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Method and apparatus for electron curing on a cooled drum

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0487461 (1983-04-22)
발명자 / 주소
  • Nablo Sam V. (Lexington MA) Tripp
  • III Edwin P. (Wilmington MA)
출원인 / 주소
  • Energy Sciences, Inc. (Woburn MA 02)
인용정보 피인용 횟수 : 27  인용 특허 : 5

초록

This disclosure is concerned with a method of transfer-coating electron-beam-curable materials, by applying such materials to the surface of a cooled drum, either through a sheet or web carrying the same over the drum or from the drum surface itself, curing the material against the drum at a region

대표청구항

A method of transfer-coating electron-beam-curable material, that comprises, drawing over the external surface of a rotating metal drum a first web carrying such material, drawing a second web past the drum in contact with the first web at a predetermined region adjacent to the external surface of t

이 특허에 인용된 특허 (5)

  1. Froehlig Guy M. (Glen Cove NY), Method for substantially instantaneous liquid molding of an article.
  2. Nablo Sam V. (Lexington MA), Method of and apparatus for shielding inert-zone electron irradiation of moving web materials.
  3. Nablo Sam V. (Lexington MA) Fussa Alfred D. (Needham Heights MA), Process and apparatus for the curing of coatings on sensitive substrates by electron irradiation.
  4. Gray ; III Lorin S. (Portland ME) Mattor John A. (Bar Mills ME) Millard Ben (South Windham ME) Ward Franklin J. (Cape Elizabeth ME), Surface replication on a coated substrate.
  5. Sack Wieland (Bissendorf DEX) Anthonsen Reiner (Bramsche DEX) Kertesz Ferenc (Bissendorf DEX), Waterproof photographic paper and method of producing same.

이 특허를 인용한 특허 (27)

  1. DiZio, James P.; Weiss, Douglas E.; Sventek, Bruce A.; Carter, Charles G., Adhesive coating method.
  2. James P. DiZio ; Douglas E. Weiss ; Bruce A. Sventek ; Charles G. Carter, Adhesive coating method and adhesive coated article.
  3. D\Amato Salvatore F. (Floral Park NY) Sorbo Peter (Stamford CT) Dunning Richard E. (Claremont CA), Apparatus for printing and for forming a hologram on sheet material.
  4. D\Amato Salvatore F. (Floral Park NY) Sorbo Peter (Stamford CT) Dunning Richard E. (Claremont CA), Combined process of printing and forming a hologram.
  5. Björnson, Torleif Ove; Shea, Laurence R., Continuous form microstructure assay array.
  6. N��slund,Lars Åke; Nilsson,Tommy; Poppi,Luca; Benedetti,Paolo; Eriksson,Anna; Ferrarini,Filippo, Device and method for electron beam irradiation.
  7. Drenter, John, Electron beam web irradiation apparatus and process.
  8. Choi,Byung Jin; Meissl,Mario J.; Sreenivasan,Sidlagata V.; Watts,Michael P. C., Formation of discontinuous films during an imprint lithography process.
  9. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
  10. Weiss Douglas E. ; Tran Thu-Van T. ; Sventek Bruce A., Low temperature electron beam polymerization.
  11. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  12. Tripp ; III Edwin P. (Wilmington MA) Weisman Jason (Newton MA) Hissong George (Kennebunk ME), Method of and apparatus for electron beam curing coated, porous and other web structures.
  13. Sreenivasan,Sidlgata V.; Xu,Frank Y., Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom.
  14. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
  15. Kamada Koh (Odawara JPX) Hashimoto Hiroshi (Odawara JPX) Okita Tsutomu (Odawara JPX), Method of making substrate for magnetic recording medium.
  16. Calhoun Clyde D. (Stillwater MN) Koskenmaki David C. (St. Paul MN), Method of transferring an inorganic image.
  17. Davis, Peter Kennedy; Rubinsztajn, Slawomir, Methods and apparatus for crosslinking a silicon carbide fiber precursor polymer.
  18. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  19. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  20. McGregor Charles W. (Fort Wayne IN), Preparing magnet wire having electron beam curable wire enamels.
  21. Fuchizawa Tetsuro (Shizuoka JPX) Asao Yasuzi (Shizuoka JPX) Takayanagi Takashi (Shizuoka JPX), Process for producing support for photographic paper and the support produced by the process.
  22. Nohr Ronald Sinclair ; MacDonald John Gavin, Process of enhanced chemical bonding by electron seam radiation.
  23. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
  24. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
  25. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Miller, Michael N.; Stacey, Nicholas A., Technique for separating a mold from solidified imprinting material.
  26. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
  27. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
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