Chemical laser pump including cryogenic and condensing means
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01S-003/095
H01S-003/22
출원번호
US-0139494
(1980-04-11)
발명자
/ 주소
Blumenthal Jack L. (Los Angeles County CA) Ogren John R. (Orange County CA) Rutkowski Eugene V. (Los Angeles County CA) Appel Marvin (Los Angeles County CA)
출원인 / 주소
TRW Inc. (Redondo Beach CA 02)
인용정보
피인용 횟수 :
14인용 특허 :
6
초록▼
A chemical laser including a laser pump which is relatively lightweight with no moving parts is provided. This produces a low pressure, regenerable, closed system for treating laser cavity exhaust gases to remove (i.e., pump) them from the system. The exhaust gases which emerge from the laser cavity
A chemical laser including a laser pump which is relatively lightweight with no moving parts is provided. This produces a low pressure, regenerable, closed system for treating laser cavity exhaust gases to remove (i.e., pump) them from the system. The exhaust gases which emerge from the laser cavity of the chemical laser are pumped by a combination of condensation, cryogenic adsorption, and by reaction preferably with titanium, titanium-zirconium alloys, zirconium, tantalum, etc. These exhaust gases include hydrogen, deuterium and their halides, the halogens, oxygen, CO2, nitrogen and H2O. This obviates the requirements for heavy equipment normally employed to produce a high vacuum in the laser cavity.
대표청구항▼
A chemical laser including a laser cavity, an exhaust, a pump for removing exhaust gases from the laser cavity at a rate and sufficiently low pressure to sustain lasing action and provide a closed system, the pump including a metal selected from the class consisting of titanium, zirconium, hafnium,
A chemical laser including a laser cavity, an exhaust, a pump for removing exhaust gases from the laser cavity at a rate and sufficiently low pressure to sustain lasing action and provide a closed system, the pump including a metal selected from the class consisting of titanium, zirconium, hafnium, vanadium, niobium, tantalum, yttrium, scandium, elements 57-71 of the periodic table, lithium, sodium, potassium, rubidium, cesium, beryllium, palladium, magnesium, strontium, calcium, barium, boron, gallium and mixtures and alloys thereof; the exhaust gases being selected from the class consisting of hydrogen, deuterium and their halides, the halogens, nitrogen, CO2, oxygen and water vapor; cryogenic adsorption means to remove nitrogen and CO2; and condensing means to remove the halides of hydrogen and deuterium and water vapor; the metal of said pump being adapted to react with oxygen, hydrogen, deuterium and the halogens to form solid reaction products therewith.
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이 특허에 인용된 특허 (6)
Grossman Leonard N. (Livermore CA) Packard Douglas R. (Sunol CA), Alloys for gettering moisture and reactive gases.
Ogren ; John R. ; Ogle ; Gilbert J. ; Rutkowski ; Eugene V., Process for producing chemical pump absorbents for a cartridge combustion-driven chemical laser.
Caledonia George E. (Milton MA) Krech Robert H. (Saugus MA) Green Byron D. (Reading MA) Pirri Anthony N. (Andover MA), Source of high flux energetic atoms.
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