초록 ▼

Refractory materials which replicate a substantial portion of the internal pore structure as well as the shape and dimensions of high surface area microporous substrate materials which comprise metal or metalloid carbides may be prepared by uniformly depositing a carbide-forming metal or metalloid o

Refractory materials which replicate a substantial portion of the internal pore structure as well as the shape and dimensions of high surface area microporous substrate materials which comprise metal or metalloid carbides may be prepared by uniformly depositing a carbide-forming metal or metalloid on the internal surfaces of a high surface area microporous carbon-donor substrate material in the vapor phase. By controlling the operating parameters when depositing carbide-forming metal or metalloid, it is possible to effect a balance between the diffusion rate of the metal or metalloid-containing compound in the structure pores of the substrate with the decomposition rate of the compound, thus obtaining a uniform deposition of the metal or metalloid. If so desired, the substrate material may be subsequently removed by chemical or oxidative means. Examples of high surface area carbon-donor substrate materials which may be employed will include carbonaceous pyropolymers possessing recurring units containing at least carbon and hydrogen atoms per se or composited on a high surface area refractory inorganic oxide such as alumina.

대표청구항 ▼

1. A process for the production of a high surface area microporous metal carbide or metalloid carbide which possesses a physical configuration replicating that of a carbon-donor substrate consisting essentially of a carbonaceous pyropolymer possessing recurring units containing at least carbon and h

1. A process for the production of a high surface area microporous metal carbide or metalloid carbide which possesses a physical configuration replicating that of a carbon-donor substrate consisting essentially of a carbonaceous pyropolymer possessing recurring units containing at least carbon and hydrogen atoms and which itself replicates a highly porous refractory microporous inorganic oxide which comprises the steps of: (a) polymerizing an organic pyrolyzable substance containing at least carbon and hydrogen on the surface of said highly porous high surface area inorganic oxide having an internal surface area in the range of from about 1 to about 2000 m 2 /g in a reducing atmosphere at a temperature in the range of from about 400° to about 1200° C. to form said carbon-donor substrate consisting essentially of a carbonaceous pyropolymer possessing recurring units containing at least carbon and hydrogen atoms, said carbon-donor substrate replicating said highly porous surface of said refractory inorganic oxide; (b) uniformly depositing a carbide-forming metal or metalloid on the internal pore surfaces of said carbon-donor substrate which replicates said highly porous refractory inorganic oxide in the vapor phase at a temperature in the range of from about 300° to about 450° C. to afford a maximum uniform deposition of said metal or metalloid on the surfaces within the internal pore structure of said carbon-donor substrate; (c) heating said carbide-forming metal or metalloid on said carbon-donor substrate at a temperature in the range of from about 1000° to about 1800° C. to permit formation of said high surface area microporous metal carbide or metalloid carbide by reaction of said carbide-forming metal or metalloid with said carbon in said carbon-donor substrate wherein the resultant high surface area microporous metal carbide or metalloid carbide possesses a pore structure and physical configuration replicating the shape and dimension as well as a substantial portion of the pore structure of said carbon-donor substrate, and (d) recovering said high surface area metal carbide or metalloid carbide from said refractory inorganic oxide and said carbon-donor substrate. 2. The process as set forth in claim 1 in which said high surface area inorganic oxide comprises an alumina. 3. The process as set forth in claim 2 in which said alumina is gamma-alumina. 4. The process as set forth in claim 2 in which said alumina is theta-alumina. 5. The process as set forth in claim 1 in which said high surface area inorganic oxide comprises a silica. 6. The process as set forth in claim 1 in which said high surface area inorganic oxide comprises silica-alumina. 7. The process as set forth in claim 1 in which said carbide-forming metal is silicon. 8. The process as set forth in claim 1 in which said carbide-forming metal is tungsten. 9. The process as set forth in claim 1 in which said carbide-forming metal is molybdenum. 10. The process as set forth in claim 1 in which said carbide-forming metal is titanium. 11. The process as set forth in claim 1 in which said carbide-forming metalloid is boron. 12. The process as set forth in claim 1 in which said high surface area refractory inorganic oxide is recovered by chemical removal from said high surface area carbon-donor substrate material. 13. The process as set forth in claim 12 in which said chemical removal is effected by the leaching of said carbon-donor substrate with a substance capable of dissolving said high surface area refractory inorganic oxide. 14. The process as set forth in claim 13 in which said dissolving substance is an acid. 15. The process as set forth in claim 13 in which said dissolving substance is a base. 16. The process as set forth in claim 14 in which said acid is phosphoric acid. 17. The process as set forth in claim 1 in which said carbon-donor substrate comprising a carbonaceous pyropolymer possessing recurring units containing at least carbon and hydrogen atoms is recovered from said metal carbide or metalloid carbide by oxidation.