IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
US-0683874
(1984-12-20)
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발명자
/ 주소 |
- Tanaka, Masayuki
- Morioka, Katsuharu
- Kishimoto, Akihiko
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출원인 / 주소 |
|
대리인 / 주소 |
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인용정보 |
피인용 횟수 :
20 인용 특허 :
1 |
초록
▼
An antistatic resinours composition comprising (A) graft copolymers prepared by emulsion polymerization of (a) monomer mixture consisting of (i) from 50 to 100 percents by weight of monomers having polyalkylene oxide chains and (ii) from 50 to 0 percents by weight of vinyl monomers in the presence o
An antistatic resinours composition comprising (A) graft copolymers prepared by emulsion polymerization of (a) monomer mixture consisting of (i) from 50 to 100 percents by weight of monomers having polyalkylene oxide chains and (ii) from 50 to 0 percents by weight of vinyl monomers in the presence of rubbers and (B) thermoplastic resins compatible with the graft copolymers, has permanent antistatic performances, superior mechanical properties and high flowability.
대표청구항
▼
1. An antistatic resinous composition comprising (A) from 1 to 70 parts by weight of graft copolymers prepared by emulsion polymerization of (a) from 5 to 90 parts by weight of monomer mixture consisting of (i) from 50 to 100 percents by weight of at least one monomer having polyalkylene oxide
1. An antistatic resinous composition comprising (A) from 1 to 70 parts by weight of graft copolymers prepared by emulsion polymerization of (a) from 5 to 90 parts by weight of monomer mixture consisting of (i) from 50 to 100 percents by weight of at least one monomer having polyalkylene oxide chains represented by the following general formula (I); ##STR## wherein R denotes a radical selected from the group consisting hydrogen atom and methyl and n denotes and integer of 2 to 100, and (ii) from 50 to 0 percents by weight of at least one vinyl monomer selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers in the presence of (b) from 95 to 10 parts by weight of rubbers and (B) from 99 to 30 parts by weight of thermoplastic resins compatible with said graft copolymers. 2. An antistatic resinous composition according to claim 1, wherein thermoplastic resins are at least one selected from the group consisting of (β) polymer prepared by polymerization of (a) at least one vinyl monomer selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers, and vinyl cyanide monomers in the absence of (b) rubbers and (β) polymer prepared by polymerization of (a) at least one vinyl monomer selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers in the presence of (b) rubbers. 3. An antistatic resinous composition according to claim 1, wherein rubbers (b) are selected from the group consisting of conjugate diene rubbers and acryl rubbers. 4. An antistatic resinous composition according to claim 3, wherein rubbers (b) are copolymer from acrylonitrile and butadiene rubber. 5. An antistatic resinous composition according to claim 1, wherein monomer mixture (a) consists of (i) from 65 to 100 percent by weight of monomer having polyalkylene oxide chains, and (ii) from 35 to 0 percents by weight of at least one vinyl monomer selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers. 6. An antistatic resinous composition according to claim 1, wherein composition comprises from 5 to 60 parts by weight of graft copolymers (A) and from 95 to 40 parts by weight of thermoplastic resins (B). 7. An antistatic resinous composition according to claim 1, wherein vinyl monomer (ii) selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers comprises 50 to 97 percent by weight of at least one monomer selected from the group consisting of aromatic vinyl monomer, acrylate ester monomers, and methacrylate ester monomers and from 3 to 50 percent by weight of vinyl cyanide monomers. 8. An antistatic resinous composition according to claim 1, wherein R in said formula (I) is hydrogen atom and n in said formula (I) is an integer of 5 to 30. 9. An antistatic resinous composition according to claim 1, wherein monomer (i) having polyalkylene oxide chains is selected from the group consisting of methoxypoly(ethylene glycol) methacrylate and methoxypoly(ethylene glycol)acrylate. 10. An antistatic resinous composition according to claim 1, wherein aromatic vinyl monomer is selected from the group consisting of styrene, α-methylstyrene, and p-methylstyrene. 11. An antistatic resinous composition according to claim 1, wherein methacrylate ester monomer is methyl methacrylate. 12. An antistatic resinous composition according to claim 1, wherein acrylate ester monomer is methyl acrylate. 13. An antistatic resinous composition according to claim 1, wherein vinyl cyanide monomer is acrylonitrile. 14. A process for preparing an antistatic resinous composition according to claim 1, wherein graft copolymer (A) is prepared by charging and emulsion polymerizing monomer (i) having polyalkylene oxide chains in the presence of rubbers (b) in the reaction system, followed by charging and emulsion polymerizing at least one vinyl monomer (ii) selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers. 15. A process for preparing an antistatic resinous composition according to claim 1, wherein graft copolymer (A) is prepared by charging and emulsion polymerizing at least one vinyl monomer (ii) selected from the group consisting of aromatic vinyl monomers, acrylate ester monomers, methacrylate ester monomers and vinyl cyanide monomers, in the presence of rubbers (b) in the reaction system, followed by charging and emulsion polymerizing monomer (i) having polyalkylene oxide chains.
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