초록 ▼

A device for photolithographically treating a thin substrate comprises pre-alignment station, a substrate-supporting table and a transport arm which is provided with a vacuum connection for holding the substrate by suction at its lower side during transport of the substrate from the pre-alignment st

A device for photolithographically treating a thin substrate comprises pre-alignment station, a substrate-supporting table and a transport arm which is provided with a vacuum connection for holding the substrate by suction at its lower side during transport of the substrate from the pre-alignment station to the substrate table. The substrate table is provided with supporting means for the substrate which are adjustable in the direction of height and which have a supporting surface which is adjustable to a distance above the substrate table exceeding the thickness of the transport arm and is adjustable in a downward direction at least through a distance such that the supporting surface is level with the upper surface of the substrate table, the supporting means leaving a space free for the movement of the transport arm above a part of the substrate table.

대표청구항 ▼

A device for photolithographically treating a thin substrate which is provided with a photosensitive layer on a major surface at the upper side of the substrate, which device comprises a pre-alignment station, a substrate table for holding the substrate during the photolithographic treatment and a t

A device for photolithographically treating a thin substrate which is provided with a photosensitive layer on a major surface at the upper side of the substrate, which device comprises a pre-alignment station, a substrate table for holding the substrate during the photolithographic treatment and a transport arm which is provided with a vacuum connection for holding the substrate by suction at the lower side of the substrate during transport of the substrate from the pre-alignment station to the substrate table, characterized in that the substrate table is provided with supporting means for the substrate which are adjustable in the direction of height and which have a supporting surface which is adjustable to a distance above the substrate table exceeding the thickness of the part of the transport arm which serves to hold the substrate, the supporting means being adjustable in a downward direction at least through a distance such that said supporting surface is level with the upper surface of the substrate table, and the supporting means being so positioned in the substrate table as to leave a space free for the movement of the transport arm above a part of the substrate table.