lithography.
    상세보기
  24. Amos, Richard M; Bryan-Brown, Guy P; Wood, Emma L; Jones, John C; Worthing, Philip T, Embossing method and apparatus.
    상세보기
  25. Nimmakayala, Pawan Kumar; Choi, Byung-Jin; Rafferty, Tom H.; Schumaker, Philip D., Enhanced multi channel alignment.
    상세보기
  26. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
    상세보기
  27. Klitsner, Tom; Sylwester, Alan P.; Ryba, Gail N.; Zipperian, Thomas E.; Kravitz, Stanley H.; Hecht, Andrew, Fuel cell and membrane.
    상세보기
  28. Klitsner, Tom; Sylwester, Alan P.; Ryba, Gail N.; Zipperian, Thomas E.; Kravitz, Stanley H.; Hecht, Andrew, Fuel cell and membrane.
    상세보기
  29. Voisin, Ronald D., Imprint alignment method, system and template.
    상세보기
  30. Voisin, Ronald D., Imprint alignment method, system, and template.
    상세보기
  31. Wuister, Sander Frederik; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar, Imprint lithography.
    상세보기
  32. Wuister, Sander Frederik; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar, Imprint lithography.
    상세보기
  33. Xu, Frank Y.; McMackin, Ian Matthew; Lad, Pankaj B., Imprint lithography method.
    상세보기
  34. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
    상세보기
  35. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks.
    상세보기
  36. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
    상세보기
  37. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
    상세보기
  38. Nimmakayala,Pawan Kumar; Rafferty,Tom H.; Aghili,Alireza; Choi,Byung Jin; Schumaker,Philip D.; Babbs,Daniel A., Interferometric analysis for the manufacture of nano-scale devices.
    상세보기
  39. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van N., Interferometric analysis method for the manufacture of nano-scale devices.
    상세보기
  40. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung-Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van Nguyen, Interferometric analysis method for the manufacture of nano-scale devices.
    상세보기
  41. Kaneko, Asako; Muto, Hirobumi; Kamino, Atsushi, Ion milling device.
    상세보기
  42. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
    상세보기
  43. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
    상세보기
  44. Whitesides, George M.; Kumar, Amit, Kit For Microcontact Printing.
    상세보기
  45. Hubert, Brian N., Large area dissolvable template lithography.
    상세보기
  46. Hubert, Brian N., Large area dissolvable template lithography.
    상세보기
  47. Chou,Stephen Y., Laser assisted direct imprint lithography.
    상세보기
  48. Chou,Stephen Y., Lithographic apparatus for molding ultrafine features.
    상세보기
  49. Nimmakayala,Pawan K.; Sreenivasan,Sidlgata V.; Choi,Byung Jin; Cherala,Anshuman, Magnification correction employing out-of-plane distortion of a substrate.
    상세보기
  50. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
    상세보기
  51. Chou, Stephen Y., Method and apparatus for high density nanostructures.
    상세보기
  52. Chou, Stephen Y., Method and apparatus for high density nanostructures.
    상세보기
  53. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
    상세보기
  54. McMackin,Ian M.; Schumaker,Phillip D.; Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Method and system to measure characteristics of a film disposed on a substrate.
    상세보기
  55. Xu, Frank Y., Method for adhering materials together.
    상세보기
  56. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
    상세보기
  57. Schumaker, Philip D., Method for detecting a particle in a nanoimprint lithography system.
    상세보기
  58. Choi, Byung-Jin; GanapathiSubramanian, Mahadevan; Choi, Yeong-jun; Meissl, Mario J., Method for expelling gas positioned between a substrate and a mold.
    상세보기
  59. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
    상세보기
  60. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
    상세보기
  61. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
    상세보기
  62. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
    상세보기
  63. Sreenivasan, Sidlgata V.; Bonnecaze, Roger T.; Willson, Carlton Grant, Method for imprint lithography using an electric field.
    상세보기
  64. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Fletcher, Edward Brian, Method for imprint lithography utilizing an adhesion primer layer.
    상세보기
  65. Cox J. Allen (New Brighton MN) Wilke Robert M. (Maple Grove MN), Method for making surface relief profilers.
    상세보기
  66. Khusnatdinov, Niyaz; Chang, Tanwin, Method for producing large area antireflective microtextured surfaces.
    상세보기
  67. Nystrom,Michael J.; Grot,Annette C., Method for selective area stamping of optical elements on a substrate.
    상세보기
  68. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
    상세보기
  69. Sreenivasan,Sidlgata V.; Xu,Frank Y., Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom.
    상세보기
  70. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
    상세보기
  71. Everhart Dennis S. ; Whitesides George M., Method of contact printing on gold coated films.
    상세보기
  72. LaBrake,Dwayne L., Method of controlling the critical dimension of structures formed on a substrate.
    상세보기
  73. Bailey,Todd; Choi,Byung J.; Colburn,Matthew; Sreenivasan,Sidlgata V.; Willson,C. Grant; Ekerdt,John, Method of creating a dispersion of a liquid on a substrate.
    상세보기
  74. McMackin, Ian M.; Stacey, Nicholas A.; Babbs, Daniel A.; Voth, Duane J.; Watts, Mathew P. C.; Truskett, Van N.; Xu, Frank Y.; Voisin, Ronald D.; Lad, Pankaj B., Method of creating a turbulent flow of fluid between a mold and a substrate.
    상세보기
  75. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Method of determining alignment of a template and a substrate having a liquid disposed therebetween.
    상세보기
  76. Sreenivasan,Sidlgata V., Method of forming a recessed structure employing a reverse tone process.
    상세보기
  77. Vidusek,David A.; Sreenivasan,Sidlgata V.; Wang,David C., Method of forming an in-situ recessed structure.
    상세보기
  78. Sreenivasan,Sidlgata V., Method of forming stepped structures employing imprint lithography.
    상세보기
  79. Chou, Stephen Y.; Yu, Zhaoning; Wu, Wei, Method of making an article comprising nanoscale patterns with reduced edge roughness.
    상세보기
  80. Yu, Kyong Tae, Method of manufacturing organic light emitting display apparatus.
    상세보기
  81. Harrison Christopher ; Park Miri ; Register Richard ; Adamson Douglas ; Mansky Paul ; Chaikin Paul, Method of nanoscale patterning and products made thereby.
    상세보기
  82. Miller,Michael N.; Stacey,Nicholas A., Method of patterning surfaces while providing greater control of recess anisotropy.
    상세보기
  83. Sreenivasan,Sidlgata V., Method of planarizing a semiconductor substrate with an etching chemistry.
    상세보기
  84. Ferro, Mario, Method of reproducing colored images on a heat transferable decorative, at least partially metallized and/or 2 D or 3 D holographic film.
    상세보기
  85. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
    상세보기
  86. Choi, Yeong-Jun; Choi, Byung-Jin, Method to control an atmosphere between a body and a substrate.
    상세보기
  87. Reed Michael L. (Pittsburgh PA) Abe Takeshi (Pittsburgh PA), Method to prevent adhesion of micromechanical structures.
    상세보기
  88. Reed Michael L. ; Abe Takeshi,JPX, Method to prevent adhesion of micromechanical structures.
    상세보기
  89. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
    상세보기
  90. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
    상세보기
  91. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
    상세보기
  92. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
    상세보기
  93. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
    상세보기
  94. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
    상세보기
  95. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
    상세보기
  96. Xu,Frank Y.; Stacey,Nicholas E.; Watts,Michael P. C.; Thompson,Ecron D., Methods for fabricating patterned features utilizing imprint lithography.
    상세보기
  97. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
    상세보기
  98. Whitesides George M. ; Xia Younan ; Wilbur James L. ; Jackman Rebecca J. ; Kim Enoch ; Prentiss Mara G. ; Mrksich Milan ; Kumar Amit ; Gorman Christopher B. ; Biebuyck Hans,CHX ; Berggren Karl K., Methods of etching articles via microcontact printing.
    상세보기
  99. Whitesides, George M.; Xia, Younan; Wilbur, James L.; Jackman, Rebecca J.; Kim, Enoch; Prentiss, Mara G.; Mrksich, Milan; Kumar, Amit; Gorman, Christopher B.; Biebuyck, Hans; Berggren, Karl K., Methods of etching articles via microcontact printing.
    상세보기
  100. Ledieu Jean,FRX ; Dufresne Jean-Francois,FRX, Methods of manufacture of master disk for making a die for pressing optical disks.
    상세보기
  101. Voisin,Ronald D., Methods of manufacturing a lithography template.
    상세보기
  102. Whitesides George M. ; Xia Younan ; Wilbur James L. ; Jackman Rebecca J. ; Kim Enoch ; Prentiss Mara G. ; Mrksich Milan ; Kumar Amit ; Gorman Christopher B. ; Biebuyck Hans,CHX ; Berggren Karl K., Microcontact printing on surfaces and derivative articles.
    상세보기
  103. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
    상세보기
  104. Li,Zhiyong; Yu,Zhaoning, Nanoscale structures, systems, and methods for use in nano-enhanced raman spectroscopy (NERS).
    상세보기
  105. Parikka,Marko; Turunen,Jari, Optical coupling arrangement.
    상세보기
  106. O'Brien, Patrick J., Optical storage device with print layer surface feature.
    상세보기
  107. Sakai Kunihiro (Yamato JPX) Miyazaki Toshihiko (Atsugi JPX) Eguchi Ken (Atsugi JPX) Kawada Haruki (Atsugi JPX) Tomida Yoshinori (Atsugi JPX) Kimura Toshiaki (Sagamihara JPX) Matsuda Hiroshi (Yokohama, Organic photo conductive medium.
    상세보기
  108. Sreenivasan, Sidlgata V., Pattern reversal employing thick residual layers.
    상세보기
  109. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
    상세보기
  110. Stacey,Nicholas A.; Sreenivasan,Sidlgata V.; Miller,Michael N., Patterning substrates employing multi-film layers defining etch-differential interfaces.
    상세보기
  111. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
    상세보기
  112. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
    상세보기
  113. Everhart Dennis S., Polymer films having a printed self-assembling monolayer.
    상세보기
  114. Kim, Enoch, Polymer gel contact masks and methods and molds for making same.
    상세보기
  115. Sreenivasan,Sidlgata V., Positive tone bi-layer imprint lithography method.
    상세보기
  116. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Remote center compliant flexure device.
    상세보기
  117. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
    상세보기
  118. Sreenivasan,Sidlgata V.; Stacey,Nicholas A., Reverse tone patterning on surfaces having planarity perturbations.
    상세보기
  119. Watts,Michael P. C.; McMackin,Ian, Scatterometry alignment for imprint lithography.
    상세보기
  120. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
    상세보기
  121. Schulze, Hans-Joachim; Laven, Johannes; Schulze, Holger, Semiconductor device having a surface with ripples.
    상세보기
  122. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Michael P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., Single phase fluid imprint lithography method.
    상세보기
  123. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
    상세보기
  124. Hornbeck Larry J. (Van Alstyne TX), Spatial light modulator.
    상세보기
  125. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
    상세보기
  126. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
    상세보기
  127. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
    상세보기
  128. Watts,Michael P. C.; Choi,Byung Jin; Sreenivasan,Sidlgata V., System for dispensing liquids.
    상세보기
  129. Schumaker, Philip D.; Fancello, Angelo; Kim, Jae H.; Choi, Byung-Jin; Babbs, Daniel A., System to transfer a template transfer body between a motion stage and a docking plate.
    상세보기
  130. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Meissl,Mario J., Systems for magnification and distortion correction for imprint lithography processes.
    상세보기
  131. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Miller, Michael N.; Stacey, Nicholas A., Technique for separating a mold from solidified imprinting material.
    상세보기
  132. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
    상세보기
  133. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
    상세보기
  134. Auzelyte, Vaida; Savu, Veronica, Tool surface nano-structure patterning process.
    상세보기
  135. Rogers, John A.; Jackman, Rebecca J.; Paul, Kateri E.; Schueller, Olivier J. A.; Breen, Tricia Lynn; Whitesides, George M., Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로